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市场调查报告书
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1560201

金属溅镀靶材市场报告：2030 年趋势、预测与竞争分析

Metal Sputtering Target Material Market Report: Trends, Forecast and Competitive Analysis to 2030
出版日期: | 出版商: Lucintel | 英文 150 Pages | 商品交期: 3个工作天内

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简介目录

金属溅镀靶材的发展趋势与预测

预计2030年，全球金属溅镀靶材市场将达到约47亿美元，2024年至2030年的复合年增长率为5.8%。该市场的主要驱动力是这种材料在太阳能电池行业中大量用于薄膜太阳能电池涂层、对高品质纹理薄膜和颗粒的需求不断增加，以及基于这种材料的 3D 列印的偏好不断增加。全球金属溅镀靶材市场前景广阔，半导体、太阳能和平板显示应用领域充满机会。

Lucintel 预测，由于纯金属在金属溅镀靶材生产中的大量使用，因此纯金属将继续成为较大的细分市场。

在该市场中，由于在玻璃和触控萤幕电极的生产中越来越多地使用金属溅镀靶材，预计平板显示器在预测期内将出现最高增长。

金属溅镀靶材市场新趋势

金属溅镀靶材所用材料的市场正在发生变化，新趋势影响着产业营运和技术创新。这些趋势将影响溅镀材料在各个领域的需求、生产方法和应用。目前影响市场的五个最重要的趋势概要如下。

  • 电子产品的小型化：随着电子产品变得越来越小，对能够实现高精度和高性能的溅镀靶材的需求不断增加。这一趋势正在影响新型材料的创造，以满足现代对更小、更节能组件的需求，例如半导体製造中的组件。
  • 环保製造：环境问题促使製造商采用环保製造流程。这方面的一个例子是使用永续投入和节能生产方法。此外，作为其对全球永续性目标承诺的一部分，该公司致力于最大限度地减少溅镀靶材製造过程中的废弃物和排放。
  • 先进材料的开发：具有改进性能的先进材料的开发，例如高纯度、改进的导电性和耐用性，正在引起人们的注意。这一趋势与航太等高科技应用尤其相关，其中溅镀靶材的性能会对最终产品产生重大影响。这一趋势是由新型合金和复合材料的探索所推动的。
  • 可再生能源的成长：太阳能电池板和风力发电机正在成为流行的可再生能源，扩大了溅镀靶材的市场。然而，能量转换和储存设备中使用的薄膜涂层需要这些材料。由于这些趋势，人们正在投资开发专门针对可再生能源应用最佳化的溅镀靶材。
  • 专注于成本效率：面临激烈竞争的製造商正在寻找在不影响品质的情况下降低生产成本的方法。这包括优化製造流程、使用更便宜的材料以及提高产量。此外，公司正在探索联盟和合併，以实现溅镀靶材生产的规模经济。

这些未来方向将从根本上改变金属溅镀靶材市场的技术创新、永续性和成本效益。随着产业的变化，这些发展将成为决定产业最终路径的关键。

金属溅镀靶材市场近期趋势

金属溅镀靶材市场目前正在经历许多变化，这些变化正在改变全球供应链和技术进步。这些变化是由可再生能源、电子和汽车等各个行业不断增长的需求所推动的。以下是塑造该市场的五个关键驱动因素。

  • 投资半导体产业：金属溅镀靶材业务持续受到半导体产业的启发。本公司正大力投资研发活动，旨在开发满足半导体製造（特别是先进节点）相关严格要求的高纯度靶材。
  • 提高产能：许多公司正在扩大产能，以满足不断成长的溅镀靶材需求。此次扩张包括建立新的製造工厂和升级现有设施，以提高产量和效率，特别是在中国和日本等亚太地区。
  • 创新技术开发：在材料科学中，技术创新正在推动新型溅镀靶材的诞生，其性能超越了前辈。这包括开发具有更高热稳定性、更高纯度水平以及在高温条件下具有更好性能的靶材，特别是对于航太和国防工业。
  • 策略伙伴关係与协作：伙伴关係和协作现在对企业来说是创新和拓展市场的重要方式。这种伙伴关係关係通常涉及材料供应商（主要是电子製造商）之间的合资企业，为特定应用生产客製化溅镀靶材。
  • 对永续性的承诺：对永续性的日益关注导致采用环保方法来製造溅镀靶材。这包括采用绿色技术，旨在透过使用回收材料来减少公司的碳排放，并减少製造过程中消耗的能源。

