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极紫外线 (EUV) 微影术的全球市场 (～2028年):设备 (光源·面罩·光学系)·终端用户 (IDM·晶圆代工厂)·各地区
市场调查报告书
商品编码
1314348

极紫外线 (EUV) 微影术的全球市场 (～2028年):设备 (光源·面罩·光学系)·终端用户 (IDM·晶圆代工厂)·各地区

Extreme Ultraviolet (EUV) Lithography Market by Equipment (Light Sources, Masks and Optics), End User (Integrated Device Manufacturer (IDM) and Foundry) and Region (Americas, Europe and Asia Pacific) - Global Forecast to 2028
出版日期: | 出版商: MarketsandMarkets | 英文 144 Pages | 订单完成后即时交付

价格
简介目录

极紫外（EUV）光刻市场预计将从2023年的94亿美元增长到2028年的253亿美元，2023年至2028年的复合年增长率为21.8%。

与传统光刻技术相比，EUV 光刻具有多种优势。首先，它能够显着提高芯片密度，从而能够生产更高性能和更复杂的 IC。其次，它通过减少图案转移所需的步骤数来简化製造工艺并提高生产效率。最后，EUV 光刻通过提高关键尺寸的可控性和减少图案变异性来提高芯片性能和产量。EUV 光刻在製造高性能计算、人工智能和移动设备等各种应用的先进 IC 方面发挥着关键作用。

从最终用户来看，代工领域预计在预测期内将以最高的复合年增长率增长。晶圆代工厂是为半导体公司和集成器件製造商（IDM）提供半导体製造服务的专业製造工厂，主要专注于半导体行业的製造工艺，不涉及芯片设计。代工厂通过向没有自己的製造设施或选择外包芯片製造的公司提供製造服务，在半导体行业中发挥着重要作用。

从设备来看，EUV 掩模领域预计在预测期内将以第二高的复合年增长率增长。

EUV掩模版，也称为EUV掩模版或EUV光掩模，在EUV光刻工艺中发挥着重要作用。EUV掩模具有在光刻过程中投影到晶圆上的电路图案，并且在半导体晶圆上的集成电路图案化中发挥着重要作用。EUV 掩模专门设计用于处理波长约为 13.5 纳米的紫外线，这与旧光刻技术中使用的传统光学掩模不同。EUV掩模是在薄基板上涂有多层反射材料，EUV光被反射并聚焦在晶圆上，从而实现高精度、高分辨率的图案化。EUV掩模的复杂结构包括先进的製造技术和严格的质量控制措施，以确保电路图案的准确性和可靠性。

按地区划分，亚太地区预计在预测期内将以最高的复合年增长率增长。其中，中国、日本、台湾、韩国是主要国家，其中台湾地区占了最高的市场占有率。台湾是主要半导体公司的所在地，其中包括世界上最大的专用半导体代工厂。凭藉强大的半导体生态系统和对创新的承诺，台湾在提升半导体行业 EUV 光刻的能力和采用方面发挥着关键作用。

本报告提供全球极紫外线 (EUV) 微影术的市场调查，彙整市场概要，市场影响因素及市场机会分析，技术·专利趋势，案例研究，相关法律，市场规模的转变·预测，各种区分·地区/各主要国家的详细分析，竞争环境，主要企业简介等资讯。

目录

第1章 简介

第2章 调查手法

第3章 摘要整理

第4章 重要考察

第5章 市场概要

  • 市场动态
    • 促进因素
    • 阻碍因素
    • 机会
    • 课题
  • 价值链分析
  • 收益的变化新的收益来源
  • 生态系统製图
  • 价格分析
  • 技术分析
  • 波特的五力分析
  • 案例研究
  • 贸易资料分析
  • 专利分析
  • 法规情形
  • 主要的会议与活动
  • 主要的相关利益者·购买标准

第6章 EUV微影术市场:各零件

  • 光源
  • 光学
  • 面罩
  • 其他

第7章 EUV微影术市场:各终端用户

  • 整合设备厂商 (IDM)
  • 晶圆代工厂

第8章 EUV微影术市场:各地区

  • 美国
  • 欧洲
  • 亚太地区

第9章 竞争情形

  • 概要
  • 市场占有率·排行榜分析
  • 企业评估矩阵
  • 竞争基准
  • Start-Ups/中小企业的评估矩阵
  • 竞争模式

第10章 企业简介

  • 主要企业
    • ASML
  • 主要设备製造商
    • CARL ZEISS AG
    • TOPPAN INC.
    • NTT ADVANCED TECHNOLOGY CORPORATION
    • KLA CORPORATION
    • ADVANTEST CORPORATION
    • USHIO INC.
    • SUSS MICROTEC SE
    • AGC INC.
    • LASERTEC CORPORATION
  • 其他的主要企业
    • ENERGETIQ TECHNOLOGY INC.
    • NUFLARE TECHNOLOGY INC.
    • PHOTRONICS, INC.
    • HOYA CORPORATION
    • TRUMPF
    • RIGAKU CORPORATION
    • EDMUND OPTICS LTD.
    • PARK SYSTEMS
    • ZYGO CORPORATION
    • IMAGINE OPTIC
    • APPLIED MATERIALS, INC.

