市场调查报告书
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1422826
高 k 和 CVD ALD 金属前驱体市场按技术(互连、电容器/记忆体、闸极)、最终用途(消费性电子、航太和国防、IT 和电信、工业、汽车、医疗保健等)和地区划分, 2024-2032 年High-k and CVD ALD Metal Precursors Market by Technology (Interconnect, Capacitor/Memory, Gates), End Use (Consumer Electronics, Aerospace and Defense, IT and Telecommunication, Industrial, Automotive, Healthcare, and Others), and Region 2024-2032 |
2023年,全球高k和CVD ALD金属前驱体市场规模达到6.188亿美元。展望未来, IMARC Group预计到2032年市场规模将达到11.224亿美元,2024年复合年增长率(CAGR)为6.63%。2032 .消费性电子产品销售的不断增长、对自动驾驶和电动车(EV) 的需求不断增长,以及高k 和CVD ALD 金属前驱体在各种医疗成像设备中的使用不断增加,是推动市场发展的一些关键因素。
高介电常数(High-K)用作电晶体中的闸极电介质,以提高电容并增强元件的性能。另一方面,化学气相沉积 (CVD) 原子层沉积 (ALD) 是一种依靠金属前驱物将薄膜沉积到基板上的技术。高 k 和 CVD ALD 金属前驱物是半导体技术中用于沉积各种金属的材料,包括钛、钽、钨等。它们用于製造各种储存装置,例如动态随机存取记忆体(DRAM)和快闪记忆体元件。目前,装置小型化的不断增长趋势正在推动全球对高 k 和 CVD ALD 金属前驱体的需求。
对高性能和节能电子设备的需求不断增加。再加上智慧型手机、笔记型电脑、平板电脑、游戏机、相机和电视销量的不断增长,这是推动全球高 k 和 CVD ALD 金属前驱体需求的主要因素之一。此外,再生能源的使用不断增加,正在积极影响电池和太阳能电池等能量储存和转换设备中对高 k 和 CVD ALD 金属前驱体的需求。此外,汽车行业还采用高 k 和 CVD ALD 金属前驱体来提高效率并减少装置的尺寸和重量。它们用于先进驾驶辅助系统(ADAS),如摄影机、雷达、雷射雷达、远端资讯处理系统和资讯娱乐系统,如显示器、音讯系统和导航系统,以增强性能。 High-k 和 CVD ALD 金属前驱体也用于先进的安全系统,包括车道偏离警告系统和自适应巡航控制系统,以提高灵敏度和响应时间。由于快速城市化和收入水平的提高,自动驾驶汽车和电动车(EV)的销量不断增加,这共同推动了市场的成长。除此之外,高k 和CVD ALD 金属前驱体在各种医学影像设备和生物医学感测器(例如X 光、电脑断层扫描(CT) 扫描仪和葡萄糖感测器)中的使用不断增加,为市场创造了积极的前景。
The global high-k and CVD ALD metal precursors market size reached US$ 618.8 Million in 2023. Looking forward, IMARC Group expects the market to reach US$ 1,122.4 Million by 2032, exhibiting a growth rate (CAGR) of 6.63% during 2024-2032. The increasing sales of consumer electronics, rising demand for autonomous and electric vehicles (EVs), and the growing use of high-k and CVD ALD metal precursors in various medical imaging devices represent some of the key factors driving the market.
High dielectric constant (High-K) is used as gate dielectrics in transistors to improve the capacitance and enhance the performance of the device. On the other hand, chemical vapor deposition (CVD) atomic layer deposition (ALD) is a technique that relies on metal precursors to deposit thin films onto a substrate. High-k and CVD ALD metal precursors are materials utilized in the semiconductor technology to deposit various metals, including titanium, tantalum, tungsten, and others. They are used in the manufacturing of various memory devices, such as dynamic random access memory (DRAM) and flash memory devices. At present, the rising trend of device miniaturization is catalyzing the demand for high-k and CVD ALD metal precursors across the globe.
There is an increase in the need for high performance and energy efficient electronic devices. This, coupled with the rising sales of smartphones, laptops, tablets, gaming consoles, cameras, and television, represents one of the major factors driving the demand for high-k and CVD ALD metal precursors around the world. Moreover, the growing use of renewable energy sources is positively influencing the demand for high-k and CVD ALD metal precursors in energy storage and conversion devices, such as batteries and solar cells. In addition, high-k and CVD ALD metal precursors are employed in the automotive industry to improve the efficiency and reduce the size and weight of devices. They are used in advanced driver assistance systems (ADAS), such as cameras, radar, lidar, telematics systems, and infotainment systems, like displays, audio systems, and navigation systems to enhance the performance. High-k and CVD ALD metal precursors are also utilized in advanced safety systems, including lane departure warning systems and adaptive cruise control, to improve the sensitivity and response time. This, in confluence with the increasing sales of autonomous and electric vehicles (EVs) on account of rapid urbanization and inflating income levels, is contributing to the market growth. Apart from this, the rising usage of high-k and CVD ALD metal precursors in various medical imaging devices and biomedical sensors, such as X-ray, computed tomography (CT) scanners, and glucose sensors, is creating a positive outlook for the market.
IMARC Group provides an analysis of the key trends in each segment of the global high-k and CVD ALD metal precursors market, along with forecasts at the global, regional, and country level from 2024-2032. Our report has categorized the market based on technology and end use.
Interconnect
Capacitor/Memory
Gates
The report has provided a detailed breakup and analysis of the high-k and CVD ALD metal precursors market based on the technology. This includes interconnect, capacitor/memory, and gates. According to the report, interconnect represented the largest segment.
Consumer Electronics
Aerospace and Defense
IT and Telecommunication
Industrial
Automotive
Healthcare
Others
A detailed breakup and analysis of the high-k and CVD ALD metal precursors market based on the end use has also been provided in the report. This includes consumer electronics, aerospace and defense, IT and telecommunication, industrial, automotive, healthcare, and others. According to the report, consumer electronics accounted for the largest market share.
North America
United States
Canada
Asia-Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The report has also provided a comprehensive analysis of all the major regional markets, which include North America (the United States and Canada); Asia Pacific (China, Japan, India, South Korea, Australia, Indonesia, and others); Europe (Germany, France, the United Kingdom, Italy, Spain, Russia, and others); Latin America (Brazil, Mexico, and others); and the Middle East and Africa. According to the report, Asia Pacific was the largest market for high-k and CVD ALD metal precursors. Some of the factors driving the Asia Pacific high-k and CVD ALD metal precursors market included the increasing R&D activities, rising demand for fabricating semiconductor devices, the growing sales of autonomous and electric vehicles, etc.
The report has also provided a comprehensive analysis of the competitive landscape in the global high-k and CVD ALD metal precursors market. Detailed profiles of all major companies have also been provided. Some of the companies covered include Adeka Corporation, Dow Inc., Merck KGaA, Nanmat Technology Co. Ltd., Strem Chemicals Inc. (Ascensus Specialties LLC), Tri Chemical Laboratories Inc., etc.