因此，成长、创新和永续性是金属溅镀靶材市场中受这些因素影响的一些催化剂。随着产业继续经历进一步转型，这些关键里程碑对于塑造其未来发展方向至关重要。

金属溅镀靶材市场的策略性成长机会

金属溅镀靶材产业的各种应用提供了许多策略成长机会。例如，电子、能源和汽车行业的技术进步和需求增加正在推动这一趋势。以下五个市场趋势将决定其未来。

  • 半导体製造：溅镀靶材是半导体产业发展的巨大机会。随着电子设备变得更小、更快、更有效率，对高纯度溅镀靶材的需求不断增加。该领域的创新可以为公司提供竞争优势，特别是随着全球半导体市场的扩张。
  • 可再生能源应用：太阳能电池板和风力发电机等可再生能源技术的日益使用正在增加溅镀靶材的消费量。此类产品可应用于能量转换装置中使用的薄膜涂层。专注于开发符合可再生能源需求的溅镀靶材的公司可以开拓这一成长领域。
  • 汽车产业：电动车（EV）和先进驾驶辅助系统（ADAS）正在增加汽车产业对高性能溅镀靶材的需求。这些材料用于製造电动车和 ADAS 所必需的感测器等电子元件，这些材料的生产商在可预见的未来将拥有巨大的成长机会。
  • 航太和国防：国防部门也需要具有高热稳定性和耐用性的溅镀靶材，这需要极高的性能。生产具有独特性能、满足严格要求的定製材料是推动溅镀靶材领域进一步市场开拓的关键策略。
  • 显示技术：在显示技术领域，溅镀靶材常用于沉积OLED、LCD等显示器的薄膜。因此，随着对柔性萤幕和高清显示器的需求不断增加，对于能够设计提高显示效率和性能的靶材溅镀材料的公司来说，存在着诱人的成长潜力。

这些策略性成长机会正在推动金属溅镀靶材市场的创新和扩张。透过利用这些机会，公司可以在高度竞争的环境中占据有利地位，从而获得长期成功。

金属溅镀靶材市场的驱动因素与挑战

金属溅镀靶材市场受到各种市场驱动因素和挑战的影响，包括技术进步、经济考量和监管问题。关注这些因素对于了解市场动态非常重要。以下是塑造市场动态的五个关键驱动因素和三个关键挑战。