第11章 附录

简介目录
Product Code: SE 6398

The EUV lithography market is expected to reach USD 25.3 billion by 2028 from USD 9.4 billion in 2023, at a CAGR of 21.8% during the 2023-2028 period. EUV lithography addresses the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the fabrication of advanced microchips with greater transistor density. The key component in EUV lithography is the EUV light source, which involves generating and manipulating highly energetic light at 13.5 nm. This is achieved by using a laser to create plasma from a tin droplet, which emits EUV radiation. The EUV light is then reflected and focused using a series of precisely engineered mirrors to transfer the desired pattern onto a silicon wafer coated with a light-sensitive material called a photoresist.

EUV lithography offers several advantages over previous lithography techniques. First, it allows for a significant increase in chip density, enabling the production of more powerful and complex ICs. Second, it simplifies the manufacturing process by reducing the number of steps required for pattern transfer, enhancing production efficiency. Lastly, EUV lithography enables better control over critical dimensions and reduces pattern variability, resulting in improved chip performance and yield. EUV lithography plays a critical role in the production of advanced ICs for various applications, including high-performance computing, artificial intelligence, and mobile devices.

Foundries are expected to grow at the highest CAGR during the forecast period.

In the realm of business, a foundry is a specialized manufacturing facility that offers semiconductor fabrication services to semiconductor companies and integrated device manufacturers (IDMs). Foundries primarily focus on the manufacturing process of the semiconductor industry and do not engage in chip design. Foundries play a vital role in the semiconductor industry by providing manufacturing services to companies that either lack their own fabrication facilities or opt to outsource their chip production.

Fabless companies and IDs collaborate with foundries to transfer their chip designs, known as intellectual property (IP), to the foundry for fabrication. Prominent foundries that offer semiconductor manufacturing services, including EUV lithography, encompass companies such as Taiwan Semiconductor Manufacturing Company Limited, GlobalFoundries, Samsung Foundry, and others. The growth of foundry companies can be attributed to their significant investments in EUV lithography, with Asia Pacific countries serving as major contributors to the expansion and advancement of the EUV lithography market.

The EUV mask segment is expected to grow at the 2nd highest CAGR of the EUV lithography equipment market during the forecast period.

The EUV Mask, also referred to as EUV reticle or EUV photomask, plays a crucial role in the advanced lithography process called extreme ultraviolet lithography (EUVL). EUV lithography is a state-of-the-art technology employed in the manufacturing of next-generation semiconductor devices characterized by smaller feature sizes and enhanced performance. The EUV mask is instrumental in the patterning of integrated circuits on a semiconductor wafer by containing the circuit patterns projected onto the wafer during the lithography process. Unlike traditional optical masks utilized in older lithography techniques, EUV masks are specifically designed to function with ultraviolet light with a wavelength of approximately 13.5 nanometers. They consist of a thin substrate coated with multiple layers of reflective materials, which aid in reflecting and focusing the EUV light onto the wafer, enabling precise and high-resolution patterning. The intricate construction of EUV masks involves advanced manufacturing techniques and rigorous quality control measures to ensure the accuracy and dependability of the circuit patterns. Several companies are involved in the manufacturing of EUV masks and related products, including Toppan Inc., KLA Corporation, ADVANTEST CORPORATION, AGC Inc., and more.

During the forecast period, the Asia Pacific region is expected to grow at the highest CAGR.

The Asia Pacific region holds significant importance in EUV lithography. When examining the EUV lithography market in this region, countries like China, Japan, Taiwan, and South Korea come to the forefront. Taiwan holds the highest market share in the Asia Pacific region.

Taiwan is home to leading semiconductor companies such as Taiwan Semiconductor Manufacturing Company Limited (TSMC), which is the world's largest dedicated semiconductor foundry. TSMC has been at the forefront of adopting and advancing EUV lithography technology, enabling the production of advanced chips with smaller feature sizes and higher performance. The company has made substantial investments in EUV infrastructure and has been instrumental in driving the development and commercialization of EUV lithography systems. With its strong semiconductor ecosystem and commitment to technological innovation, Taiwan plays a crucial role in advancing the capabilities and widespread adoption of EUV lithography in the semiconductor industry. Some companies were innovating new technologies and systems in EUV lithography. For instance, in August 2020, Taiwan Semiconductor Manufacturing Company Limited developed the world's 1st environment-friendly dry clean technique for EUV masks with the motive to replace the traditional clean process. It reduces the usage of water and chemicals from 735 metric tons and 36 metric tons.

