市场调查报告书
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1470395
微影製程设备市场:按类型、波长、光源、最终用户划分 - 2024-2030 年全球预测Photolithography Equipment Market by Type (ArF, ArFi, DUV), Wavelength (270 nm-170 nm, 370 nm-270 nm, 70 nm-1 nm), Light source, End User - Global Forecast 2024-2030 |
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预计2023年微影製程设备市场规模为118.6亿美元,预计2024年将达129.2亿美元,2030年将达224.7亿美元,复合年增长率为9.55%。
微影製程设备是指微影术刻製程所使用的专用机器和工具,光刻製程是半导体装置製造的关键步骤。此製程将掩模上的几何特征转移到硅晶圆的表面上。微影製程设备市场包括微影术刻製程中使用的机器的製造、分销和销售。微影术工艺是半导体製造中的重要工艺,它使用光源将图案转移到基板上。对微影製程设备的潜在需求归因于全球半导体製造以及每个细分市场对智慧和微型电子产品的持续采用,从而推动了市场成长。微影製程在微孔和微柱阵列製造上的使用越来越多,也增加了对微影製程设备的需求。安装微影製程设备的高成本、设计限制以及微影製程设备功能的性能问题仍然是影响设备效率的持续技术挑战。生命科学产业对微加工材料的需求不断增长,以及晶片器官的出现和进步,为设备製造商创新和提供解决方案来满足这一不断发展的领域提供了新的机会。
主要市场统计 | |
---|---|
基准年[2023] | 118.6亿美元 |
预测年份 [2024] | 129.2亿美元 |
预测年份 [2030] | 224.7亿美元 |
复合年增长率(%) | 9.55% |
类型:半导体製造中对ArF微影术的极大偏好
氟化氩 (ArF)微影製程设备使用波长为 193 nm 的雷射。这些系统专为深紫外线 (DUV)微影术而设计,通常用于需要 90 至 45 奈米特征尺寸的应用。 ArFi(氟化氩浸没)微影术设备是ArF设备的演进。采用液浸技术,将高屈光的液体置于晶圆和透镜之间,进一步提高解析度。这允许对更小的特征进行成像,覆盖约 65 奈米或更小的节点。当需要极其精细的图案时,例如在先进的记忆体和逻辑装置中,它是特别优选的。 DUV微影术包括在深紫外线区域运作的微影术系统,包括 ArF 和 KrF。这些系统非常适合形成 250 nm 以下的形貌。 EUV(极紫外光微影术)是最先进的微影製程设备,使用仅 13.5 nm 的极短波长。 10 nm 或更小的精细加工成为可能,使积体电路小型化超越 DUV微影术的限製成为可能。
I线微影术设备使用波长为365 nm的汞灯。儘管分辨率不如 DUV 和 EUV,但 I-Line 对于某些应用而言具有成本效益,并且通常用于成熟的半导体製程和简单的几何形状(通常为 350 奈米及以上)。氟化氪 (KrF)微影术设备的工作波长为 248 nm,适合将小至约 130-150 nm 的特征图形化。当需要中间解析度时,会选择 KrF 设备,并且在製造具有较大特征尺寸的电路时,它比 ArF 设备具有更高的吞吐量和成本效率。在解析度方面,EUV 和 ArFi 技术引领这一领域,为先进半导体节点提供最小的特征尺寸。 EUV 越来越受欢迎,尤其是在 5nm 以下节点,但较高的成本和复杂性使 ArFi 成为不太先进节点的首选。包括 ArF 和 KrF 在内的 DUV 技术对于非先进半导体製程非常重要,这些製程仍占据市场的大部分。其相对较低的成本和高吞吐量使其成为许多製造商的首选。 i-Line 是这些技术中最古老且成本最低的技术,非常适合不需要最高等级解析度的非关键层和大型特征。