推动金属溅镀靶材市场的因素是：

1.技术进步：电子和半导体技术的不断进步推动了半导体製造（尤其是先进节点）对高效能溅镀靶材的需求。

2.消费性电子产品需求增加：由于智慧型手机、平板电脑、穿戴式装置等的增加，以溅镀生产电子元件将带动市场成长。

3.可再生能源领域的扩张：随着太阳能板和风力发电机等能源系统的采用，能量转换和储存设备的应用正在推动这一趋势，增加了对溅镀靶材使用的需求。

4.汽车工业的成长：向电动车的转变和ADAS（高级驾驶辅助系统）的进步需要高品质的溅镀靶材，特别是用于汽车内的电子元件和感测器。

5.增加研发投入：为了满足产业相关人员的需求，公司正在投入大量研究来开发具有更好性能的创新溅镀靶材，例如高纯度水准和热稳定性。

金属溅镀靶材市场面临的挑战是：

1.製造成本高：製造高纯度溅镀靶材需要先进的技术及工艺，导致製造成本高。

2. 监管合规性：从环保角度来看，溅镀靶材市场受到严格监管。这些法规增加了进入该市场的公司的製造成本并限制了新进入。

3. 供应链中断：该市场依赖的原料供应可能会因衝突、禁运或自然灾害而中断。这会增加价格并影响用户可用的数量。

金属溅镀靶材市场受到技术进步和重点产业需求成长的支撑，但也面临生产成本高和监管合规等挑战。在这种竞争环境中取得成功取决于成功地利用这些力量和障碍。

金属溅镀靶材依细分领域

本研究包括按类型、应用和地区对全球金属溅镀靶材进行预测。

各国金属溅镀靶材各国市场展望

电子、能源和汽车工业等各个领域的技术进步和需求不断增长正在推动金属溅镀靶材市场的成长。美国、中国、德国、印度和日本等领导企业正在塑造全球市场动态，这些企业正在推动创新和生产能力。在这里我们介绍这些地区的最新趋势。

  • 美国：美国在半导体製造和可再生能源方面取得了长足进展。为此，对高纯度金属溅镀靶材的需求不断增加。特别是，提高电子产品溅镀效率和性能的新材料和合金的研究和开发正在取得进展。材料科学是由研究机构和产业领导者之间的策略伙伴关係关係所推动的。
  • 中国：中国仍然是主导者，大规模投资旨在扩大产能。该国的主要目标之一是半导体产业的成长，该产业严重依赖金属溅镀靶材。中国製造商也考虑在溅射靶材应用中使用稀土，以获得先进技术工具的竞争优势。
  • 德国：德国的先进製造彻底改变了金属溅镀靶材市场。该国对高性能溅镀材料进行前沿研究，特别是用于汽车和航太领域。德国公司正在与大学合作研究新材料成分和製造这些产品的流程。
  • 印度 印度的电子工业和可再生能源工业使印度成为金属溅镀靶材市场的主要企业。随着政府推动本地生产，製造商正在增加对溅镀靶材製造工厂的投资。有鑑于此，印度公司越来越多地利用现代技术来生产可跨境运输的优质产品。
  • 日本：日本处于生产高纯度金属溅镀靶材的前沿，主要用于电子产业。日本公司正专注于技术创新，旨在创造改进晶片製造流程的新材料。此外，该国还寻求透过使用环保的生产方法来减少目标製造业的生态足迹。

常问问题

Q.1 金属溅镀靶材的市场规模有多大？

A1. 至2030年，全球金属溅镀靶材市场预计将达到47亿美元。

Q.2 金属溅镀靶材市场的成长预测如何？

A2. 预计2024年至2030年全球金属溅镀靶材市场将以5.8%的复合年增长率成长。

Q.3 影响金属溅镀靶材市场成长的关键驱动因素有哪些？

A3. 该市场的主要驱动力是这种材料在太阳能电池行业中薄膜太阳能电池涂层的大量使用、对高品质纹理薄膜和颗粒的需求不断增长，以及基于这种材料的3D 列印的需求不断增长。

Q4.市场的主要细分市场是：

A4. 金属溅镀靶材市场前景广阔，在半导体、太阳能和平板显示器应用领域中存在机会。

Q5.市场的主要企业是：

A5. 金属溅镀靶材的主要企业如下：

  • JX Nippon Mining & Metals
  • Praxair
  • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • Grikin Advanced Material