The break-up of the profile of primary participants in the EUV lithography market-

  • By Company Type: Tier 1 - 30%, Tier 2 - 50%, Tier 3 - 20%
  • By Designation Type: C Level - 25%, Director Level - 35%, Others - 40%
  • By Region Type: North America- 35%, Europe - 30%, Asia Pacific - 25%, RoW - 10%,

The major players in the EUV lithography market are ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc.(Japan), NTT Advanced Technology Corporation(Japan), KLA Corporation(US), ADVANTEST CORPORATION(Japan), Ushio Inc.(Japan), SUSS MicroTec SE(Germany), AGC Inc.(Japan), Lasertec Corporation(Japan), NuFlare Technology(Japan), Energetiq Technology Inc.(US), Photronics, Inc.(US), HOYA Corporation(Japan), TRUMPF(Germany), Rigaku Corporation(Japan), Edmund Optics Ltd.(US), Park Systems(Korea), Zygo Corporation(US), Imagine Optic(US) and Applied Materials, Inc.(US).

Research Coverage

The report segments the EUV lithography market and forecasts its size based on equipment, end user, and region. The report also provides a comprehensive review of drivers, restraints, opportunities, and challenges influencing market growth. The report also covers qualitative aspects in addition to the quantitative aspects of the market.

Reasons to buy the report:

The report will help the market leaders/new entrants in this market with information on the closest approximate revenues for the overall EUV lithography market and related segments. This report will help stakeholders understand the competitive landscape and gain more insights to strengthen their position in the market and plan suitable go-to-market strategies. The report also helps stakeholders understand the pulse of the market and provides them with information on key market drivers, restraints, opportunities, and challenges.

The report provides insights on the following pointers:

  • Analysis of key drivers (Technological advancements and node migration are driving the market), restraints (High cost of implementing EUV Lithography system), opportunities (Adoption of EUV lithography in advanced semiconductor manufacturing), and challenges (Source power and productivity in EUV lithography act as a challenge for the market) influencing the growth of the EUV lithography market.
  • Product Development/Innovation: Detailed insights on upcoming technologies, research & development activities, and new product launches in the EUV lithography market
  • Market Development: Comprehensive information about lucrative markets - the report analyses the EUV lithography market across varied regions.
  • Market Diversification: Exhaustive information about new products, untapped geographies, recent developments, and investments in the EUV lithography market
  • Competitive Assessment: In-depth assessment of market shares, growth strategies, and product offerings of leading players like ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc. (Japan), HOYA Corporation(Japan), TRUMPF(Germany), and KLA Corporation (US).

TABLE OF CONTENTS

1 INTRODUCTION

  • 1.1 STUDY OBJECTIVES
  • 1.2 MARKET DEFINITION
  • 1.3 STUDY SCOPE
    • 1.3.1 MARKETS COVERED
    • FIGURE 1 EUV LITHOGRAPHY MARKET SEGMENTATION
    • 1.3.2 INCLUSIONS AND EXCLUSIONS
    • 1.3.3 REGIONAL SCOPE
    • 1.3.4 YEARS CONSIDERED
  • 1.4 CURRENCY CONSIDERED
  • 1.5 UNITS CONSIDERED
  • 1.6 LIMITATIONS
  • 1.7 STAKEHOLDERS
  • 1.8 SUMMARY OF CHANGES
    • 1.8.1 RECESSION IMPACT

