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市场调查报告书
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1557249

离子束蚀刻系统市场 – 2024 年至 2029 年预测

Ion Beam Etching System Market - Forecasts from 2024 to 2029
出版日期: | 出版商: Knowledge Sourcing Intelligence | 英文 135 Pages | 商品交期: 最快1-2个工作天内

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简介目录

离子束蚀刻系统市场预计到 2029 年将达到 58.28 亿美元，预测期内复合年增长率为 7.06%，从 2024 年的 41.44 亿美元成长。

离子束蚀刻是一种化学蚀刻工艺，使用惰性气体离子去除或塑造材料。它通常是透过将离子束引导到真空室内的基板上来获得的。该系统通常可以在低压环境中独立控制束流和离子通量。受控异向性蚀刻也是可能的。

全球离子束蚀刻系统市场的主要驱动因素之一是全球不断扩大的医疗设备和设备市场。在医疗设备中，离子束蚀刻解决方案可生产小型或微型零件，例如心律调节器和助听器。医疗设备的生产在全球范围内显着扩大。美国是全球市场医疗设备贸易的领先国家之一。经济复杂性观察站（OEC）在报告中表示，2022年美国医疗设备进口额约347亿美元，高于2021年的约322亿美元。

预计离子束蚀刻系统市场将大幅成长。由于奈米技术的使用越来越多，以及众多组织和公司正在进行的研究计划导致市场快速开拓，该市场正在不断增长。推动半导体产业扩张的技术进步也正在扩大束流蚀刻系统市场。

离子束蚀刻系统市场驱动因素

  • 半导体需求的增加预计将推动全球离子束蚀刻设备的需求。

半导体是现代电子产品的核心，并且正在被小型化以製造更小、更强大的小工具，因此是全球离子束蚀刻系统市场的关键驱动力之一。这需要精确的蚀刻过程。与传统方法相比，离子束蚀刻具有多种优点，包括高精度、均匀性和灵活性。离子束蚀刻系统具有高精度、均匀性和灵活性，与传统方法相比具有多种优势。在微观尺度上排出材料的能力允许在小晶片上形成复杂的形态，确保整个晶圆表面的可靠蚀刻，这对于高性能半导体至关重要。

此外，美国工业协会（SIA）表示，到2024年4月，全球半导体产业销售额将约为464亿美元。与 2023 年 4 月销售额约 401 亿美元相比，成长约 15.8%。 SIA 代表美国半导体产业，占销售额的 99%，约占非美国晶片公司的三分之二。

此外，SIA 认可世界半导体贸易统计 (WSTS) 组织 2024 年春季的预测，即全球半导体销售额将从 2024 年的 6,112 亿美元增至 2025 年创纪录的 6,874 亿美元，创行业历史最高纪录。 。在半导体产业，离子束蚀刻解决方案为各类半导体提供高精度蚀刻和可靠有效的蚀刻。随着半导体产业的扩张，对离子束蚀刻系统的需求预计将进一步增加。

  • 光电子学的日益增长预计将推动离子束蚀刻系统市场的成长。

光电子学涉及研究和使用电子设备进行光源、识别和控制。离子束蚀刻的精度和控制是製造先进光电元件的基础。这种蚀刻是在雷射、LED、检测器等光电元件中製造复杂结构的高效且统一的策略，因此已成为扩大离子束蚀刻系统市场规模的主要因素。离子束蚀刻提供了更好的控制和一致性，有助于开发更有效率、高效能的组件。离子束蚀刻可以处理硅以外的许多材料，而硅是製造 LED 和雷射所必需的。

根据国际装置和系统路线图（IRDS）2022年报告，全球光电子销售额不断成长，预计将从2021年的479亿美元增加到2022年的542亿美元。此外，据报道，过去十年，光电子产业以约13%的复合成长率（CGR）成长。组件销售的成长将需要更精确和更先进的离子束蚀刻技术系统，从而导致未来几年市场扩张的增加。

离子束蚀刻系统市场的地域展望

  • 预计中国将为市场成长做出重大贡献。

中国半导体产业的成长是市场需求增加的主要因素之一。因此，国内製造设备的投资不断增加，而对海外半导体的依赖正在减少。离子束蚀刻设备是提高半导体製造精度的一个重要方面。因此，中国的半导体销售额也在成长。例如，3月份销售额比去年同月成长27.4%。