最终用户:晶圆代工厂更多地使用最先进的微影製程设备来支援主流大规模生产
晶圆代工厂,也称为半导体製造厂 (fabs),生产硅晶圆,由各种客户加工成积体电路。这些客户经常外包给代工厂,要么是因为他们需要更多工具来内部製造晶圆,要么是因为他们更喜欢外包的成本效益。集成设备製造商 (IDM) 一站式设计、製造和销售半导体产品。 IDM的业务范围从大批量、成熟的产品线到利基最尖端科技,对于平衡性能和成本的微影製程设备有着明显的偏好。在微影製程设备方面,晶圆代工厂和 IDM 之间的主要区别在于对客製化和技术领先的需求。晶圆代工厂通常需要最新、最好的产品,以保持对各种客户的竞争力。另一方面,IDM 需要能够处理各种产品的多功能设备,并且可能采用更具成本效益且更适合其垂直整合营运的成熟技术。
区域洞察
美洲(尤其是北美)对微影製程设备的需求受到成熟半导体製造商和投资先进电子产品的高科技巨头的推动。该地区研发投入持续不断,高科技产业对微影製程设备的需求依然强劲。然而,由于半导体製造工厂有限且集中在其他产业领域,南美洲的需求相对较低。欧洲由于其在汽车、工业和先进製造领域的领先地位,对高端微影术系统保持着强劲的需求。中东的半导体领域正在蓬勃发展,并显示出高科技产业和自由区投资的成长潜力。非洲是一个新兴市场,随着该地区技术基础设施的发展,可能会带来长期成长机会。亚太地区对微影製程设备的需求很高,特别是因为半导体生产集中在台湾、韩国、中国和日本等国家。该地区的需求得到政府激励措施、庞大的消费电子产业以及众多半导体代工厂的建立的支持。随着亚太国家大力投资半导体自给自足和先进製造能力,需求加速预计将持续。
FPNV定位矩阵
FPNV定位矩阵对于评估微影製程设备市场至关重要。我们检视与业务策略和产品满意度相关的关键指标,以对供应商进行全面评估。这种深入的分析使用户能够根据自己的要求做出明智的决策。根据评估,供应商被分为四个成功程度不同的像限。最前线 (F)、探路者 (P)、利基 (N) 和重要 (V)。
市场占有率分析
市场占有率分析是一种综合工具,可以对微影製程设备市场供应商的现状进行深入而详细的研究。全面比较和分析供应商在整体收益、基本客群和其他关键指标方面的贡献,以便更好地了解公司的绩效及其在争夺市场占有率时面临的挑战。此外,该分析还提供了对该细分市场竞争特征的宝贵见解,包括在研究基准年观察到的累积、分散主导地位和合併特征等因素。详细程度的提高使供应商能够做出更明智的决策并制定有效的策略,以获得市场竞争优势。
1. 市场渗透率:提供有关主要企业所服务的市场的全面资讯。
2. 市场开拓:我们深入研究利润丰厚的新兴市场,并分析其在成熟细分市场的渗透率。
3. 市场多元化:包括新产品发布、开拓地区、最新发展和投资的详细资讯。
4.竞争评估与资讯:对主要企业的市场占有率、策略、产品、认证、监管状况、专利状况、製造能力等进行全面评估。
5. 产品开发与创新:包括对未来技术、研发活动以及突破性产品开发的见解。
1.微影製程设备市场的市场规模与预测是多少?
2.在微影製程设备市场预测期内,我们应该考虑投资哪些产品与应用?
3.微影製程设备市场的技术趋势与法规结构是什么?
4.微影製程设备市场主要厂商的市场占有率如何?
5.进入微影製程设备市场的合适形式和策略手段是什么?
[185 Pages Report] The Photolithography Equipment Market size was estimated at USD 11.86 billion in 2023 and expected to reach USD 12.92 billion in 2024, at a CAGR 9.55% to reach USD 22.47 billion by 2030.