2 RESEARCH METHODOLOGY

  • 2.1 RESEARCH DATA
    • FIGURE 2 EUV LITHOGRAPHY MARKET: RESEARCH DESIGN
    • 2.1.1 SECONDARY DATA
      • 2.1.1.1 Key data from secondary sources
      • 2.1.1.2 Key secondary sources
    • 2.1.2 PRIMARY DATA
      • 2.1.2.1 Key data from primary sources
      • 2.1.2.2 Key participants in primary interviews
      • 2.1.2.3 Breakdown of primary interviews
      • 2.1.2.4 Key industry insights
    • 2.1.3 SECONDARY AND PRIMARY RESEARCH
  • 2.2 MARKET SIZE ESTIMATION
    • FIGURE 3 MARKET SIZE ESTIMATION METHODOLOGY: APPROACH 1 (SUPPLY SIDE): REVENUE GENERATED BY KEY COMPONENT SUPPLIERS IN EUV LITHOGRAPHY MARKET
    • FIGURE 4 MARKET SIZE ESTIMATION METHODOLOGY: APPROACH 2 (SUPPLY SIDE): ILLUSTRATION OF REVENUE ESTIMATED FOR KEY COMPONENT MANUFACTURERS IN EUV LITHOGRAPHY MARKET
    • FIGURE 5 MARKET SIZE ESTIMATION METHODOLOGY: APPROACH 3 (DEMAND SIDE) -BOTTOM-UP ESTIMATION OF EUV LITHOGRAPHY MARKET SIZE BASED ON REGION
    • 2.2.1 BOTTOM-UP APPROACH
      • 2.2.1.1 Approach to derive market size using bottom-up analysis
    • FIGURE 6 MARKET SIZE ESTIMATION METHODOLOGY: BOTTOM-UP APPROACH
    • 2.2.2 TOP-DOWN APPROACH
      • 2.2.2.1 Approach to derive market size using top-down analysis
    • FIGURE 7 MARKET SIZE ESTIMATION METHODOLOGY: TOP-DOWN APPROACH
  • 2.3 MARKET SHARE ESTIMATION
  • 2.4 DATA TRIANGULATION
    • FIGURE 8 DATA TRIANGULATION
  • 2.5 RISK ASSESSMENT
    • TABLE 1 RISK FACTOR ANALYSIS
    • 2.5.1 RECESSION IMPACT ANALYSIS
  • 2.6 RESEARCH ASSUMPTIONS AND LIMITATIONS
    • 2.6.1 RESEARCH ASSUMPTIONS
    • 2.6.2 RESEARCH LIMITATIONS

3 EXECUTIVE SUMMARY

  • 3.1 EUV LITHOGRAPHY MARKET: RECESSION IMPACT
    • FIGURE 9 EUV LITHOGRAPHY MARKET: IMPACT OF RECESSION
    • FIGURE 10 FOUNDRIES TO COMMAND EUV LITHOGRAPHY MARKET IN 2023
    • FIGURE 11 EUV LITHOGRAPHY MARKET IN ASIA PACIFIC TO GROW AT HIGHEST CAGR DURING FORECAST PERIOD

4 PREMIUM INSIGHTS

  • 4.1 ATTRACTIVE OPPORTUNITIES FOR PLAYERS IN EUV LITHOGRAPHY MARKET
    • FIGURE 12 USE OF TECHNOLOGY IN MICROPROCESSORS, INTEGRATED CIRCUITS, AND MEMORY DEVICES TO CREATE OPPORTUNITIES FOR PROVIDERS OF EUV LITHOGRAPHY SYSTEMS
  • 4.2 EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY END USER AND COUNTRY
    • FIGURE 13 FOUNDRIES AND TAIWAN TO HOLD LARGEST SHARE OF EUV LITHOGRAPHY MARKET IN ASIA PACIFIC IN 2023
  • 4.3 EUV LITHOGRAPHY MARKET, BY END USER
    • FIGURE 14 FOUNDRIES TO HOLD LARGER SHARE OF EUV LITHOGRAPHY MARKET IN 2028
  • 4.4 EUV LITHOGRAPHY MARKET, BY COMPONENT
    • FIGURE 15 LIGHT SOURCES TO ACCOUNT FOR LARGEST MARKET SHARE IN 2028
  • 4.5 EUV LITHOGRAPHY MARKET, BY COUNTRY
    • FIGURE 16 SOUTH KOREA TO RECORD HIGHEST CAGR IN EUV LITHOGRAPHY MARKET IN ASIA PACIFIC DURING FORECAST PERIOD