Q6.未来最大的细分市场是什么？

A6.Lucintel 预测，纯金属将继续成为一个更大的细分市场，因为它们被大量用于金属溅镀靶材的生产。

Q7. 未来五年预计哪些地区的市场成长最大？

由于该地区半导体和数位电子产业溅镀靶材产品的利用率不断增加，预计 A7.APAC 在预测期内将出现最高成长。

Q8. 可以客製化报告吗？

A8. 是的，Lucintel 提供 10% 的客製化服务，无需额外付费。

目录

第一章执行摘要

第二章全球金属溅镀靶材市场：市场动态

  • 简介、背景、分类
  • 供应链
  • 产业驱动因素与挑战

第三章 2018-2030年市场趋势及预测分析

  • 宏观经济趋势（2018-2023）与预测（2024-2030）
  • 全球金属溅镀靶材市场趋势（2018-2023）与预测（2024-2030）
  • 全球金属溅镀靶材市场，依类型
    • 纯金属
    • 合金
  • 全球金属溅镀靶材市场（依应用）
    • 半导体
    • 太阳能
    • 平面显示器

第四章 2018-2030年区域市场趋势及预测分析

  • 全球金属溅镀靶材市场区域分布
  • 北美金属溅镀靶材市场
  • 欧洲金属溅镀靶材市场
  • 亚太金属溅镀靶材市场
  • 其他地区金属溅镀靶材市场

第五章 竞争分析

  • 产品系列分析
  • 营运整合
  • 波特五力分析

第六章 成长机会与策略分析

  • 成长机会分析
    • 全球金属溅镀靶材市场的成长机会（按类型）
    • 全球金属溅镀靶材市场应用的成长机会
    • 全球金属溅镀靶材市场按地区成长机会
  • 全球金属溅镀靶材市场新趋势
  • 战略分析
    • 新产品开发
    • 全球金属溅镀靶材市场产能扩张
    • 全球金属溅镀靶材市场併购及合资企业
    • 认证和许可

第七章主要企业概况

  • JX Nippon Mining & Metals
  • Praxair
    • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • GRIKIN Advanced Material
简介目录

Metal Sputtering Target Material Trends and Forecast

The future of the global metal sputtering target material market looks promising with opportunities in the semiconductor, solar energy, and flat panel display applications. The global metal sputtering target material market is expected to reach an estimated $4.7 billion by 2030 with a CAGR of 5.8% from 2024 to 2030. The major drivers for this market are significant use of this material in the solar industry for thin-film solar cell coatings, growing demand for high-quality texture films and particles, and increasing preference for this material based 3D printing.

Lucintel forecasts that pure metal will remain the larger segment due to the its substantial usage in the production of metal sputtering targets.

Within this market, flat panel display is expected to witness highest growth over the forecast period due to growing use of metal sputtering target materials in the production of glass and touch screen electrodes.

Emerging Trends in the Metal Sputtering Target Material Market

The market for materials used in metal sputtering targets is changing with new trends influencing how the industry operates and enhancing innovation. These trends affect demand, production methods, and uses of sputter materials across different sectors. Outlined below are the five most critical trends that currently impact the market.

  • Electronics Miniaturization: As electronics become smaller in size, there is a growing need for sputtering targets that can deliver high precision and performance. This drift has influenced the creation of new kinds of materials that meet modern demands like those seen in semiconductor manufacturing towards tinier, more energy-efficient components.
  • Environmentally Friendly Manufacturing: Environmental concerns have made manufacturers embrace green manufacturing processes. A case in point is the use of sustainable inputs and energy-efficient modes of production. Moreover, companies are striving to minimize waste and emissions during sputtering target productions as part of their commitment to global sustainability goals.
  • Advanced Material Development: The development of advanced materials with improved properties, such as higher purity, better conductivity, and improved durability, is gaining prominence. This trend is especially relevant in high-tech applications like aerospace where the performance of sputtering targets can have a significant effect on the final product. This trend is being driven by research into new alloys and composites.
  • Growth in Renewable Energy: Solar panels and wind turbines are becoming more popular forms of renewable energy resources that have an increasing market for sputtering targets. However, these materials are necessary for thin-film coatings used in energy conversion and storage devices. As a result of this trend, there have been investments in creating sputtering targets that would be specifically optimized for use in renewable energy applications.
  • Increased Focus on Cost Efficiency: Manufacturers under stiff competition are seeking ways to lower production costs without affecting quality. This includes optimizing the manufacturing process, using cheaper materials, and improving production yields. Moreover, companies are exploring partnerships and mergers to achieve economies of scale in sputtering target production.

