 |
市场调查报告书
商品编码
1567306
极紫外线 (EUV)微影术市场：按类型、按技术、按应用、按地区Extreme Ultraviolet Lithography Market, By Type, By Technology, By Application, By Geography |
||||||
预计2024年全球极紫外（EUV）微影术市场规模为94.2亿美元，预计2031年将达287.6亿美元，2024年至2031年复合年增长率为17.3%。
| 报告范围 | 报告详情 | ||
|---|---|---|---|
| 基准年 | 2023年 | 2024年市场规模 | 94.2亿美元 |
| 实际资料 | 2019-2023 | 预测期 | 2024年至2031年 |
| 预测 2024-2031 年复合年增长率： | 17.30% | 2031年价值预测 | 287.6亿美元 |
极紫外线 (EUV)微影术是一种先进的半导体製造技术，它使用电磁波频谱EUV 区域的短波长光源来生产积体电路。 EUV微影术使用波长约 13.5 nm 的光在硅晶圆上形成微型积体电路。与光学微影相比，EUV微影术有可能提高列印更小节点所需的分辨率，光学微影术使用 193 nm 左右的较短紫外线波长。随着晶片设计不断缩小，电晶体通道达到数十奈米，EUV微影术提供了一种可行的补充技术，使摩尔定律得以延续。随着公司和研究联盟的大量研究投资，EUV微影术正在商业性化大规模生产。
市场动态：
全球极紫外线（EUV）微影术市场的成长受到多种因素的推动，其中包括半导体装置日益小型化，这需要先进的微影术技术来製造晶片。 EUV微影术可以生产小至 10 nm 或更小的积体电路，满足下一代节点的解析度要求。半导体製造商增加投资以扩大晶圆产能和升级製造设备正在推动 EUV微影术设备的采用。然而，与 EUV微影术设备相关的高成本和复杂的功率需求可能会阻碍市场成长。此外，最近全球范围内的氖气等零件短缺也限制了向 EUV 技术的完全过渡。增加研究和开发以提高效率和分辨率，以及扩大光掩模基础设施，将为未来提供新的机会。
本研究的主要特点
本报告对全球极紫外（EUV）微影术市场进行了详细分析，并给出了以2023年为基准年的预测期（2024-2031）的市场规模和復合年增长率。
它还强调了各个细分市场的潜在商机，并说明了该市场有吸引力的投资提案矩阵。
它还提供了有关市场驱动因素、限制因素、机会、新产品发布和核准、市场趋势、区域前景、主要企业采取的竞争策略等的主要考察。
根据公司亮点、产品系列、主要亮点、绩效和策略等参数，对全球极紫外线 (EUV)微影术市场的主要公司进行概况分析。
调查的主要企业包括 ASML Holding NV、尼康公司、Canon Inc.、英特尔公司、三星电子有限公司、台积电（台湾积体电路製造公司）、GlobalFoundries、美光科技公司和应用材料公司。 Research Corporation、KLA Corporation、Tokyo Electron Ltd.、Advantest Ltd.、Hitachi High-Technologies Ltd.、Teradyne, Inc. 等。
该报告的见解使负责人和公司经营团队能够就未来的产品发布、升级、市场扩张和行销策略做出明智的决策。
全球极紫外线 (EUV)微影术市场报告迎合了该行业的各个相关人员，如投资者、供应商、产品製造商、经销商、新进业者和财务分析师。
相关人员可以透过分析全球极紫外线 (EUV)微影术市场时所使用的各种策略矩阵来促进决策。
目录
第一章 研究目的与前提
- 研究目的
- 先决条件
- 简称
第二章 市场展望
- 报告说明
- 市场定义和范围
- 执行摘要
第三章市场动态、法规及趋势分析
- 市场动态
- 促进因素
- 抑制因素
- 市场机会
- 监管场景
- 产业动态
- 併购
- 新系统的引入/核准
- COVID-19 大流行的影响
第 4 章 2019-2031 年全球极紫外线 (EUV)微影术市场（按类型）
- 微影术设备
- 光罩
- 光源
- 其他的
第五章 全球极紫外线 (EUV)微影术市场（按技术）2019-2031
- EUV微影术系统
- 掩模/蚀刻技术
- 其他的
第六章2019-2031 年全球极紫外线 (EUV)微影术市场（依应用）
- 半导体製造
- 微电子学
- 其他的
第7章2019-2031年全球极紫外线（EUV）微影术市场（按地区）
- 北美洲
- 欧洲
- 亚太地区
- 拉丁美洲
- 中东
- 非洲
第八章 竞争格局
- 公司简介
- ASML Holding NV
- Nikon Corporation
- Canon Inc.
- Intel Corporation
- Samsung Electronics Co., Ltd.
- TSMC（Taiwan Semiconductor Manufacturing Company）
- GlobalFoundries
- Micron Technology, Inc.
- Applied Materials, Inc.
