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全球EUV光刻机市场 - 2023-2030年
市场调查报告书
商品编码
1290393

全球EUV光刻机市场 - 2023-2030年

Global EUV Lithography Market - 2023-2030
出版日期: | 出版商: DataM Intelligence | 英文 182 Pages | 商品交期: 最快1-2个工作天内

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简介目录

市场概况

全球EUV光刻市场规模在2022年达到57.1亿美元，预计到2030年将达到291.4亿美元，在2023-2030年的预测期内，年复合增长率为22.6%。

全球EUV光刻市场正经历着快速的市场增长，技术进步、越来越多地采用存储器和逻辑设备、合作和伙伴关系、人工智能和机器学习的整合，以及地理扩张战略等因素的推动下。上述市场趋势正在重塑半导体制造业的格局，推动了更多市场机会的发展，以及先进和高效的光刻工艺。随着行业的不断发展，那些领先于这些趋势并抓住新兴市场机会的企业将从EUV光刻市场的增长和转型中获益。

全球EUV光刻市场正在见证全球范围内半导体需求的激增，这是由于激光生产的等离子体EUV光刻领域的显著扩张，预计将在应用部分中占据超过三分之一的市场份额。同样，北美成为一个主导地区，占市场份额的五分之二以上。

市场动态

技术进步和支持性政府政策

EUV光刻技术的不断进步在推动市场增长方面发挥了举足轻重的作用。世界各国政府已经认识到投资于研究和开发以提高光刻系统的重要性。世界各国政府已经认识到培育半导体行业的重要性，并实施了支持其发展的政策。例如，统计数据显示，政府提供了税收优惠、补助和补贴，以鼓励研究、创新和国内半导体制造商采用EUV光刻技术。因此，技术的进步和政府的支持政策是全球EUV光刻技术市场需求和市场机会的主要驱动力。

监管和安全问题，产量的挑战和可靠性

由于极端紫外线辐射的危险性，EUV光刻技术的使用必须遵守严格的安全协议。全球各国政府都有严格的规定和准则，以确保工人和环境的安全。遵守这些法规需要对安全措施、员工培训和监测系统进行额外投资，从而阻碍了市场的增长。官方报告显示，遵守法规在EUV光刻行业的整体运营成本中占了很大一部分。

此外，EUV光刻技术的实施为实现高产量带来了新的挑战。该技术对掩膜和光源的微小缺陷的敏感性导致了制造过程中的产量损失。业界正在努力提高可靠性和良品率，以满足半导体制造商的严格要求，但这仍然是一个持续的挑战。提高产量的倡议需要大量的研发投资，推高了制造商的整体成本。

目录

第一章：方法和范围

  • 研究方法
  • 报告的研究目标和范围

第二章：定义和概述

第三章：执行摘要

  • 按光源分析
  • 按应用分类
  • 按设备分类
  • 按地区分类

第四章：动态变化

  • 影响因素
    • 驱动因素
      • 对微型化的需求不断上升，对先进半导体设备的需求也随之增加
      • 技术进步和政府的支持性政策
    • 限制因素
      • 技术的复杂性、高昂的成本和关键部件的有限可用性
      • 监管和安全问题，产量的挑战和可靠性的问题
    • 机会
    • 影响分析

第五章：行业分析

  • 波特的五力分析
  • 供应链分析
  • 价格分析
  • 监管分析

第六章：COVID-19分析

  • 对COVID-19的分析
    • COVID之前的情况
    • COVID期间的情况
    • COVID之后的情况
  • COVID-19期间的定价动态
  • 需求-供应谱系
  • 大流行期间与市场有关的政府倡议
  • 制造商的战略倡议
  • 结语