Photolithography equipment refers to the array of specialized machines and tools used in the photolithography process, which is a critical step in semiconductor device fabrication. This process involves transferring geometric shapes on a mask to the surface of a silicon wafer. The photolithography equipment market comprises the manufacturing, distribution, and sales of machinery used in the photolithography process, an essential step in semiconductor fabrication where patterns are transferred onto a substrate using a light source. Potential demand for photolithography equipment attributed to global semiconductor manufacturing and the rising adoption of smart and miniature electronic devices across sectors are driving market growth. Increasing utilization of photolithography in producing microwells and micropillar arrays is also propelling the need for photolithography equipment. The high deployment cost of photolithography equipment and design limitations and performance issues of photolithography equipment features pose persistent technological challenges that impact equipment efficacy. The increasing need for microfabricated materials in the life sciences industry and the emergence and advancements in organs-on-chip present new opportunities for equipment makers to innovate and provide solutions that cater to this advancing field.
KEY MARKET STATISTICS | |
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Base Year [2023] | USD 11.86 billion |
Estimated Year [2024] | USD 12.92 billion |
Forecast Year [2030] | USD 22.47 billion |
CAGR (%) | 9.55% |
Type: Significant preference for ArF lithography for semiconductor manufacturing
Argon fluoride (ArF) photolithography equipment uses a laser that operates at a wavelength of 193 nm. These systems are designed for deep ultraviolet (DUV) lithography and are typically used in applications requiring 90 to 45 nanometers feature sizes. ArFi, or argon fluoride immersion, lithography equipment is an advanced version of ArF tools. They utilize immersion techniques to increase the resolution further by having a liquid with a higher refractive index between the wafer and the lens. This enables imaging of even smaller features, with an application range for nodes approximately 65 nanometers or below. It is particularly favored when extremely fine patterns are necessary, such as in advanced memory and logic devices. DUV lithography encompasses photolithography systems, including ArF and KrF, that operate within the deep ultraviolet spectrum. These systems are ideal for forming geometries that are 250 nm or smaller. EUV (extreme ultraviolet lithography) represents the cutting-edge class of photolithography equipment using an extremely short wavelength of just 13.5 nm. It enables integrated circuit scaling beyond the limits of DUV lithography by enabling patterning of sub-10 nm features.
I-Line lithography equipment uses a mercury lamp emitting a wavelength of 365 nm. Though it lacks the resolution capabilities of DUV or EUV systems, I-Line is cost-effective for certain applications and is often used for mature semiconductor processes or simpler geometries typically above 350 nanometers. Krypton fluoride (KrF) photolithography tools operate at a wavelength of 248 nm and are suited for patterning features down to roughly 130 to 150 nanometers. KrF systems are chosen for intermediate resolution needs, providing better throughput and cost efficiency than ArF systems when manufacturing circuits with larger feature sizes. In terms of resolution, EUV and ArFi technologies lead the field, offering the smallest feature sizes for the most advanced semiconductor nodes. While EUV has been gaining traction, especially in the 5nm and below nodes, its higher cost and complexity make ArFi the preferred choice for slightly less advanced nodes. DUV technologies, including ArF and KrF, remain critical for less advanced semiconductor processes that still comprise a large portion of the market. Their relatively lower cost and high throughput make them suitable choices for many manufacturers. I-Line, among the oldest of these technologies, is the least costly and is ideal for non-critical layers or larger geometries where top-tier resolution is unnecessary.
End User: Rising use of cutting-edge photolithography equipment for foundries to cater the high volume mainstream production
Foundries, also known as semiconductor fabrication plants or fabs, manufacture silicon wafers, which are then processed into integrated circuits by various clients. These clients often outsource to foundries as they either need more means to produce these wafers themselves or prefer the cost-effectiveness of outsourcing. Integrated device manufacturers (IDM) design, manufacture, and sell semiconductor products under one roof. They have a distinct preference for photolithography equipment that balances performance and cost, as their operations often span high-volume, mature product lines to niche, cutting-edge technologies. The primary difference between foundries and IDMs in terms of photolithography equipment lies in their need for customization and technology leadership. Foundries often demand the latest and greatest to stay competitive for various clients. IDMs, on the other hand, require versatile equipment that can handle a wide range of products, sometimes yielding to matured technology that is more cost-effective and suitable for their in-house, vertically integrated operations.