推动离子束蚀刻系统采用的另一个因素是奈米技术在中国的快速发展。这些系统用于形成光电子和微电子等各种高科技领域所需的高精度奈米结构。中国对以性能为导向的电子设备日益增长的需求正在推动市场发展。此外，离子束蚀刻系统的准确性和准确度使其适合製造先进组件，例如储存晶片、感测器和微处理器。

此外，关键技术的自给自足也支持了市场，因为市场参与企业生产的产品可以增强国家在特定领域的技术能力。例如，中国製造商Perfect Optics生产用于离子束抛光和蚀刻的高品质高频离子束源。

此外，2022年2月，Scia System的离子束蚀刻系统提供给中国新成立的研究所之江实验室。该系统可为最大 150mm 的各种基板尺寸提供反应离子束蚀刻和高度均匀的离子束蚀刻。该系统配备了基板加载锁，可快速处理。对于尖端基础研究和研发应用，Scia Mill 150 因其节省空间的设计和可选的穿墙安装而成为理想选择。

离子束蚀刻系统的主要市场参与企业

  • Veeco-Veeco 开发、製造和销售离子束蚀刻系统，促进全球高科技电子设备的开发和生产。在 Veeco NEXUS 的众多应用中，IBE 系统可精确蚀刻金属薄膜，以生产各种 MRAM、硬碟、行动装置和汽车装置所需的磁感测器。
  • Scia Systems GmbH - Scia Systems 製造和开发离子束和等离子体处理设备，用于在大批量生产和研发环境中製造微电子、MEMS 和精密光学元件。
  • 牛津仪器 - 牛津仪器是工业和研究领域尖端系统和工具的领先供应商。我们开发和製造离子等离子体、离子束蚀刻和沉淀技术。

目录

第一章简介

  • 市场概况
  • 市场定义
  • 调查范围
  • 市场区隔
  • 货币
  • 先决条件
  • 基准年和预测年时间表
  • 相关人员的主要利益

第二章调查方法

  • 研究设计
  • 调查过程

第三章执行摘要

  • 主要发现

第四章市场动态

  • 市场驱动因素
  • 市场限制因素
  • 波特五力分析
  • 产业价值链分析
  • 分析师观点

第五章离子束蚀刻系统市场：依类型

  • 介绍
  • 紧凑型离子束蚀刻设备
  • 单晶片离子束蚀刻设备
  • 批量式离子束蚀刻设备
  • 其他的

第六章离子束蚀刻系统市场：依应用分类

  • 介绍
  • 微机电系统
  • 感应器
  • 电源
  • 高频装置和光学元件
  • 其他的

第七章离子束蚀刻系统市场：按地区

  • 介绍
  • 美洲
  • 欧洲、中东/非洲
  • 亚太地区

第八章竞争环境及分析

  • 主要企业及策略分析
  • 新兴参与企业和巨大的盈利
  • 合併、收购、协议和合作
  • 竞争对手仪表板

第九章 公司简介

  • Veeco
  • SCIA Systems Gmbh
  • Hitachi High-Tech Corporation
  • YAC Holdings Co., Ltd.
  • Oxford Instruments
  • Hakuto Co., Ltd.
  • Leica Microsystems
  • Intlvac Thin Film Corporation
  • Canon Anelva Corporation
  • AdNaNoTek Corporation
  • Lam Research Corporation
  • Plasma-Therm
简介目录
Product Code: KSI061615210

The ion beam etching system market is projected to grow at a CAGR of 7.06% over the forecast period, from US$4.144 billion in 2024 and is expected to reach US$5.828 billion by 2029.

Ion beam etching is a chemical etching process that uses inert gas ions to remove or shape materials. It is generally obtained by directing the beam of ions at the substrate in a vacuum chamber. This system allows the independent control of beam and ion flux, generally in lower-pressure environments. It also produces controlled anisotropic etching.

One of the major driving factors for the global ion beam etching system market can be the global expanding medical device and equipment market. In medical devices, the ion beam etching solutions create small or micro-scale components, like pacemakers and hearing aids. Medical device production is expanding significantly worldwide. The USA is among the leading nations in the trade of medical instruments in the global market. The Observatory of Economic Complexity (OEC) stated in its report that in 2022, the medical instrument import of the US was recorded at about US$34.7 billion, which grew from about US$32.2 billion in 2021.

The ion beam etching system market is projected to rise significantly. The market is growing due to the increasing use of nanotechnology and its quick development due to ongoing research projects carried out by numerous organizations and businesses. Technological advancements driving the semiconductor industry's expansion are also expanding the market for beam etching systems.

ION BEAM ETCHING SYSTEM MARKET DRIVERS:

  • Increasing demand for semiconductors is anticipated to boost the demand for ion beam etching systems globally.

