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市场调查报告书
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1685129

原子层沉积 (ALD) 设备市场机会、成长动力、产业趋势分析与 2025 - 2034 年预测

Atomic Layer Deposition (ALD) Equipment Market Opportunity, Growth Drivers, Industry Trend Analysis, and Forecast 2025 - 2034
出版日期: | 出版商: Global Market Insights Inc. | 英文 198 Pages | 商品交期: 2-3个工作天内

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简介目录

2024 年全球原子层沉积设备市场规模达 43 亿美元，预计 2025 年至 2034 年期间复合年增长率将达到 10.6%。随着世界继续拥抱 5G、人工智慧 (AI) 和物联网 (IoT) 等尖端技术，对半导体设备的需求激增，直接影响 ALD 设备市场。 ALD 技术对于製造先进的半导体元件至关重要，它可以提供精确、均匀的薄膜沉积，从而显着提高装置的性能和可靠性。对高效可靠半导体设备日益增长的需求，加上技术的不断进步，确保了 ALD 设备市场在未来几年将持续成长。

原子层沉积 (ALD) 设备市场 - IMG1

智慧型手机、物联网设备和下一代运算技术的日益普及，对半导体产业 ALD 设备产生了强劲的需求。 ALD 能够在薄膜沉积中提供原子级精度，这使得它成为现代电子製造中不可或缺的一部分。此外，随着业界探索新技术并突破小型化的界限，ALD 在克服高性能设备生产的复杂挑战方面的作用变得更加重要。全球对人工智慧和 5G 通讯等领域的日益关注进一步凸显了 ALD 在确保生产用于这些应用的可靠、高性能设备方面发挥的关键作用。

市场范围
起始年份 2024
预测年份 2025-2034
起始值 43亿美元
预测值 117亿美元
复合年增长率 10.6％

根据沉积方法，市场分为空间 ALD、热 ALD、功率 ALD、等离子增强 ALD 等。到 2034 年，空间 ALD 领域预计将产生 45 亿美元的收入。空间 ALD 因其在特定区域进行选择性沉积的能力而脱颖而出，这使得它能够有效地生产复杂设备。此方法提供了灵活性和精确度，这对于需要详细材料放置的应用（例如先进封装和微机电系统 (MEMS)）至关重要。

就应用而言，市场分为计算、消费性电子、资料中心、医疗保健和生物医学、汽车以及能源和电力。计算行业预计将保持主导份额，到 2024 年将占据 33.2% 的市场份额。对伺服器、游戏系统和工作站等高效能运算设备的需求加速了 ALD 技术的采用。 ALD 能够在半导体基板上精确沉积薄膜，从而提高设备性能、功率效率和整体功能，所有这些对于计算领域的扩展都至关重要。

预测期内，美国原子层沉积 (ALD) 设备市场预计将以 11.6% 的复合年增长率成长。美国市场受益于其先进的技术基础设施、对创新的高度重视以及鼓励采用下一代技术的有利监管框架。此外，随着各领域对研发的投入不断增加，对 ALD 技术的需求预计将加剧，进一步推动市场扩张。

目录

第 1 章：方法论与范围

  • 市场范围和定义
  • 基础估算与计算
  • 预测计算
  • 资料来源
    • 基本的
    • 次要
      • 付费来源
      • 公共资源

第 2 章：执行摘要

第 3 章：产业洞察

  • 产业生态系统分析
    • 影响价值链的因素
    • 利润率分析
    • 中断
    • 未来展望
    • 製造商
    • 经销商
  • 供应商概况
  • 利润率分析
  • 重要新闻及倡议
  • 监管格局
  • 衝击力
  • 成长动力
    • 半导体装置需求不断成长
    • 3D NAND SSD 的快速普及
    • 半导体设计日益复杂
    • 材料特性意识不断增强
    • 更加重视能源效率
  • 产业陷阱与挑战
    • 材料相容性和整合性
    • 与 ALD 设备相关的高成本
  • 成长潜力分析
  • 波特的分析
  • PESTEL 分析