第七章：按光源分类

  • 激光产生的等离子体(LPP)
  • 真空火花
  • 气体放电

第8章：按应用分类

  • 集成设备制造商（IDM）
  • 铸造厂

第九章：按设备分类

  • 光源
  • 镜子
  • 面罩
  • 其他

第十章：按地区划分

  • 北美洲
    • 美国
    • 加拿大
    • 墨西哥
  • 欧洲
    • 德国
    • 英国
    • 法国
    • 意大利
    • 俄罗斯
    • 欧洲其他地区
  • 南美洲
    • 巴西
    • 阿根廷
    • 南美其他地区
  • 亚太地区
    • 中国
    • 印度
    • 日本
    • 澳大利亚
    • 亚太其他地区
  • 中东和非洲

第11章 ：竞争格局

  • 竞争格局
  • 市场定位/份额分析
  • 合併和收购分析

第十二章 ：公司简介

  • ASML
    • 公司概述
    • 产品组合和描述
    • 财务概况
    • 主要发展情况
  • Canon Inc.
  • Intel Corporation
  • Nikon Corporation
  • NuFlare Technology Inc.
  • Samsung Corporation
  • SUSS Microtec AG
  • Taiwan Semiconductor Manufacturing Company Limited (TSMC)
  • Ultratech Inc.
  • Vistec Semiconductor Systems

第十三章 ：附录

简介目录
Product Code: ICT2136

Market Overview

The Global EUV Lithography Market size reached US$ 5.71 billion in 2022 and is expected to reach US$ 29.14 billion by 2030 growing at a CAGR of 22.6% during the forecast period 2023-2030.

The global EUV lithography market is experiencing rapid market growth, fueled by technological advancements, increasing adoption of memory and logic devices, collaborations and partnerships, the integration of AI and machine learning, and geographical expansion strategies. The aforementioned market trends are reshaping the semiconductor manufacturing landscape, driving the development of more market opportunities as well as advanced and efficient lithography processes. As the industry continues to evolve, businesses that stay ahead of these trends and seize emerging market opportunities stand to benefit from the growth and transformation of the EUV lithography market.

The global EUV lithography market is witnessing a surge in demand for semiconductors on a global scale due to significant expansion in the laser-produced plasma EUV lithography segment, which is anticipated to capture more than one-third of the market share within the application segment. Likewise, North America emerges as a dominant region, accounting for over two-fifths of the market share.

Market Dynamics

Technological Advancements and Supportive Government Policies

Continuous advancements in EUV lithography technology have played a pivotal role in driving market growth. Governments worldwide have acknowledged the importance of investing in research and development to enhance lithography systems. Governments worldwide have recognized the importance of nurturing the semiconductor industry and have implemented policies to support its development. For example, statistics reveal the provision of tax incentives, grants, and subsidies to encourage research, innovation, and the adoption of EUV lithography technology by domestic semiconductor manufacturers. Thus, technological advancements and supportive government policies act as major drivers for demand and market opportunities in the global EUV lithography market.

Regulatory and Safety Concerns, Yield Challenges and Reliability

The utilization of EUV lithography technology necessitates adherence to stringent safety protocols due to the hazardous nature of extreme ultraviolet radiation. Governments across the globe impose strict regulations and guidelines to ensure the safety of workers and the environment. Compliance with these regulations requires additional investments in safety measures, employee training, and monitoring systems, thereby impeding the market's growth. Official reports indicate that regulatory compliance accounts for a significant portion of the overall operational costs in the EUV lithography industry.

Furthermore, the implementation of EUV lithography introduces new challenges in achieving high production yields. The technology's sensitivity to minute defects in masks and light sources results in yield loss during the manufacturing process. The industry is striving to improve reliability and yield rates to meet the stringent requirements of semiconductor manufacturers, but it remains an ongoing challenge. Yield improvement initiatives require substantial investments in research and development, driving up the overall costs for manufacturers.

Segment Analysis

The global automotive oem coatings market is segmented based on light source, application, equipment and region.

Growing Semiconductor Demand, Advancement In Technology And Increase In Government Funding

The Laser Produced Plasma (LPP) segment has emerged as a critical component within the global EUV lithography market. By utilizing high-powered lasers, LPP technology generates extreme ultraviolet light, enabling the creation of more advanced semiconductor chips. Governmental statistics demonstrate the growing emphasis on LPP technology and its positive impact on the semiconductor industries of various countries.