These future directions are essentially altering the metal sputtering target material market using innovation, sustainability, and cost-effectiveness. As industries change, these developments will probably be key in determining the ultimate path of the industry.

Recent Developments in the Metal Sputtering Target Material Market

The market for metal sputtering target material is currently experiencing a lot of changes that are transforming global supply chains and technological advancements. These changes have been triggered by the rise in demand in different fields such as renewable energy, electronics, and automotive. Below are five key drivers shaping this market.

  • Investments in the Semiconductor Industry: Metal sputtering target business continues to receive impetus from the semiconductor industry. Companies are investing heavily in R&D activities aimed at developing high-purity targets that meet stringent requirements of semiconductor manufacturing particularly those related to advanced nodes.
  • Increase in Production Capacities: Many companies are expanding their production capacities to serve the growing demand for sputtering targets. This expansion encompasses setting up new manufacturing plants and upgrading existing facilities to improve output and efficiency, especially in Asia-Pacific regions like China and Japan.
  • Innovative Technological Developments: In material science, innovation has facilitated the creation of novel sputtering targets with properties that surpass preceding ones. These include the development of targets having improved thermal stabilities, enhanced purity levels as well as better performance even under high-temperature conditions specifically for aerospace and defense industries.
  • Strategic Partnerships and Collaborations: Partnerships and collaborations are now vital to companies as a way of initiating innovation and broadening their markets. In many cases, such partnerships involve joint ventures between material suppliers, mainly producers of electronic equipment to make customized sputtering targets for defined applications.
  • Sustainability Initiatives: The emphasis on sustainability has resulted in the adoption of eco-friendly methods of producing sputtering targets. These include embracing green technologies aimed at reducing their companies' carbon footprint through the utilization of recycled materials and cutting down energy consumed in manufacturing processes.

Consequently, growth, innovations, and sustainability are some catalysts that have been affected by these factors in the metal sputtering target material market. Going forward, these major milestones will be pivotal in shaping its future route as the industry transforms further.

Strategic Growth Opportunities for Metal Sputtering Target Material Market

Various applications in the metal sputtering target material industry are offering an array of strategic growth opportunities. These spellings are being driven by technological improvements and increasing demands within the electronic, energy, and automotive industries for example. The following five market trends will define its future.

  • Semiconductor Manufacturing: Sputtering target materials is a major opportunity for the semiconductors industry to grow. Smaller, faster, and more efficient electronic devices have led to increasing demand for high-purity sputtering targets. Innovations in this area can give companies a competitive advantage especially as global semiconductor markets expand.
  • Renewable Energy Applications: The increased usage of renewable energy technologies such as solar panels and wind turbines has led to increased consumption of sputtering targets. Such products find application in thin film coatings used in energy conversion devices. Companies that focus on developing sputter targets matched with renewable energy needs can explore this growing sector.
  • Automotive industry: Given electric vehicles (EVs) and advanced driver-assistance systems (ADAS), the automotive industry has a rising requirement for high-performance sputtering targets. For its foreseeable future, the producers of these substances who are to be used in manufacturing electronic parts, such as sensors critical to EVs and ADAS, will have a great opportunity for growth.
  • Aerospace and Defense: Highly thermal stable and durable sputtering targets are demanded by the defense sector which needs extreme performance as well. The production of made-to-order materials with unique properties that meet strict requirements is an important strategy driving further market development in the field of sputtering targets.
  • Display Technology: The display technology sector relies heavily on sputtering targets for thin film deposition in displays such as OLED and LCD screens. Therefore, there is an attractive growth possibility for firms capable of designing targeted sputtering material enhancing display efficiency and performance, due to increased demand for flexible screens and high-definition displays.