5 MARKET OVERVIEW

  • 5.1 INTRODUCTION
  • 5.2 MARKET DYNAMICS
    • FIGURE 17 EUV LITHOGRAPHY MARKET: DRIVERS, RESTRAINTS, OPPORTUNITIES, AND CHALLENGES
    • 5.2.1 DRIVERS
      • 5.2.1.1 Rapid migration toward advanced technologies and nodes
      • 5.2.1.2 Growing demand for high-performance computing (HPC)
      • 5.2.1.3 Increasing complexity of integrated circuits
    • FIGURE 18 EUV LITHOGRAPHY MARKET DRIVERS: IMPACT ANALYSIS
    • 5.2.2 RESTRAINTS
      • 5.2.2.1 Need for significant upfront capital investment
      • 5.2.2.2 Requirement for advanced infrastructure and highly skilled workforce
    • FIGURE 19 EUV LITHOGRAPHY MARKET RESTRAINTS: IMPACT ANALYSIS
    • 5.2.3 OPPORTUNITIES
      • 5.2.3.1 Increasing investments in developing advanced EUV lithography products and semiconductor devices
      • 5.2.3.2 Rising deployment of EUVL technology in new applications, including microprocessors, ICs, and memory modules/chips
      • 5.2.3.3 Development of advanced memory modules/chips for next-generation memory devices
      • 5.2.3.4 Commercialization of advanced displays to offer enhanced visual experience
      • 5.2.3.5 Use of advanced patterning technologies in production of photonics and optics
    • FIGURE 20 EUV LITHOGRAPHY MARKET OPPORTUNITIES: IMPACT ANALYSIS
    • 5.2.4 CHALLENGES
      • 5.2.4.1 Achieving and maintaining high power and faster production of chips
      • 5.2.4.2 Detecting and repairing mask defects and fixing yield issues
    • FIGURE 21 EUV LITHOGRAPHY MARKET CHALLENGES: IMPACT ANALYSIS
  • 5.3 VALUE CHAIN ANALYSIS
    • FIGURE 22 EUV LITHOGRAPHY VALUE CHAIN ANALYSIS
    • 5.3.1 R&D ENGINEERS
    • 5.3.2 COMPONENT MANUFACTURERS
    • 5.3.3 SYSTEM INTEGRATORS
    • 5.3.4 MARKETING & SALES SERVICE PROVIDERS
    • 5.3.5 END USERS
  • 5.4 REVENUE SHIFT AND NEW REVENUE POCKETS FOR PLAYERS IN EUV LITHOGRAPHY MARKET
  • 5.5 ECOSYSTEM MAPPING
    • TABLE 2 ROLES OF COMPANIES IN EUV LITHOGRAPHY ECOSYSTEM
    • FIGURE 23 KEY PLAYERS IN EUV LITHOGRAPHY MARKET
  • 5.6 PRICING ANALYSIS
    • 5.6.1 AVERAGE SELLING PRICE (ASP) TREND
    • FIGURE 24 ASP OF EUV LITHOGRAPHY SYSTEM, 2019 TO 2028
  • 5.7 TECHNOLOGY ANALYSIS
    • 5.7.1 EXTREME ULTRAVIOLET REFLECTOMETRY (EUVR)
  • 5.8 PORTER'S FIVE FORCES ANALYSIS
    • FIGURE 25 PORTER'S FIVE FORCES ANALYSIS
    • TABLE 3 PORTER'S FIVE FORCES ANALYSIS WITH THEIR IMPACT
    • 5.8.1 INTENSITY OF COMPETITIVE RIVALRY
    • 5.8.2 THREAT OF NEW ENTRANTS
    • 5.8.3 THREAT OF SUBSTITUTES
    • 5.8.4 BARGAINING POWER OF BUYERS
    • 5.8.5 BARGAINING POWER OF SUPPLIERS
  • 5.9 CASE STUDIES
    • 5.9.1 LAM RESEARCH ANNOUNCES SIGNIFICANT BREAKTHROUGH IN EUV LITHOGRAPHY TECHNOLOGY
    • TABLE 4 LAM RESEARCH INTRODUCES INNOVATIVE DRY RESIST TECHNOLOGY TO IMPROVE RESOLUTION, PRODUCTIVITY, AND YIELD FOR EUV LITHOGRAPHY
    • 5.9.2 TSMC LIMITED BOOSTS CHIP PRODUCTION CAPACITY WITH ASML'S EUV SYSTEMS
    • TABLE 5 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY'S COMMITMENT TO EUV TECHNOLOGY AND MARKET GROWTH
  • 5.10 TRADE DATA ANALYSIS
    • FIGURE 26 COUNTRY-WISE EXPORT DATA FOR PRODUCTS CLASSIFIED UNDER HS CODE 8442, 2018-2022
    • TABLE 6 EXPORT SCENARIO FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2018-2022 (USD THOUSAND)
    • FIGURE 27 COUNTRY-WISE IMPORT DATA FOR PRODUCTS CLASSIFIED UNDER HS CODE 8442, 2018-2022
    • TABLE 7 IMPORT SCENARIO FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2018-2022 (USD THOUSAND)
  • 5.11 PATENT ANALYSIS
    • 5.11.1 DOCUMENT TYPE
    • TABLE 8 PATENTS FILED
    • FIGURE 28 PATENTS FILED FROM 2013 TO 2022
    • 5.11.2 PUBLICATION TREND
    • FIGURE 29 NO. OF PATENTS PUBLISHED EACH YEAR FROM 2013 TO 2022
    • 5.11.3 JURISDICTION ANALYSIS
    • FIGURE 30 JURISDICTION ANALYSIS
    • 5.11.4 TOP PATENT OWNERS
    • FIGURE 31 TOP 10 COMPANIES IN TERMS OF PUBLISHED PATENT APPLICATIONS FROM 2013 TO 2022
    • TABLE 9 TOP 20 OWNERS OF PUBLISHED PATENTS IN LAST 10 YEARS
  • 5.12 REGULATORY LANDSCAPE
    • 5.12.1 REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
    • TABLE 10 EUV LITHOGRAPHY: REGULATORY LANDSCAPE
    • 5.12.2 REGIONAL REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
    • TABLE 11 NORTH AMERICA: LIST OF REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
    • TABLE 12 EUROPE: LIST OF REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
    • TABLE 13 ASIA PACIFIC: LIST OF REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
    • TABLE 14 ROW: LIST OF REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • 5.13 KEY CONFERENCES AND EVENTS, 2023-2024
  • 5.14 KEY STAKEHOLDERS AND BUYING CRITERIA
    • 5.14.1 KEY STAKEHOLDERS IN BUYING PROCESS
    • FIGURE 32 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USERS
    • TABLE 15 INFLUENCE OF STAKEHOLDERS IN BUYING PROCESS FOR END USERS (%)
    • 5.14.2 KEY BUYING CRITERIA
    • TABLE 16 KEY BUYING CRITERIA, BY END USER