The European Union (EU), for instance, has placed a strong emphasis on promoting advanced semiconductor manufacturing within its borders. In recent years, the EU has allocated significant funding to research projects focusing on LPP technology, aiming to strengthen its position in the global EUV lithography market. Furthermore, countries such as the U.S., Japan, South Korea, and Taiwan have also prioritized the advancement of LPP technology within their semiconductor industries.

Through strategic partnerships between governments, research institutions, and industry players, these nations have sought to enhance their competitiveness in the global market, fostering the growth of the LPP segment. As governments continue to support research and development in LPP technology and manufacturers drive further innovations, the LPP segment is poised for sustained growth. The aforementioned factors will play a pivotal role in advancing the semiconductor industry, enabling the production of smaller, more powerful, and more efficient electronic devices in the future.

Geographical Analysis

Governmental Support and Technological Advancements in North America

The North America region demonstrates a prominent presence in the global EUV lithography market, fueled by governmental support, technological advancements, and notable product launches. The U.S. and Canada, in particular, have witnessed positive growth in the semiconductor industry, leading to increased adoption of EUV lithography technology. For instance, Canada's semiconductor industry has experienced substantial growth in recent years, contributing to the North America region's EUV lithography market.

The Canadian government has actively supported the development of the semiconductor sector, emphasizing innovation and technological advancement. According to Statistics Canada, the manufacturing sales of electronic and electrical equipment, including semiconductors, increased by 8.5% in 2021, reflecting the industry's positive momentum. As the region continues to invest in research and development, it is expected to maintain its significant role in the global EUV lithography market, contributing to the advancement of the semiconductor industry as a whole.

Competitive Landscape

The major global players in the market include: ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc. and Vistec Semiconductor Systems.

Why Purchase the Report?

  • To visualize the global EUV lithography market segmentation based on light source, application, equipment and region, as well as understand key commercial assets and players.
  • Identify commercial opportunities by analyzing trends and co-development.
  • Excel data sheet with numerous data points of EUV lithography market-level with all segments.
  • PDF report consists of a comprehensive analysis after exhaustive qualitative interviews and an in-depth study.
  • Product mapping available as Excel consisting of key products of all the major players.

The global EUV lithography market report would provide approximately 61 tables, 57 figures and 182 pages.

Target Audience 2023

  • Manufacturers/ Buyers
  • Industry Investors/Investment Bankers
  • Research Professionals
  • Emerging Companies

Table of Contents

1. Methodology and Scope

  • 1.1. Research Methodology
  • 1.2. Research Objective and Scope of the Report

2. Definition and Overview

3. Executive Summary

  • 3.1. Snippet by Light Source
  • 3.2. Snippet by Application
  • 3.3. Snippet by Equipment
  • 3.4. Snippet by Region

4. Dynamics

  • 4.1. Impacting Factors
    • 4.1.1. Drivers
      • 4.1.1.1. Rising Need for Miniaturization and Associated Increase in Demand for Advanced Semiconductor Devices
      • 4.1.1.2. Technological Advancements and Supportive Government Policies
    • 4.1.2. Restraints
      • 4.1.2.1. Technological Complexity, Exorbitant Cost and Limited Availability of Key Components
      • 4.1.2.2. Regulatory and Safety Concerns, Yield Challenges and Reliability
    • 4.1.3. Opportunity
    • 4.1.4. Impact Analysis

5. Industry Analysis

  • 5.1. Porter's Five Force Analysis
  • 5.2. Supply Chain Analysis
  • 5.3. Pricing Analysis
  • 5.4. Regulatory Analysis