These strategic growth opportunities are driving innovation and expansion in the metal sputtering target material market. By capitalizing on these opportunities, companies can position themselves advantageously in a very competitive environment leading to long-term success.

Metal Sputtering Target Material Market Driver and Challenges

The market for metal sputtering target materials is influenced by various drivers and challenges like technology advancements, economic considerations, and regulatory issues. To understand the dynamics of the market, it is very crucial to note these factors. Following are five main drivers and three key challenges that shape the market dynamics.

The factors responsible for driving the metal sputtering target material market include:

1. Technological Advancements: The demand for high-performance sputtering targets required in semiconductor manufacturing, particularly in advanced nodes is driven by continuous developments in electronics and semiconductor technologies.

2. Growing Demand for Consumer Electronics: The production of electronic components through sputtering leads to market growth because of the increase in smartphones, tablet computers, wearable devices, etc.

3. Expansion of Renewable Energy Sector: The energy conversion and storage equipment applications are driving this trend by the adoption of energy systems such as solar panels and wind turbines leading to an increasing need for the use of sputtering targets

4. Automotive Industry Growth: High-quality sputtering targets used especially for electronic components & sensors within vehicles are required due to the electric vehicle shift as well as advancement towards ADAS (Advanced Driver Assistance Systems).

5. Increased Investment in R&D: To meet the demands of industry players companies are heavily investing in research aiming at coming up with innovative sputter target materials with better properties like higher purity levels or better thermal stability.

Challenges in the metal sputtering target material market are:

1. High Production Costs: Making high-purity sputtering targets needs advanced technology and processes, which result in expensive manufacturing, a position that is beyond the reach of most small enterprises.

2. Regulatory Compliance: The sputtering target material market is heavily regulated in terms of environmental protection. These regulations add production costs for companies venturing into this market and limit newcomers.

3. Supply Chain Disruptions: The market depends on raw material supplies whose availability may be hampered by conflicts, embargoes as well as natural calamities. This raises prices and affects the volumes available to users.

The metal sputtering target material market works on technological improvements as well as increasing demand from key industries; however, it has also been hit with challenges such as high production expenses and adherence to laws. Success within this competitive environment partly hinges on negotiating these forces alongside obstacles.

List of Metal Sputtering Target Material Companies

Companies in the market compete on the basis of product quality offered. Major players in this market focus on expanding their manufacturing facilities, R&D investments, infrastructural development, and leverage integration opportunities across the value chain. With these strategies metal sputtering target material companies cater increasing demand, ensure competitive effectiveness, develop innovative products & technologies, reduce production costs, and expand their customer base. Some of the metal sputtering target material companies profiled in this report include-

  • JX Nippon Mining & Metals
  • Praxair
  • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • Grikin Advanced Material

Metal Sputtering Target Material by Segment

The study includes a forecast for the global metal sputtering target material by type, application, and region.

Metal Sputtering Target Material Market by Type [Analysis by Value from 2018 to 2030]:

  • Pure Metal
  • Alloy

Metal Sputtering Target Material Market by Application [Analysis by Value from 2018 to 2030]:

  • Semiconductor
  • Solar Energy
  • Flat Panel Display

Metal Sputtering Target Material Market by Region [Analysis by Value from 2018 to 2030]:

  • North America
  • Europe
  • Asia Pacific
  • The Rest of the World

Country Wise Outlook for the Metal Sputtering Target Material Market

Technological advancements and increased demand in various sectors like the electronics, energy, and automobile industries have boosted growth in the Metal Sputtering Target Materials market. The global market dynamics are shaped by leaders such as the United States, China, Germany, India, and Japan who are driving innovations and production capabilities. This is a glimpse of some of the latest developments in these regions.