第四章：竞争格局

  • 介绍
  • 公司市占率分析
  • 竞争定位矩阵
  • 战略展望矩阵

第 5 章：市场估计与预测：按设备，2021 年至 2034 年

  • 主要趋势
  • 间歇反应器
  • 单晶片反应器
  • 空间 ALD 反应器
  • 远程等离子体 ALD 反应器

第 6 章：市场估计与预测：依沉积法，2021-2034 年

  • 主要趋势
  • 等离子增强 ALD
  • 热 ALD
  • 空间 ALD
  • 强力 ALD
  • 其他的

第七章：市场估计与预测：依电影类型，2021-2034 年

  • 主要趋势
  • 金属薄膜
  • 氧化膜
  • 硫化膜
  • 氮化膜
  • 氟化膜

第 8 章：市场估计与预测：按应用，2021 年至 2034 年

  • 主要趋势
  • 计算领域
  • 资料中心
  • 消费性电子产品
  • 医疗保健和生物医学
  • 汽车
  • 能源与电力

第 9 章：市场估计与预测：按地区，2021 年至 2034 年

  • 主要趋势
  • 北美洲
    • 我们
    • 加拿大
  • 欧洲
    • 英国
    • 德国
    • 法国
    • 义大利
    • 西班牙
    • 俄罗斯
  • 亚太地区
    • 中国
    • 印度
    • 日本
    • 韩国
    • 澳洲
    • 亚太其他地区
  • 拉丁美洲
    • 巴西
    • 墨西哥
    • 拉丁美洲其他地区
  • 中东及非洲
    • 南非
    • 沙乌地阿拉伯
    • 阿联酋
    • MEA 其他地区

第十章：公司简介

  • Aixtron SE
  • ANRIC Technologies
  • Applied Materials, Inc.
  • Arradiance, LLC
  • ASM International NV
  • Beneq Oy
  • Cambridge NanoTech
  • CVD Equipment Corporation
  • Entegris Inc.
  • Forge Nano Inc
  • Hitachi High-Technologies Corporation
  • Kurt J. Lesker Company
  • Lam Research Corporation
  • Meyer Burger
  • MSE Supplies LLC
  • Nano-Master, Inc.
  • Oxford Instruments plc
  • Picosun Oy
  • Radiation Monitoring Devices, Inc
  • SENTECH Instruments GmbH
  • SHOWA SHINKU CO., LTD.
  • SVT Associates
  • Tokyo Electron Limited
  • Veeco Instruments Inc
  • Watty Corporation
简介目录
Product Code: 8346

The Global Atomic Layer Deposition Equipment Market reached USD 4.3 billion in 2024 and is projected to grow at a robust CAGR of 10.6% from 2025 to 2034. As the world continues to embrace cutting-edge technologies like 5G, artificial intelligence (AI), and the Internet of Things (IoT), the demand for semiconductor devices has surged, directly impacting the ALD equipment market. ALD technology is essential for fabricating advanced semiconductor components, providing precise and uniform thin-film deposition that significantly enhances the performance and reliability of devices. This growing need for highly efficient and reliable semiconductor devices, coupled with continuous technological advancements, ensures that the ALD equipment market will see sustained growth in the coming years.

Atomic Layer Deposition (ALD) Equipment Market - IMG1

The increasing adoption of smartphones, IoT devices, and next-gen computing technologies has created a solid demand for ALD equipment in the semiconductor industry. ALD's ability to deliver atomic-scale precision in film deposition makes it indispensable for modern electronics manufacturing. Moreover, as industries explore new technologies and push the boundaries of miniaturization, the role of ALD becomes even more critical in overcoming the complex challenges of high-performance device production. The expanding global focus on sectors such as artificial intelligence and 5G communications further highlights ALD's pivotal role in ensuring the production of reliable, high-performance devices for these applications.

Market Scope
Start Year2024
Forecast Year2025-2034
Start Value$4.3 Billion
Forecast Value$11.7 Billion
CAGR10.6%

By deposition method, the market is segmented into spatial ALD, thermal ALD, power ALD, plasma-enhanced ALD, and others. The spatial ALD segment is expected to generate USD 4.5 billion through 2034. Spatial ALD stands out for its ability to perform selective deposition in specific regions, making it highly efficient for the production of complex devices. This method provides flexibility and precision critical for applications requiring detailed material placement, such as advanced packaging and microelectromechanical systems (MEMS).

In terms of application, the market is divided into computing, consumer electronics, data centers, healthcare and biomedical, automotive, and energy and power. The computing sector is poised to maintain a dominant share, accounting for 33.2% of the market in 2024. The demand for high-performance computing devices-such as servers, gaming systems, and workstations-has accelerated the adoption of ALD technology. ALD enables the precise deposition of thin films on semiconductor substrates, improving device performance, power efficiency, and overall functionality, all of which are vital for the computing sector's expansion.

The United States atomic layer deposition (ALD) equipment market is expected to grow at a CAGR of 11.6% during the forecast period. The U.S. market benefits from its advanced technological infrastructure, a strong focus on innovation, and favorable regulatory frameworks that encourage the adoption of next-gen technologies. Additionally, with increasing investments in research and development across various sectors, the demand for ALD technology is expected to intensify, further driving market expansion.