6 EUV LITHOGRAPHY MARKET, BY COMPONENT

  • 6.1 INTRODUCTION
    • FIGURE 33 LIGHT SOURCES TO RECORD HIGHEST CAGR IN EUV LITHOGRAPHY MARKET DURING FORECAST PERIOD
    • TABLE 17 EUV LITHOGRAPHY MARKET, BY COMPONENT, 2019-2022 (USD MILLION)
    • TABLE 18 EUV LITHOGRAPHY MARKET, BY COMPONENT, 2023-2028 (USD MILLION)
  • 6.2 LIGHT SOURCES
    • 6.2.1 WIDE USE OF LPP EUV LIGHT SOURCES IN COMMERCIAL SYSTEMS TO DRIVE MARKET
  • 6.3 OPTICS
    • 6.3.1 HIGH PRECISION AND ACCURACY OF EUV OPTICS TO BOOST ADOPTION BY EUV LITHOGRAPHY SYSTEM MANUFACTURERS
  • 6.4 MASKS
    • 6.4.1 INCREASING FOCUS ON DEVELOPING NEXT-GENERATION SEMICONDUCTOR DEVICES TO FUEL SEGMENTAL GROWTH
  • 6.5 OTHERS

7 EUV LITHOGRAPHY MARKET, BY END USER

  • 7.1 INTRODUCTION
    • FIGURE 34 FOUNDRIES TO RECORD HIGHER CAGR IN EUV LITHOGRAPHY MARKET DURING FORECAST PERIOD
    • TABLE 19 EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 20 EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • TABLE 21 EUV LITHOGRAPHY MARKET, 2019-2022 (MILLION UNITS)
    • TABLE 22 EUV LITHOGRAPHY MARKET, 2023-2028 (MILLION UNITS)
  • 7.2 INTEGRATED DEVICE MANUFACTURERS (IDMS)
    • 7.2.1 RISING FOCUS OF IDMS ON DEVELOPING ADVANCED AND POWER-EFFICIENT MICROCHIPS AND ICS TO BOOST SEGMENTAL GROWTH
    • TABLE 23 INTEGRATED DEVICE MANUFACTURERS (IDMS): EUV LITHOGRAPHY MARKET, BY REGION, 2019-2022 (USD MILLION)
    • TABLE 24 INTEGRATED DEVICE MANUFACTURERS (IDMS): EUV LITHOGRAPHY MARKET, BY REGION, 2023-2028 (USD MILLION)
    • TABLE 25 INTEGRATED DEVICE MANUFACTURERS (IDMS): EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2019-2022 (USD MILLION)
    • TABLE 26 INTEGRATED DEVICE MANUFACTURERS (IDMS): EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2023-2028 (USD MILLION)
  • 7.3 FOUNDRIES
    • 7.3.1 CONSTANT ADVANCES IN SEMICONDUCTOR NODES TO DRIVE DEMAND FOR EUV LITHOGRAPHY FROM FOUNDRIES
    • TABLE 27 FOUNDRIES: EUV LITHOGRAPHY MARKET, BY REGION, 2019-2022 (USD MILLION)
    • TABLE 28 FOUNDRIES: EUV LITHOGRAPHY MARKET, BY REGION, 2023-2028 (USD MILLION)
    • TABLE 29 FOUNDRIES: EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2019-2022 (USD MILLION)
    • TABLE 30 FOUNDRIES: EUV LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2023-2028 (USD MILLION)