  • United States: In the US there have been huge strides when it comes to semiconductor manufacturing as well as renewable energy. This has seen a demand for high-purity metal sputtering targets increase. Research is being done into developing new materials and alloys that improve sputter efficiency and performance of products especially in electronics. Material science is being driven by strategic partnerships between research institutions and industry giants.
  • China: China remains a prominent player with massive investments aimed at expanding production capacities. One major goal of the nation is to grow its semiconductor industry which depends heavily on metal sputtering targets. Chinese manufacturers also consider rare earth metals for use in their sputter target applications to gain a competitive edge in advanced technology tools.
  • Germany: Advanced manufacturing in Germany has revolutionized the metal sputtering target market. This nation is doing cutting-edge research for better-performing sputtering materials which are particularly used in automotive and aerospace sectors. German firms work with universities to make new material compositions and processes for the production of these items.
  • India: India's electronics and renewable energy industries have propelled it forward as a leading player in the market for metal sputtering targets. The government's push to manufacture locally makes manufacturers invest more into sputtering target-making plants. In this light, there is an increased use of modern technologies by Indian companies producing quality stuff that can be shipped across borders.
  • Japan: Japan remains at the forefront of high-purity metal sputtering targets production mainly targeted for the electronics industry. Japanese companies focus on innovations, which are aimed at creating new materials that could enhance the chip-making process. Besides, this country attempts to reduce the ecofootprint of its target making industry by using environmental friendly production methods.

Features of the Global Metal Sputtering Target Material Market

Trend and Forecast Analysis: Market trends (2018 to 2023) and forecast (2024 to 2030) by various segments and regions.

Segmentation Analysis: Metal sputtering target material market size by type, application, and region in terms of value ($B).

Regional Analysis: Metal sputtering target material market breakdown by North America, Europe, Asia Pacific, and Rest of the World.

Growth Opportunities: Analysis of growth opportunities in different types, applications, and regions for the metal sputtering target material market.

Strategic Analysis: This includes M&A, new product development, and competitive landscape of the metal sputtering target material market.

Analysis of competitive intensity of the industry based on Porter's Five Forces model.

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FAQ

Q.1 What is the metal sputtering target material market size?

Answer: The global metal sputtering target material market is expected to reach an estimated $4.7 billion by 2030.

Q.2 What is the growth forecast for metal sputtering target material market?

Answer: The global metal sputtering target material market is expected to grow with a CAGR of 5.8% from 2024 to 2030.

Q.3 What are the major drivers influencing the growth of the metal sputtering target material market?

Answer: The major drivers for this market are significant use of this material in the solar industry for thin-film solar cell coatings, growing demand for high-quality texture films and particles, and increasing preference for this material based 3D printing.

Q4. What are the major segments for metal sputtering target material market?

Answer: The future of the metal sputtering target material market looks promising with opportunities in the semiconductor, solar energy, and flat panel display applications.

Q5. Who are the key metal sputtering target material market companies?

Answer: Some of the key metal sputtering target material companies are as follows:

  • JX Nippon Mining & Metals
  • Praxair
  • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • Grikin Advanced Material

Q6. Which metal sputtering target material market segment will be the largest in future?

Answer: Lucintel forecasts that pure metal will remain the larger segment due to the its substantial usage in the production of metal sputtering targets.

Q7. In metal sputtering target material market, which region is expected to be the largest in next 5 years?

Answer: APAC is expected to witness highest growth over the forecast period due to rising sputtering target product utilization in the semiconductor and digital electronics sectors of the region.

Q.8 Do we receive customization in this report?

Answer: Yes, Lucintel provides 10% customization without any additional cost.