Table of Contents

Chapter 1 Methodology & Scope

  • 1.1 Market scope & definitions
  • 1.2 Base estimates & calculations
  • 1.3 Forecast calculations
  • 1.4 Data sources
    • 1.4.1 Primary
    • 1.4.2 Secondary
      • 1.4.2.1 Paid sources
      • 1.4.2.2 Public sources

Chapter 2 Executive Summary

  • 2.1 Industry synopsis, 2021-2034

Chapter 3 Industry Insights

  • 3.1 Industry ecosystem analysis
    • 3.1.1 Factor affecting the value chain
    • 3.1.2 Profit margin analysis
    • 3.1.3 Disruptions
    • 3.1.4 Future outlook
    • 3.1.5 Manufacturers
    • 3.1.6 Distributors
  • 3.2 Supplier landscape
  • 3.3 Profit margin analysis
  • 3.4 Key news & initiatives
  • 3.5 Regulatory landscape
  • 3.6 Impact forces
  • 3.7 Growth drivers
    • 3.7.1 Increasing demand for semiconductor devices
    • 3.7.2 Rapid proliferation of 3D NAND SSDs
    • 3.7.3 Rising complexity of semiconductor designs
    • 3.7.4 Surging awareness of material properties
    • 3.7.5 Heightened focus on energy efficiency
  • 3.8 Industry pitfalls & challenges
    • 3.8.1 Material compatibility and integration
    • 3.8.2 High costs related to ALD equipment
  • 3.9 Growth potential analysis
  • 3.10 Porter’s analysis
  • 3.11 PESTEL analysis

Chapter 4 Competitive Landscape, 2023

  • 4.1 Introduction
  • 4.2 Company market share analysis
  • 4.3 Competitive positioning matrix
  • 4.4 Strategic outlook matrix

Chapter 5 Market Estimates & Forecast, By Equipment, 2021-2034 (USD billion)

  • 5.1 Key trends
  • 5.2 Batch reactors
  • 5.3 Single-wafer reactors
  • 5.4 Spatial ALD reactors
  • 5.5 Remote plasma ALD reactors

Chapter 6 Market Estimates & Forecast, By Deposition Method, 2021-2034 (USD billion)

  • 6.1 Key trends
  • 6.2 Plasma enhanced ALD
  • 6.3 Thermal ALD
  • 6.4 Spatial ALD
  • 6.5 Power ALD
  • 6.6 Others

Chapter 7 Market Estimates & Forecast, By Film Type, 2021-2034 (USD billion)

  • 7.1 Key trends
  • 7.2 Metal film
  • 7.3 Oxide film
  • 7.4 Sulfide film
  • 7.5 Nitride film
  • 7.6 Fluoride film

Chapter 8 Market Estimates & Forecast, By Application, 2021-2034 (USD billion)

  • 8.1 Key trends
  • 8.2 Computing sector
  • 8.3 Data centers
  • 8.4 Consumer electronics
  • 8.5 Healthcare and biomedical
  • 8.6 Automotive
  • 8.7 Energy & power

Chapter 9 Market Estimates & Forecast, By Region, 2021-2034 (USD billion)

  • 9.1 Key trends
  • 9.2 North America
    • 9.2.1 U.S.
    • 9.2.2 Canada
  • 9.3 Europe
    • 9.3.1 UK
    • 9.3.2 Germany
    • 9.3.3 France
    • 9.3.4 Italy
    • 9.3.5 Spain
    • 9.3.6 Russia
  • 9.4 Asia Pacific
    • 9.4.1 China
    • 9.4.2 India
    • 9.4.3 Japan
    • 9.4.4 South Korea
    • 9.4.5 Australia
    • 9.4.6 Rest of Asia Pacific
  • 9.5 Latin America
    • 9.5.1 Brazil
    • 9.5.2 Mexico
    • 9.5.3 Rest of Latin America
  • 9.6 MEA
    • 9.6.1 South Africa
    • 9.6.2 Saudi Arabia
    • 9.6.3 UAE
    • 9.6.4 Rest of MEA

Chapter 10 Company Profiles

  • 10.1 Aixtron SE
  • 10.2 ANRIC Technologies
  • 10.3 Applied Materials, Inc.
  • 10.4 Arradiance, LLC
  • 10.5 ASM International NV
  • 10.6 Beneq Oy
  • 10.7 Cambridge NanoTech
  • 10.8 CVD Equipment Corporation
  • 10.9 Entegris Inc.
  • 10.10 Forge Nano Inc
  • 10.11 Hitachi High-Technologies Corporation
  • 10.12 Kurt J. Lesker Company
  • 10.13 Lam Research Corporation
  • 10.14 Meyer Burger
  • 10.15 MSE Supplies LLC
  • 10.16 Nano-Master, Inc.
  • 10.17 Oxford Instruments plc
  • 10.18 Picosun Oy
  • 10.19 Radiation Monitoring Devices, Inc
  • 10.20 SENTECH Instruments GmbH
  • 10.21 SHOWA SHINKU CO., LTD.
  • 10.22 SVT Associates
  • 10.23 Tokyo Electron Limited
  • 10.24 Veeco Instruments Inc
  • 10.25 Watty Corporation