8 EUV LITHOGRAPHY MARKET, BY REGION

  • 8.1 INTRODUCTION
    • FIGURE 35 ASIA PACIFIC TO REGISTER HIGHEST CAGR IN EUV LITHOGRAPHY MARKET DURING FORECAST PERIOD
    • TABLE 31 EUV LITHOGRAPHY MARKET, BY REGION, 2019-2022 (USD MILLION)
    • TABLE 32 EUV LITHOGRAPHY MARKET, BY REGION, 2023-2028 (USD MILLION)
  • 8.2 AMERICAS
    • 8.2.1 WELL-ESTABLISHED SEMICONDUCTOR INDUSTRY TO SUPPORT MARKET GROWTH
    • FIGURE 36 AMERICAS: MARKET SNAPSHOT
    • TABLE 33 AMERICAS: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 34 AMERICAS: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.2.2 AMERICAS: RECESSION IMPACT
  • 8.3 EUROPE
    • 8.3.1 INVESTMENTS BY GERMANY, NETHERLANDS, AND FRANCE IN R&D OF EUV LITHOGRAPHY PRODUCTS TO DRIVE MARKET
    • FIGURE 37 EUROPE: MARKET SNAPSHOT
    • TABLE 35 EUROPE: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.3.2 EUROPE: RECESSION IMPACT
  • 8.4 ASIA PACIFIC
    • FIGURE 38 ASIA PACIFIC: MARKET SNAPSHOT
    • TABLE 36 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY COUNTRY, 2019-2022 (USD MILLION)
    • TABLE 37 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY COUNTRY, 2023-2028 (USD MILLION)
    • TABLE 38 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 39 ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.4.1 CHINA
      • 8.4.1.1 Strong semiconductor production capabilities to drive market
    • TABLE 40 CHINA: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 41 CHINA: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.4.2 JAPAN
      • 8.4.2.1 Presence of well-known providers of high-quality semiconductor chips to fuel market growth
    • TABLE 42 JAPAN: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 43 JAPAN: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.4.3 TAIWAN
      • 8.4.3.1 Substantial investments by semiconductor manufacturing firms to develop eco-friendly EUV system components to drive market
    • TABLE 44 TAIWAN: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 45 TAIWAN: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.4.4 SOUTH KOREA
      • 8.4.4.1 Increasing use of EUV lithography to produce cutting-edge semiconductor chips to accelerate market growth
    • TABLE 46 SOUTH KOREA: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 47 SOUTH KOREA: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.4.5 REST OF ASIA PACIFIC
    • TABLE 48 REST OF ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2019-2022 (USD MILLION)
    • TABLE 49 REST OF ASIA PACIFIC: EUV LITHOGRAPHY MARKET, BY END USER, 2023-2028 (USD MILLION)
    • 8.4.6 ASIA PACIFIC: RECESSION IMPACT

9 COMPETITIVE LANDSCAPE

  • 9.1 OVERVIEW
    • FIGURE 39 KEY STRATEGIES UNDERTAKEN BY LEADING PLAYERS IN EUV LITHOGRAPHY MARKET FROM 2021 TO 2023
  • 9.2 MARKET SHARE AND RANKING ANALYSIS
    • TABLE 50 EUV LITHOGRAPHY MARKET: DEGREE OF COMPETITION
    • FIGURE 40 MARKET SHARE OF TOP 5 PLAYERS OFFERING EUV LITHOGRAPHY COMPONENTS
    • 9.2.1 FIVE-YEAR COMPANY REVENUE ANALYSIS
    • FIGURE 41 FIVE-YEAR REVENUE ANALYSIS OF KEY COMPANIES
  • 9.3 COMPANY EVALUATION MATRIX, 2022
    • FIGURE 42 EUV LITHOGRAPHY MARKET (GLOBAL): EVALUATION MATRIX FOR KEY COMPANIES, 2022
    • 9.3.1 STARS
    • 9.3.2 EMERGING LEADERS
    • 9.3.3 PERVASIVE PLAYERS
    • 9.3.4 PARTICIPANTS
  • 9.4 COMPETITIVE BENCHMARKING
    • TABLE 51 COMPANY FOOTPRINT
    • TABLE 52 END USER FOOTPRINT
    • TABLE 53 REGION FOOTPRINT
  • 9.5 EVALUATION MATRIX FOR STARTUPS/SMES, 2022
    • FIGURE 43 EUV LITHOGRAPHY MARKET: EVALUATION MATRIX FOR STARTUPS/SMES, 2022
    • 9.5.1 PROGRESSIVE COMPANIES
    • 9.5.2 RESPONSIVE COMPANIES
    • 9.5.3 DYNAMIC COMPANIES
    • 9.5.4 STARTING BLOCKS
    • 9.5.5 LIST OF KEY STARTUPS/SMES
    • TABLE 54 EUV LITHOGRAPHY MARKET: LIST OF MAJOR STARTUPS/SMES
    • 9.5.6 COMPETITIVE BENCHMARKING OF KEY STARTUPS/SMES
    • TABLE 55 EUV LITHOGRAPHY MARKET: COMPETITIVE BENCHMARKING OF KEY STARTUPS/SMES
  • 9.6 COMPETITIVE SCENARIO
    • 9.6.1 DEALS
    • TABLE 56 EUV LITHOGRAPHY MARKET: DEALS, MAY 2020-MARCH 2023