- Lam Research Corporation
- KLA Corporation
- Tokyo Electron Limited
- Advantest Corporation
- Hitachi High-Technologies Corporation
- Teradyne, Inc.
第九章 分析师建议
第10章调查方法
- 参考
- 调查方法
Global extreme ultraviolet (EUV) lithography market is estimated to be valued at US$ 9.42 Bn in 2024 and is expected to reach US$ 28.76 Bn by 2031, exhibiting a compound annual growth rate (CAGR) of 17.3% from 2024 to 2031.
| Report Coverage | Report Details | ||
|---|---|---|---|
| Base Year: | 2023 | Market Size in 2024: | US$ 9.42 Bn |
| Historical Data for: | 2019 to 2023 | Forecast Period: | 2024 to 2031 |
| Forecast Period 2024 to 2031 CAGR: | 17.30% | 2031 Value Projection: | US$ 28.76 Bn |
Extreme ultraviolet (EUV) lithography is an advanced semiconductor manufacturing technology that uses short wavelength light sources in the EUV region of the electromagnetic spectrum for integrated circuit fabrication. It employs a radiation wavelength of approximately 13.5 nm to pattern microscopic integrated circuits on silicon wafers. Compared to optical lithography which uses shorter ultraviolet wavelengths around 193 nm, EUV lithography offers potential improved resolution required to print smaller nodes. As chip designs continue to shrink and transistor channels measure in the tens of nanometers, EUV lithography provides a viable complimentary technology to enable continued Moore's law. With significant R&D investments by companies and research consortiums, EUV lithography has been commercially deployed for high volume manufacturing.
Market Dynamics:
Global extreme ultraviolet (EUV) lithography market growth is driven by several factors such as ongoing miniaturization of semiconductor devices requiring advanced lithography techniques for chip fabrication. EUV lithography allows manufacturing of integrated circuits with feature sizes below 10 nm, meeting the resolution demands of next generation nodes. Growing investments by semiconductor manufacturers in expanding wafer capacities and upgrading fabrication facilities boosts adoption of EUV lithography equipment. However, high costs associated with EUV lithography tools and complex power source requirements can hamper the market growth. Further, recent global shortage of components like neon gas restricts complete shift to EUV technology. Increasing R&D to improve efficiency and resolution as well as expanding photomask infrastructure present new opportunities in the future.
Key features of the study:
This report provides in-depth analysis of the global extreme ultraviolet (EUV) lithography market, and provides market size (US$ Billion) and compound annual growth rate (CAGR%) for the forecast period (2024-2031), considering 2023 as the base year
It elucidates potential revenue opportunities across different segments and explains attractive investment proposition matrices for this market
This study also provides key insights about market drivers, restraints, opportunities, new product launches or approval, market trends, regional outlook, and competitive strategies adopted by key players.
It profiles key players in the global extreme ultraviolet (EUV) lithography market based on the following parameters - company highlights, products portfolio, key highlights, financial performance, and strategies.
Key companies covered as a part of this study include ASML Holding N.V., Nikon Corporation, Canon Inc., Intel Corporation, Samsung Electronics Co., Ltd., TSMC (Taiwan Semiconductor Manufacturing Company), GlobalFoundries, Micron Technology, Inc., Applied Materials, Inc., Lam Research Corporation, KLA Corporation, Tokyo Electron Limited, Advantest Corporation, Hitachi High-Technologies Corporation, and Teradyne, Inc.
Insights from this report would allow marketers and the management authorities of the companies to make informed decisions regarding their future product launches, type up-gradation, market expansion, and marketing tactics.
Global extreme ultraviolet (EUV) lithography market report caters to various stakeholders in this industry including investors, suppliers, product manufacturers, distributors, new entrants, and financial analysts
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the global extreme ultraviolet (EUV) lithography market
Detailed Segmentation-
- Type Insights (Revenue, US$ Bn, 2019 - 2031)
- Lithography Equipment
- Photomasks
- Light Sources
- Others
- Technology Insights (Revenue, US$ Bn, 2019 - 2031)
- EUV Lithography System
- Mask/Etch Technology
- Others
- Application Insights (Revenue, US$ Bn, 2019 - 2031)
- Semiconductor Manufacturing
- Microelectronics
- Others
- Regional Insights (Revenue, US$ Bn, 2019 - 2031)
- North America
- U.S.
- Canada
- Latin America
- Brazil
- Argentina
- Mexico
- Rest of Latin America
- Europe
- Germany
- U.K.
- Spain
- France
- Italy
- Russia
- Rest of Europe
- Asia Pacific
- China
- India
- Japan
- Australia
- South Korea
- ASEAN
- Rest of Asia Pacific
- Middle East
- GCC Countries
- Israel
- Rest of Middle East
- Africa
- South Africa
- North Africa
- Central Africa
- Key Players Insights
- ASML Holding N.V.
