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市场调查报告书
商品编码
1833399
光刻设备市场机会、成长动力、产业趋势分析及2025-2034年预测Photolithography Equipment Market Opportunity, Growth Drivers, Industry Trend Analysis, and Forecast 2025 - 2034 |
2024 年全球光刻设备市场价值为 144.1 亿美元,预计将以 7.5% 的复合年增长率成长,到 2034 年达到 298 亿美元。
全球对智慧型手机、资料中心、人工智慧处理器和汽车电子产品中使用的更小、更快、更节能的晶片的需求激增,推动了对尖端光刻设备的投资,特别是针对 7nm 以下节点的投资。
市场范围 | |
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起始年份 | 2024 |
预测年份 | 2025-2034 |
起始值 | 144.1亿美元 |
预测值 | 298亿美元 |
复合年增长率 | 7.5% |
接触式光刻技术需求不断成长
2024年,接触式微影技术占据了相当大的份额,这主要得益于半导体和微加工应用,尤其是在高产量和低成本优先于极高解析度的应用领域。虽然接触式微影技术不如更先进的光刻方法精确,但它广泛应用于MEMS生产、印刷电路板(PCB)和某些化合物半导体製程。
步进系统的应用日益广泛
步进式系统在2024年占据了相当大的市场。这些系统每次曝光一个晶片,提供精确的对准和套刻控制,这对于模拟、射频和功率装置中使用的成熟製程技术至关重要。儘管EUV技术正在兴起,但步进式系统由于其价格实惠、可靠性高,在传统和特殊晶圆厂中仍然需求旺盛。
储存设备将获得发展动力
2024年,储存设备市场将占据相当大的份额,这得益于对更高密度和更快性能的需求,从而推动了对能够处理日益复杂图案的先进光刻设备的需求。 DRAM 和 NAND 快闪记忆体製造商依靠 DUV 和 EUV 系统来突破微缩极限,并实现 3D NAND 和 DDR5 等创新。
亚太地区将成为利润丰厚的地区
2025年至2034年期间,亚太地区光刻设备市场将以可观的复合年增长率成长,这得益于台湾、韩国、中国大陆和日本等半导体製造强国的崛起。这些国家拥有全球最大的晶圆代工厂和记忆体生产商,使该地区成为先进和传统节点製造的关键枢纽。
光刻设备市场的主要参与者有 Gigaphoton Inc.、佳能公司、滨松光子株式会社、Veeco Instruments Inc.、EV Group (EVG)、SCREEN Semiconductor Solutions Co., Ltd.、日立高科技公司、ASML Holding NV、Xenics NVec、应用材料公司、KLA Corporation、日立高科技公司、ASML Holding NV、Xenics NVS、应用程式材料公司、KLA Corporation、Cymer LLC、S VMLA Corporation、VMLA Corporation、BMLA Corporation、Cyberim 所有Inc.。
为了巩固其在光刻设备市场的地位,各公司正在实施以创新、可扩展性和区域扩张为重点的策略。领先的公司正在大力投资下一代技术,例如高数值孔径 EUV 和先进的光学系统,以保持其技术优势。同时,他们正在丰富其产品线,以满足尖端和传统晶圆厂的需求,确保在整个晶片生产过程中保持相关性。
The Global Photolithography Equipment Market was valued at USD 14.41 billion in 2024 and is estimated to grow at a CAGR of 7.5% to reach USD 29.8 billion by 2034.
The global surge in demand for smaller, faster, and more energy-efficient chips used in smartphones, data centers, AI processors, and automotive electronics is fueling investment in cutting-edge photolithography equipment, particularly for nodes below 7nm.
Market Scope | |
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Start Year | 2024 |
Forecast Year | 2025-2034 |
Start Value | $14.41 Billion |
Forecast Value | $29.8 Billion |
CAGR | 7.5% |
Rising Demand for Contact Lithography
The contact lithography segment held a significant share in 2024, driven by semiconductor and microfabrication applications, particularly where high throughput and lower costs are prioritized over extreme resolution. While it lacks the precision of more advanced lithography methods, contact lithography is widely used in MEMS production, printed circuit boards (PCBs), and certain compound semiconductor processes.
Increasing Adoption of Stepper Systems
The stepper systems segment generated a substantial share in 2024. These systems expose one die at a time, providing precise alignment and overlay control, which is critical for mature process technologies used in analog, RF, and power devices. Despite the rise of EUV, steppers remain in strong demand due to their affordability and reliability across legacy and specialty fabs.
Memory Devices to Gain Traction
The memory devices segment held a sizeable share in 2024, driven by the need for higher density and faster performance, which is driving demand for advanced photolithography equipment capable of handling increasingly complex patterns. DRAM and NAND flash manufacturers rely on both DUV and EUV systems to push scaling limits and enable innovations such as 3D NAND and DDR5.
Asia Pacific to Emerge as a Lucrative Region
Asia Pacific photolithography equipment market will grow at a decent CAGR during 2025-2034, driven by the presence of semiconductor manufacturing powerhouses such as Taiwan, South Korea, China, and Japan. These countries host the world's largest foundries and memory producers, making the region a critical hub for both advanced and legacy node manufacturing.
Major players in the photolithography equipment market are Gigaphoton Inc., Canon Inc., Hamamatsu Photonics K.K., Veeco Instruments Inc., EV Group (EVG), SCREEN Semiconductor Solutions Co., Ltd., Hitachi High-Tech Corporation, ASML Holding N.V., Xenics NV, Applied Materials, Inc., KLA Corporation, Cymer LLC, SUSS MicroTec SE, Nikon Corporation, Ushio Inc., Lam Research Corporation, and Onto Innovation Inc.
To solidify their position in the photolithography equipment market, companies are executing strategies focused on innovation, scalability, and regional expansion. Leading firms are investing heavily in next-generation technologies such as high-NA EUV and advanced optical systems to maintain their technological edge. At the same time, they are diversifying their offerings to cater to both leading-edge and legacy fabs, ensuring relevance across the full spectrum of chip production.