10 COMPANY PROFILES

  • (Business Overview, Products/Solutions/Services Offered, Recent Developments, and MnM View (Key strengths/Right to Win, Strategic Choices Made, and Weaknesses and Competitive Threats))**
  • 10.1 INTRODUCTION
  • 10.2 KEY PLAYERS
    • 10.2.1 ASML
    • TABLE 57 ASML: COMPANY OVERVIEW
    • FIGURE 44 ASML: COMPANY SNAPSHOT
  • 10.3 KEY EQUIPMENT MANUFACTURERS
    • 10.3.1 CARL ZEISS AG
    • TABLE 58 CARL ZEISS AG: COMPANY OVERVIEW
    • FIGURE 45 CARL ZEISS AG: COMPANY SNAPSHOT
    • 10.3.2 TOPPAN INC.
    • TABLE 59 TOPPAN INC: COMPANY OVERVIEW
    • FIGURE 46 TOPPAN INC.: COMPANY SNAPSHOT
    • 10.3.3 NTT ADVANCED TECHNOLOGY CORPORATION
    • TABLE 60 NTT ADVANCED TECHNOLOGY CORPORATION: COMPANY OVERVIEW
    • FIGURE 47 NTT ADVANCED TECHNOLOGY CORPORATION: COMPANY SNAPSHOT
    • 10.3.4 KLA CORPORATION
    • TABLE 61 KLA CORPORATION: COMPANY OVERVIEW
    • FIGURE 48 KLA CORPORATION: COMPANY SNAPSHOT
    • 10.3.5 ADVANTEST CORPORATION
    • TABLE 62 ADVANTEST CORPORATION: COMPANY OVERVIEW
    • FIGURE 49 ADVANTEST CORPORATION: COMPANY SNAPSHOT
    • 10.3.6 USHIO INC.
    • TABLE 63 USHIO INC.: COMPANY OVERVIEW
    • FIGURE 50 USHIO INC.: COMPANY SNAPSHOT
    • 10.3.7 SUSS MICROTEC SE
    • TABLE 64 SUSS MICROTEC SE: COMPANY OVERVIEW
    • FIGURE 51 SUSS MICROTEC SE: COMPANY SNAPSHOT
    • 10.3.8 AGC INC.
    • TABLE 65 AGC INC.: COMPANY OVERVIEW
    • FIGURE 52 AGC INC.: COMPANY SNAPSHOT
    • 10.3.9 LASERTEC CORPORATION
    • TABLE 66 LASERTEC CORPORATION: COMPANY OVERVIEW
    • FIGURE 53 LASERTEC CORPORATION: COMPANY SNAPSHOT
  • 10.4 OTHER KEY PLAYERS
    • 10.4.1 ENERGETIQ TECHNOLOGY INC.
    • 10.4.2 NUFLARE TECHNOLOGY INC.
    • 10.4.3 PHOTRONICS, INC.
    • 10.4.4 HOYA CORPORATION
    • 10.4.5 TRUMPF
    • 10.4.6 RIGAKU CORPORATION
    • 10.4.7 EDMUND OPTICS LTD.
    • 10.4.8 PARK SYSTEMS
    • 10.4.9 ZYGO CORPORATION
    • 10.4.10 IMAGINE OPTIC
    • 10.4.11 APPLIED MATERIALS, INC.
  • *Details on Business Overview, Products/Solutions/Services Offered, Recent Developments, and MnM View (Key strengths/Right to Win, Strategic Choices Made, and Weaknesses and Competitive Threats) might not be captured in case of unlisted companies.

11 APPENDIX

  • 11.1 INSIGHTS FROM INDUSTRY EXPERTS
  • 11.2 DISCUSSION GUIDE
  • 11.3 KNOWLEDGESTORE: MARKETSANDMARKETS' SUBSCRIPTION PORTAL
  • 11.4 CUSTOMIZATION OPTIONS
  • 11.5 RELATED REPORTS
  • 11.6 AUTHOR DETAILS