Regional Insights
The demand for photolithography equipment in the Americas, particularly North America, is driven by well-established semiconductor manufacturers and the presence of tech giants investing in advanced electronics. The region sees consistent investment in research and development, keeping the tech industry's demand for photolithography equipment robust. However, South America's demand is relatively low due to the limited presence of semiconductor fabrication plants and a focus on other industrial sectors. Europe maintains a strong demand aligned with its leadership in automotive, industrial, and advanced manufacturing sectors, necessitating high-end photolithography systems. The Middle East, while burgeoning in the semiconductor sector, shows potential for growth with investments in high-tech industries and free zones. Africa is an emerging market that potentially offers long-term growth opportunities as the technological infrastructure evolves in the region. The Asia-Pacific region has a significant demand for photolithography equipment due to the high concentration of semiconductor production, particularly in countries such as Taiwan, South Korea, China, and Japan. This region's demand is bolstered by government incentives, a vast consumer electronics sector, and the establishment of numerous semiconductor foundries. The accelerated demand is likely to continue as APAC countries invest heavily in semiconductor self-sufficiency and advanced manufacturing capabilities.
FPNV Positioning Matrix
The FPNV Positioning Matrix is pivotal in evaluating the Photolithography Equipment Market. It offers a comprehensive assessment of vendors, examining key metrics related to Business Strategy and Product Satisfaction. This in-depth analysis empowers users to make well-informed decisions aligned with their requirements. Based on the evaluation, the vendors are then categorized into four distinct quadrants representing varying levels of success: Forefront (F), Pathfinder (P), Niche (N), or Vital (V).
Market Share Analysis
The Market Share Analysis is a comprehensive tool that provides an insightful and in-depth examination of the current state of vendors in the Photolithography Equipment Market. By meticulously comparing and analyzing vendor contributions in terms of overall revenue, customer base, and other key metrics, we can offer companies a greater understanding of their performance and the challenges they face when competing for market share. Additionally, this analysis provides valuable insights into the competitive nature of the sector, including factors such as accumulation, fragmentation dominance, and amalgamation traits observed over the base year period studied. With this expanded level of detail, vendors can make more informed decisions and devise effective strategies to gain a competitive edge in the market.
Key Company Profiles
The report delves into recent significant developments in the Photolithography Equipment Market, highlighting leading vendors and their innovative profiles. These include Applied Materials, Inc., ASML Holding N.V., Canon Inc., Carl Zeiss AG, Eulitha AG, EV Group, Holmarc Opto-Mechatronics Ltd., HORIBA Group, JEOL Ltd., KLA Corporation, Lam Research Corporation, Micro Electronics Equipment (Group) Co., Ltd., Neutronix Quintel, Inc., Newport Corporation, Nikon Corporation, NuFlare Technology, Inc., Omega Optical, LLC, Onto Innovation Inc., Osiris International GmbH, Samsung Electronics Co., Ltd., Service Support Specialties, Inc., SUSS MicroTec SE, Taiwan Semiconductor Manufacturing Company Limited, and Veeco Instruments Inc..
Market Segmentation & Coverage
1. Market Penetration: It presents comprehensive information on the market provided by key players.
2. Market Development: It delves deep into lucrative emerging markets and analyzes the penetration across mature market segments.
3. Market Diversification: It provides detailed information on new product launches, untapped geographic regions, recent developments, and investments.
4. Competitive Assessment & Intelligence: It conducts an exhaustive assessment of market shares, strategies, products, certifications, regulatory approvals, patent landscape, and manufacturing capabilities of the leading players.
5. Product Development & Innovation: It offers intelligent insights on future technologies, R&D activities, and breakthrough product developments.
1. What is the market size and forecast of the Photolithography Equipment Market?
2. Which products, segments, applications, and areas should one consider investing in over the forecast period in the Photolithography Equipment Market?
3. What are the technology trends and regulatory frameworks in the Photolithography Equipment Market?
4. What is the market share of the leading vendors in the Photolithography Equipment Market?
5. Which modes and strategic moves are suitable for entering the Photolithography Equipment Market?