市场调查报告书
商品编码
1468351
原子层沉积设备市场报告(按产品(金属 ALD、氧化铝 ALD、等离子体增强 ALD、催化 ALD 等)、应用(半导体、太阳能设备、电子、医疗设备等)和地区 2024-2032Atomic Layer Deposition Equipment Market Report by Product (Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Others), Application (Semiconductors, Solar Devices, Electronics, Medical Equipment, and Others), and Region 2024-2032 |
IMARC Group年全球原子层沉积设备市场规模达66亿美元。
原子层沉积 (ALD) 是一种气相技术,用于在暴露于交替前体后在基底顶部沉积超薄膜。一些常用设备包括单晶圆、批量、等离子体、大型基板 ALD 反应器、薄膜电致发光 (TFEL) 显示器和其他电子元件。这些工具透过控制厚度并改善或修改基材的各种特性(包括电阻、电导率和强度)来帮助确保均匀性。由于这些特性,它被用于半导体、电子、光学元件、燃料电池和热电材料。目前,商用原子层沉积设备有多种类型,例如金属、等离子体增强、氧化铝和催化。
由于对灵活工具的需求不断增加以改善功能并提供更高的精度,ALD 设备在各种研发 (R&D) 设施、医疗保健和太阳能领域得到广泛采用,这主要推动了市场的成长。与此一致的是,用于沉积各种产品(包括资料储存、小型电子元件和显示设备)的电子材料中对小型化、半导体和电源管理系统的需求不断增长,进一步推动了市场的成长。利用原子层沉积设备製造积体电路 (IC)、晶片和微机电系统 (MEMS) 产品(例如光开关、感测器和电脑)进一步支援了这一点。与此一致的是,重大技术进步导致柔性电子元件和三维 (3D) 列印反应器引入空间 ALD,以确保复杂 3D 奈米结构的均匀性和一致性,这是另一个生长诱导因素。此外,由于植入式、智慧手錶、智慧型手机和医疗设备的使用不断增加,对固态薄膜电池的需求不断增加,也促进了市场的成长。除此之外,主要参与者之间针对推出等离子体增强 ALD 的策略合作正在为市场创造积极的前景。
The global atomic layer deposition equipment market size reached US$ 6.6 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 22.6 Billion by 2032, exhibiting a growth rate (CAGR) of 14.5% during 2024-2032.
Atomic layer deposition (ALD) refers to a vapor phase technique that is deployed for depositing ultra-thin films on top of a substrate after getting exposed to alternating precursors. Some of the commonly used equipment includes single wafer, batch, plasma, large substrate ALD reactors, thin-film electroluminescent (TFEL) displays and other electronic components. These tools help in ensuring uniformity by controlling the thickness and improving or modifying various properties of substrates, including resistance, conductivity, and strength. On account of these properties, it is used in semiconductors, electronics, optical devices, fuel cells and thermoelectric materials. At present, atomic layer deposition equipment is commercially available in varying types, such as metal, plasma-enhanced, aluminum oxide, and catalytic.
The widespread adoption of ALD equipment across various research and development (R&D) facilities, healthcare, and solar sector on account of the increasing need for flexible tools to improve functionality and offer higher accuracy is primarily driving the market growth. In line with this, the rising demand for miniaturization, semiconductors, and power management systems in electronic materials for depositing various products, including data storage, small electronic components and display devices are further contributing to the market growth. This is further supported by the utilization of atomic layer deposition equipment for manufacturing integrated circuits (IC), chips, and micro-electromechanical systems (MEMS) products, such as optical switches, sensors, and computers. In line with this, significant technological advancements have led to the introduction of spatial ALD for flexible electronics and three-dimensional (3D) printed reactors to ensure uniformity and conformity of complex 3D nanostructures, which is acting as another growth-inducing factor. Additionally, the escalating requirement for solid-state thin-film batteries due to the increasing uptake of implantable, smartwatches, smartphones and medical equipment is contributing to the market growth. Apart from this, strategic collaborations amongst key players for launching plasma-enhanced ALD are creating a positive outlook for the market.
IMARC Group provides an analysis of the key trends in each sub-segment of the global atomic layer deposition equipment market report, along with forecasts at the global, regional and country level from 2024-2032. Our report has categorized the market based on product and application.
Metal ALD
Aluminum Oxide ALD
Plasma Enhanced ALD
Catalytic ALD
Others
Semiconductors
Solar Devices
Electronics
Medical Equipment
Others
North America
United States
Canada
Asia-Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The competitive landscape of the industry has also been examined along with the profiles of the key players being Arradiance LLC, ASM International, Beneq Oy, CVD Equipment Corporation, Forge Nano Inc., Kurt J. Lesker Company, Lam Research Corporation, Oxford Instruments plc, Picosun Oy (Applied Materials Inc.), SENTECH Instruments GmbH, Veeco Instruments Inc., Wonik IPS Co. Ltd. and Tokyo Electron Limited.