Semiconductors are one of the major drivers for the global ion beam etching system market as they are the center of modern electronic devices, which are miniaturized to make smaller, more powerful gadgets. This requires precise etching procedures. Ion beam etching offers several advantages over traditional methods, incorporating high accuracy, uniformity, and flexibility. The ion beam etching system provides various benefits over traditional procedures, incorporating high accuracy, uniformity, and flexibility. It can evacuate material at a tiny scale, creating intricate features on small-sized chips and ensuring reliable etching across the wafer surface essential for high-performance semiconductors.

Moreover, the Semiconductor Industry Association (SIA) expressed that the global semiconductor industry sales reached around US$46.4 billion by April 2024. This represented an increment of approximately 15.8% compared to April 2023, when the sales were recorded at around US$40.1 billion. SIA represents the U.S. semiconductor industry, accounting for 99% of revenue and about two-thirds of non-U.S. chip firms.

Further, SIA endorsed the World Semiconductor Trade Statistics (WSTS) organization's spring 2024 worldwide semiconductor sales estimate, anticipating an increment from $611.2 billion in 2024 to a record $687.4 billion in 2025, marking the industry's highest-ever yearly sales total. In the semiconductor industry, ion beam etching solution provides high-precision etching and dependable and effective etching for different types of semiconductors. As the semiconductor industry expands, the demand for the ion beam itching system is additionally anticipated to increase.

  • Rising utilization of optoelectronics is predicted to bolster the ion beam itching system market growth.

Optoelectronics includes studying and utilizing electronic gadgets that source, identify, and control light. The accuracy and control of ion beam etching are fundamental for manufacturing progressed optoelectronic components. This is a major factor leading to the growing market size of the ion beam etching system, as this etching is a highly effective and uniform strategy for making complicated structures in optoelectronic gadgets such as lasers, LEDs, and photodetectors. It offers high control and consistency, empowering the advancement of more productive and high-performance components. Ion beam etching can handle many materials beyond silicon, which are required to manufacture LEDs and lasers.

The International Roadmap for Devices and Systems (IRDS) 2022 report stated a constant rise in the global sales of optoelectronics, which was forecasted to rise from $47.9 billion in 2021 to $54.2 billion in 2022. Moreover, it was reported that for the last 10 years, optoelectronics has been growing at about 13% Compound Growth Rate (CGR). This rise in component sales would demand a more precise and progressed ion beam etching techniques system, leading to an increment in the market expansion in the coming years.

Ion Beam Etching System Market Geographical Outlook

  • China is predicted to contribute at a substantial pace to market growth.

China's growth in the semiconductor industry is one major factor that is increasing the market demand. This has led to increased domestic investments in manufacturing facilities while reducing reliance on international semiconductors. Ion beam etching systems are required as a critical aspect of semiconductor production to improve its accuracy. This has also increased the sales of semiconductors in China. For instance, the year-over-year sales in March rose by 27.4%.

Another factor driving the adoption of ion beam etching systems is rapid advancements in nanotechnology in China. These systems are used to form very precise nanostructures required in different hi-tech sectors, such as optoelectronics and microelectronics. In China, there is a rise in the need for performance-oriented electronic devices, which is leading the market. Moreover, due to their accuracy and precision, ion beam etching systems are suitable for creating advanced components such as memory chips, sensors, and microprocessors.

Further, market players manufacture products that increase a country's technological capacity in a particular area, and self-sufficiency in crucial technologies also supports the market. For instance, the Chinese manufacturer Perfect Optics produces a high-quality radio frequency ion beam source for ion beam polishing and etching.

Moreover, in February 2022, Zhejiang Lab, a new research institute in China, was provided with an Ion Beam Etching System from Scia System. The system will accomplish reactive ion beam etching and high uniform ion beam etching on varying substrate sizes up to 150 mm. It is fitted with a single substrate load lock for quicker processing. Cutting-edge and fundamental research, as well as R&D applications, are best served by the Scia Mill 150 because of its space-saving design and optional through-the-wall installation.

Ion Beam Etching System Key Market Players:

  • Veeco - Veeco develops, produces, and sells ion beam etching systems that facilitate global high-tech electronic device development and production. Among the many uses for the Veeco NEXUS, IBE systems are precisely etching metallic films to produce the magnetic sensors needed for a wide range of MRAM, hard drives, mobile, and automotive devices.
  • Scia Systems GmbH- Scia Systems manufactures and develops ion beam and plasma processing equipment for producing microelectronics, MEMS, and precision optical components in high-volume and R&D environments. Multiple vacuum process chambers can be combined into cluster or in-line solutions, depending on the customer's needs, because of their flexible and modular design.
  • Oxford Instruments - Oxford Instruments is a top supplier of cutting-edge systems and tools for industry and research. It creates and produces technologies for ion plasma and ion beam etching and deposition.