- Nikon Corporation
- Canon Inc.
- Intel Corporation
- Samsung Electronics Co., Ltd.
- TSMC (Taiwan Semiconductor Manufacturing Company)
- GlobalFoundries
- Micron Technology, Inc.
- Applied Materials, Inc.
- Lam Research Corporation
- KLA Corporation
- Tokyo Electron Limited
- Advantest Corporation
- Hitachi High-Technologies Corporation
- Teradyne, Inc.
Table of Contents
1. Research Objectives and Assumptions
- Research Objectives
- Assumptions
- Abbreviations
2. Market Purview
- Report Description
- Market Definition and Scope
- Executive Summary
- Market Snippet, By Type
- Market Snippet, By Technology
- Market Snippet, By Application
- Market Snippet, By Region
3. Market Dynamics, Regulations, and Trends Analysis
- Market Dynamics
- Drivers
- Restraints
- Market Opportunities
- Regulatory Scenario
- Industry Trend
- Merger and Acquisitions
- New System Launches/Approvals
- Impact of COVID-19 Pandemic
4. Global Extreme Ultraviolet (EUV) Lithography Market, By Type, 2019-2031, (US$ Bn)
- Introduction
- Market Share Analysis, 2024 and 2031 (%)
- Y-o-Y Growth Analysis, 2020-2031
- Segment Trends
- Lithography Equipment
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Photomasks
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Light Sources
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Others
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
5. Global Extreme Ultraviolet (EUV) Lithography Market, By Technology, 2019-2031, (US$ Bn)
- Introduction
- Market Share Analysis, 2024 and 2031 (%)
- Y-o-Y Growth Analysis, 2020-2031
- Segment Trends
- EUV Lithography System
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Mask/Etch Technology
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Others
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
6. Global Extreme Ultraviolet (EUV) Lithography Market, By Application, 2019-2031, (US$ Bn)
- Introduction
- Market Share Analysis, 2024 and 2031 (%)
- Y-o-Y Growth Analysis, 2020-2031
- Segment Trends
- Semiconductor Manufacturing
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Microelectronics
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
- Others
- Introduction
- Market Size and Forecast, 2019-2031, (US$ Bn)
7. Global Extreme Ultraviolet (EUV) Lithography Market, By Region, 2019-2031, (US$ Bn)
- Introduction
- Market Share Analysis, By Region, 2024 and 2031 (%)
- Y-o-Y Growth Analysis, 2020-2031
- North America
- Regional Trends
- Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
- U.S.
- Canada
- Europe
- Regional Trends
- Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
- Germany
- U.K.
- Spain
- France
- Italy
- Russia
- Rest of Europe
- Asia Pacific
- Regional Trends
- Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
- China
- India
- Japan
- ASEAN
- Australia
- South Korea
- Rest of Asia Pacific
- Latin America
- Regional Trends
- Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
- Brazil
- Argentina
- Mexico
- Rest of Latin America
- Middle East
- Regional Trends
- Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
- Israel
- GCC Countries
- Rest of the Middle East
- Africa
- Regional Trends
- Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
- Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
- South Africa
- North Africa
- Central Africa
8. Competitive Landscape
- Company Profiles
- ASML Holding N.V.
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Nikon Corporation
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Canon Inc.
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Intel Corporation
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Samsung Electronics Co., Ltd.
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- TSMC (Taiwan Semiconductor Manufacturing Company)
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- GlobalFoundries
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Micron Technology, Inc.
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Applied Materials, Inc.
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Lam Research Corporation
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- KLA Corporation
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Tokyo Electron Limited
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Advantest Corporation
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Hitachi High-Technologies Corporation
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- Teradyne, Inc.
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/Updates
- ASML Holding N.V.
9. Analyst Recommendations
- Wheel of Fortune
- Analyst View
- Coherent Opportunity Map
10. Research Methodology
- References
- Research Methodology
- About us and Sales Contact
极紫外光微影术市场：依光源、装置划分 - 2025-2030 年全球预测
极紫外光微影术市场规模、份额、趋势分析报告：按设备、最终用途、地区、细分市场预测，2024-2030 年
极紫外光刻市场，按产品类型、最终用途、国家和地区 - 2024-2032 年行业分析、市场规模、市场份额和预测
极紫外线 (EUV) 微影市场 - 全球与区域分析（2023-2033）
全球极紫外光刻市场－2018-2028年按技术节点、组件类型、最终用途产业、地区、竞争细分的全球产业规模、份额、趋势、机会和预测
2023-2030 年全球极紫外 (UV) 光刻市场规模研究与预测，按产品类型（光源、镜子、掩模）、类型（代工、集成器件製造商 (IDM)）和区域分析
极紫外线 (EUV) 微影术的全球市场 (～2028年):设备 (光源·面罩·光学系)·终端用户 (IDM·晶圆代工厂)·各地区
全球EUV光刻机市场 - 2023-2030年