6. COVID-19 Analysis

  • 6.1. Analysis of COVID-19
    • 6.1.1. Scenario Before COVID
    • 6.1.2. Scenario During COVID
    • 6.1.3. Scenario Post COVID
  • 6.2. Pricing Dynamics Amid COVID-19
  • 6.3. Demand-Supply Spectrum
  • 6.4. Government Initiatives Related to the Market During Pandemic
  • 6.5. Manufacturers Strategic Initiatives
  • 6.6. Conclusion

7. By Light Source

  • 7.1. Introduction
    • 7.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 7.1.2. Market Attractiveness Index, By Light Source
  • 7.2. Laser Produced Plasma (LPP)*
    • 7.2.1. Introduction
    • 7.2.2. Market Size Analysis and Y-o-Y Growth Analysis (%)
  • 7.3. Vacuum Sparks
  • 7.4. Gas Discharges

8. By Application

  • 8.1. Introduction
    • 8.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 8.1.2. Market Attractiveness Index, By Application
  • 8.2. Integrated Device Manufacturer (IDM)*
    • 8.2.1. Introduction
    • 8.2.2. Market Size Analysis and Y-o-Y Growth Analysis (%)
  • 8.3. Foundry

9. By Equipment

  • 9.1. Introduction
    • 9.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 9.1.2. Market Attractiveness Index, By Equipment
  • 9.2. Light Source*
    • 9.2.1. Introduction
    • 9.2.2. Market Size Analysis and Y-o-Y Growth Analysis (%)
  • 9.3. Mirrors
  • 9.4. Masks
  • 9.5. Others

10. By Region

  • 10.1. Introduction
    • 10.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Region
    • 10.1.2. Market Attractiveness Index, By Region
  • 10.2. North America
    • 10.2.1. Introduction
    • 10.2.2. Key Region-Specific Dynamics
    • 10.2.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.2.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.2.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.2.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.2.6.1. The U.S.
      • 10.2.6.2. Canada
      • 10.2.6.3. Mexico
  • 10.3. Europe
    • 10.3.1. Introduction
    • 10.3.2. Key Region-Specific Dynamics
    • 10.3.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.3.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.3.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.3.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.3.6.1. Germany
      • 10.3.6.2. The UK
      • 10.3.6.3. France
      • 10.3.6.4. Italy
      • 10.3.6.5. Russia
      • 10.3.6.6. Rest of Europe
  • 10.4. South America
    • 10.4.1. Introduction
    • 10.4.2. Key Region-Specific Dynamics
    • 10.4.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.4.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.4.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.4.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.4.6.1. Brazil
      • 10.4.6.2. Argentina
      • 10.4.6.3. Rest of South America
  • 10.5. Asia-Pacific
    • 10.5.1. Introduction
    • 10.5.2. Key Region-Specific Dynamics
    • 10.5.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.5.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.5.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.5.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.5.6.1. China
      • 10.5.6.2. India
      • 10.5.6.3. Japan
      • 10.5.6.4. Australia
      • 10.5.6.5. Rest of Asia-Pacific
  • 10.6. Middle East and Africa
    • 10.6.1. Introduction
    • 10.6.2. Key Region-Specific Dynamics
    • 10.6.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.6.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.6.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment

11. Competitive Landscape

  • 11.1. Competitive Scenario
  • 11.2. Market Positioning/Share Analysis
  • 11.3. Mergers and Acquisitions Analysis

12. Company Profiles

  • 12.1. ASML*
    • 12.1.1. Company Overview
    • 12.1.2. Product Portfolio and Description
    • 12.1.3. Financial Overview
    • 12.1.4. Key Developments
  • 12.2. Canon Inc.
  • 12.3. Intel Corporation
  • 12.4. Nikon Corporation
  • 12.5. NuFlare Technology Inc.
  • 12.6. Samsung Corporation
  • 12.7. SUSS Microtec AG
  • 12.8. Taiwan Semiconductor Manufacturing Company Limited (TSMC)
  • 12.9. Ultratech Inc.
  • 12.10. Vistec Semiconductor Systems

LIST NOT EXHAUSTIVE

13. Appendix

  • 13.1. About Us and Services
  • 13.2. Contact Us