市场调查报告书
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1451759
2024-2032 年化学气相沉积设备市场报告(按技术(等离子体增强 CVD、低压 CVD、金属有机 CVD、常压 CVD 等)、应用、最终用户和地区)Chemical Vapour Deposition Equipment Market Report by Technology (Plasma Enhanced CVD, Low Pressure CVD, Metal Organic CVD, Atmospheric Pressure CVD, and Others), Application, End User, and Region 2024-2032 |
2023年全球化学气相沉积(CVD)设备市场规模达305亿美元。展望未来, IMARC Group预计到2032年市场规模将达到583亿美元,2024-2032年复合年增长率(CAGR)为7.25% 。电子产业的显着成长、医疗应用中对 CVD 设备的需求不断增加以及广泛的研发 (R&D) 活动是推动市场的一些关键因素。
化学气相沉积 (CVD) 系统用于利用气态试剂和热诱导化学反应将各种材料的薄膜沉积到基板上。该设备通常由反应室、气体输送系统、能源、真空系统、加热系统和排气系统组成。 CVD 设备广泛应用于涂料和半导体产业,以製造用于生产太阳能板、发光二极体和积体电路 (IC) 的材料。该设备可生产高品质、均匀的薄膜,具有出色的薄膜纯度、厚度、成分和微观结构控制。 CVD 设备是一种强大的工具,具有多功能性、低温沉积、高生产率和低废物产生等特性。因此,它在电子、涂料和催化行业中得到了广泛的应用。
全球电子产业广泛采用产品是推动市场成长的关键因素之一。 CVD设备广泛应用于先进电子导体和绝缘体以及相关结构的设计和加工,例如扩散阻挡层和高导热基板(散热器)。与此一致的是,对微晶片、电晶体和感测器等微电子元件的需求不断增长,有利于市场成长。此外,平板显示器、笔记型电脑、储存设备、手机和其他电子产品生产中对 CVD 设备的需求不断增长,也是另一个推动成长的因素。除此之外,引入等离子体增强CVD(PECVD)技术在较低的基板温度下沉积材料有助于减少基板上的热应力,并允许使用温度敏感材料,这反过来又提供了推动力到市场成长。此外,太阳能电池製造中广泛应用的设备的广泛使用,例如晶体硅太阳能电池中的晶体硅沉积到高性能薄膜太阳能电池中的各种材料的沉积,正在推动市场成长。此外,多室 CVD 设备的推出有助于在单一製程中沉积多种材料,有助于提高效率并减少製造时间,从而为市场创造积极的前景。其他因素,包括医疗应用中对 CVD 设备的需求不断增加、广泛的研发 (R&D) 活动、各行业对涂料的需求不断增加,以及鼓励国内製造的各种政府倡议的实施,预计将推动市场增长。
The global chemical vapour deposition (CVD) equipment market size reached US$ 30.5 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 58.3 Billion by 2032, exhibiting a growth rate (CAGR) of 7.25% during 2024-2032. Significant growth in the electronics industry, the increasing demand for CVD equipment in medical applications, and extensive research and development (R&D) activities represent some of the key factors driving the market.
A chemical vapor deposition (CVD) system is used to deposit thin films of various materials onto a substrate using gaseous reagents and thermally induced chemical reactions. The equipment typically consists of a reaction chamber, gas delivery system, energy source, vacuum system, heating system, and exhaust system. CVD equipment is widely used in the coatings and semiconductor industry to make materials that are used to produce solar panels, light-emitting diodes, and integrated circuits (ICs). The equipment produces high-quality, uniform films with excellent film purity, thickness, composition, and microstructure control. CVD equipment is a powerful tool that exhibits versatility, low-temperature deposition, high production rates, and low waste generation. As a result, it finds extensive applications across the electronics, coatings, and catalysis industries.
The widespread product adoption in the electronics industry across the globe is one of the key factors driving the market growth. CVD equipment is widely used in the designing and processing of advanced electronic conductors and insulators, as well as related structures, such as diffusion barriers and high thermal conductivity substrates (heat sinks). In line with this, the increasing demand for microelectronic components such as microchips, transistors, and sensors are favoring the market growth. Moreover, the rising demand for CVD equipment in the production of flat panel displays, laptops, storage devices, mobile phones, and other electronic items is acting as another growth-inducing factor. Apart from this, the introduction of the plasma-enhanced CVD (PECVD) technique to deposit materials at lower substrate temperatures helps to reduce the thermal stress on the substrate and allows for the use of temperature-sensitive materials, which in turn is providing an impetus to the market growth. Additionally, the widespread equipment utilization for a wide range of applications in solar cell manufacture, such as crystalline silicon deposition in crystalline-silicon solar cells to the deposition of a variety of materials in thin high-performance film solar cells, is propelling the market growth. Furthermore, the launch of multi-chamber CVD equipment, which helps in the deposition of multiple materials in a single process that assists in increasing efficiency and reducing manufacturing time, which in turn is creating a positive outlook for the market. Other factors, including the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities, rising demand for coatings in various industries, and the implementation of various government initiatives to encourage domestic manufacturing, are anticipated to drive the market growth.
IMARC Group provides an analysis of the key trends in each segment of the global chemical vapour deposition (CVD) equipment market, along with forecasts at the global, regional, and country levels from 2024-2032. Our report has categorized the market based on technology, application, and end user.
Plasma Enhanced CVD (PECVD)
Low Pressure CVD (LPCVD)
Metal Organic CVD (MOCVD)
Atmospheric Pressure CVD (APCVD)
Others
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the technology. This includes plasma enhanced CVD (PECVD), low pressure CVD (LPCVD), metal organic CVD (MOCVD), atmospheric pressure CVD (APCVD) and others. According to the report, low pressure CVD (LPCVD) represented the largest segment.
Coatings
Electronics
Catalysis
Others
A detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the application has also been provided in the report. This includes coatings, electronics, catalysis, and others. According to the report, electronics accounted for the largest market share.
Memory
Foundry
IDM
Logic
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the end user. This includes memory, foundry, IDM, and logic. According to the report, foundry represented the largest segment.
North America
United States
Canada
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Asia Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The report has also provided a comprehensive analysis of all the major regional markets, which include North America (the United States and Canada); Europe (Germany, France, the United Kingdom, Italy, Spain, Russia, and others); Asia Pacific (China, Japan, India, South Korea, Australia, Indonesia, and others); Latin America (Brazil, Mexico, and others); and the Middle East and Africa. According to the report, Asia Pacific was the largest market for chemical vapour deposition (CVD) equipment. Some of the factors driving the Asia Pacific chemical vapour deposition (CVD) equipment market included the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities and rapid technological advancements.
The report has also provided a comprehensive analysis of the competitive landscape in the global chemical vapour deposition (CVD) equipment market. Detailed profiles of all major companies have also been provided. Some of the companies covered include Aixtron SE, Applied Materials Inc., CVD Equipment Corporation, IHI Corporation, Jusung Engineering Co. Ltd., Lam Research Corporation, Oxford Instruments plc, Plasma-Therm LLC, ULVAC Inc., Veeco Instruments Inc., etc. Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.
Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.