Market Segmentation:

The Ion Beam Etching System Market is segmented and analyzed as below:

By Type

  • Compact ion beam etching machine
  • Single wafer type ion beam etching machine
  • Batch-type ion beam etching machine
  • Others

By Application

  • MEMS
  • Sensors
  • Power devices
  • High-frequency devices and optical devices
  • Others

By Geography

  • Americas
  • USA
  • Canada
  • Others
  • Europe, the Middle East, and Africa
  • Germany
  • France
  • United Kingdom
  • Others
  • Asia Pacific
  • China
  • Japan
  • India
  • South Korea
  • Taiwan
  • Others

TABLE OF CONTENTS

1. INTRODUCTION

  • 1.1. Market Overview
  • 1.2. Market Definition
  • 1.3. Scope of the Study
  • 1.4. Market Segmentation
  • 1.5. Currency
  • 1.6. Assumptions
  • 1.7. Base and Forecast Years Timeline
  • 1.8. Key benefits for the stakeholders

2. RESEARCH METHODOLOGY

  • 2.1. Research Design
  • 2.2. Research Process

3. EXECUTIVE SUMMARY

  • 3.1. Key Findings

4. MARKET DYNAMICS

  • 4.1. Market Drivers
  • 4.2. Market Restraints
  • 4.3. Porter's Five Forces Analysis
    • 4.3.1. Bargaining Power of Suppliers
    • 4.3.2. Bargaining Power of Buyers
    • 4.3.3. Threat of New Entrants
    • 4.3.4. Threat of Substitutes
    • 4.3.5. Competitive Rivalry in the Industry
  • 4.4. Industry Value Chain Analysis
  • 4.5. Analyst view

5. ION BEAM ETCHING SYSTEM MARKET BY TYPE

  • 5.1. Introduction
  • 5.2. Compact ion beam etching machine
  • 5.3. Single wafer type ion beam etching machine
  • 5.4. Batch-type ion beam etching machine
  • 5.5. Others

6. ION BEAM ETCHING SYSTEM MARKET BY APPLICATION

  • 6.1. Introduction
  • 6.2. MEMS
  • 6.3. Sensors
  • 6.4. Power devices
  • 6.5. High-frequency devices and optical devices
  • 6.6. Others

7. ION BEAM ETCHING SYSTEM MARKET BY GEOGRAPHY

  • 7.1. Introduction
  • 7.2. Americas
    • 7.2.1. By Type
    • 7.2.2. By Application
    • 7.2.3. By Country
      • 7.2.3.1. USA
      • 7.2.3.2. Canada
      • 7.2.3.3. Others
  • 7.3. Europe, the Middle East, and Africa
    • 7.3.1. By Type
    • 7.3.2. By Application
    • 7.3.3. By Country
      • 7.3.3.1. Germany
      • 7.3.3.2. France
      • 7.3.3.3. United Kingdom
      • 7.3.3.4. Others
  • 7.4. Asia Pacific
    • 7.4.1. By Type
    • 7.4.2. By Application
    • 7.4.3. By Country
      • 7.4.3.1. China
      • 7.4.3.2. Japan
      • 7.4.3.3. India
      • 7.4.3.4. South Korea
      • 7.4.3.5. Taiwan
      • 7.4.3.6. Others

8. COMPETITIVE ENVIRONMENT AND ANALYSIS

  • 8.1. Major Players and Strategy Analysis
  • 8.2. Emerging Players and Markey Lucrativeness
  • 8.3. Mergers, Acquisitions, Agreements, and Collaborations
  • 8.4. Competitive Dashboard

9. COMPANY PROFILES

  • 9.1. Veeco
  • 9.2. SCIA Systems Gmbh
  • 9.3. Hitachi High-Tech Corporation
  • 9.4. Y.A.C. Holdings Co., Ltd.
  • 9.5. Oxford Instruments
  • 9.6. Hakuto Co., Ltd.
  • 9.7. Leica Microsystems
  • 9.8. Intlvac Thin Film Corporation
  • 9.9. Canon Anelva Corporation
  • 9.10. AdNaNoTek Corporation
  • 9.11. Lam Research Corporation
  • 9.12. Plasma-Therm