This report answers following 11 key questions:

  • Q.1. What are some of the most promising, high-growth opportunities for the metal sputtering target material market by type (pure metal and alloy), application (semiconductor, solar energy, and flat panel display), and region (North America, Europe, Asia Pacific, and the Rest of the World)?
  • Q.2. Which segments will grow at a faster pace and why?
  • Q.3. Which region will grow at a faster pace and why?
  • Q.4. What are the key factors affecting market dynamics? What are the key challenges and business risks in this market?
  • Q.5. What are the business risks and competitive threats in this market?
  • Q.6. What are the emerging trends in this market and the reasons behind them?
  • Q.7. What are some of the changing demands of customers in the market?
  • Q.8. What are the new developments in the market? Which companies are leading these developments?
  • Q.9. Who are the major players in this market? What strategic initiatives are key players pursuing for business growth?
  • Q.10. What are some of the competing products in this market and how big of a threat do they pose for loss of market share by material or product substitution?
  • Q.11. What M&A activity has occurred in the last 5 years and what has its impact been on the industry?
  • Market Report

Table of Contents

1. Executive Summary

2. Global Metal Sputtering Target Material Market : Market Dynamics

  • 2.1: Introduction, Background, and Classifications
  • 2.2: Supply Chain
  • 2.3: Industry Drivers and Challenges

3. Market Trends and Forecast Analysis from 2018 to 2030

  • 3.1. Macroeconomic Trends (2018-2023) and Forecast (2024-2030)
  • 3.2. Global Metal Sputtering Target Material Market Trends (2018-2023) and Forecast (2024-2030)
  • 3.3: Global Metal Sputtering Target Material Market by Type
    • 3.3.1: Pure Metal
    • 3.3.2: Alloy
  • 3.4: Global Metal Sputtering Target Material Market by Application
    • 3.4.1: Semiconductor
    • 3.4.2: Solar Energy
    • 3.4.3: Flat Panel Display

4. Market Trends and Forecast Analysis by Region from 2018 to 2030

  • 4.1: Global Metal Sputtering Target Material Market by Region
  • 4.2: North American Metal Sputtering Target Material Market
    • 4.2.1: North American Metal Sputtering Target Material Market by Type: Pure Metal and Alloy 4.2.2: North American Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display
  • 4.3: European Metal Sputtering Target Material Market
    • 4.3.1: European Metal Sputtering Target Material Market by Type: Pure Metal and Alloy
    • 4.3.2: European Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display
  • 4.4: APAC Metal Sputtering Target Material Market
    • 4.4.1: APAC Metal Sputtering Target Material Market by Type: Pure Metal and Alloy
    • 4.4.2: APAC Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display
  • 4.5: ROW Metal Sputtering Target Material Market
    • 4.5.1: ROW Metal Sputtering Target Material Market by Type: Pure Metal and Alloy
    • 4.5.2: ROW Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display

5. Competitor Analysis

  • 5.1: Product Portfolio Analysis
  • 5.2: Operational Integration
  • 5.3: Porter's Five Forces Analysis

6. Growth Opportunities and Strategic Analysis

  • 6.1: Growth Opportunity Analysis
    • 6.1.1: Growth Opportunities for the Global Metal Sputtering Target Material Market by Type
    • 6.1.2: Growth Opportunities for the Global Metal Sputtering Target Material Market by Application
    • 6.1.3: Growth Opportunities for the Global Metal Sputtering Target Material Market by Region
  • 6.2: Emerging Trends in the Global Metal Sputtering Target Material Market
  • 6.3: Strategic Analysis
    • 6.3.1: New Product Development
    • 6.3.2: Capacity Expansion of the Global Metal Sputtering Target Material Market
    • 6.3.3: Mergers, Acquisitions, and Joint Ventures in the Global Metal Sputtering Target Material Market
    • 6.3.4: Certification and Licensing

7. Company Profiles of Leading Players

  • 7.1: JX Nippon Mining & Metals
  • 7.2: Praxair
    • 7.1.1: Plansee
  • 7.4: Mitsui Mining & Smelting
  • 7.5: Hitachi Metals
  • 7.6: Honeywell
  • 7.7: Sumitomo Chemical
  • 7.8: ULVAC
  • 7.9: Materion
  • 7.10: GRIKIN Advanced Material