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市场调查报告书
商品编码
1734853

2032 年光掩模市场预测：按产品类型、掩模类型、技术节点、应用、最终用户和地区进行的全球分析

Photomask Market Forecasts to 2032 - Global Analysis By Product Type (Reticle, Master Mask, Copy Mask, and Other Product Types), Mask Type, Technology Node, Application, End Users and By Geography
出版日期: | 出版商: Stratistics Market Research Consulting | 英文 200+ Pages | 商品交期: 2-3个工作天内

价格

根据 Stratistics MRC 的数据，全球光罩市场预计在 2025 年达到 58.1 亿美元，到 2032 年将达到 91.6 亿美元，预测期内的复合年增长率为 6.7%。

光掩模是微加工微影术的关键工具，尤其适用于半导体製造。它由一块涂有不透明图案的玻璃或石英板组成，图案可以选择性地阻挡光线。当暴露在紫外线 (UV) 下时，光掩模会将图案转移到硅晶片上的感光层上。这项製程可以精确蚀刻复杂的电路设计，而这些电路设计对于积体电路和其他微型元件的生产至关重要。

美国商务部报告显示，2021年美国半导体销售额成长了29%。

增加对半导体研发的投资

半导体技术研发的持续推进，推动了光掩模设计的创新，以提高其效率和耐用性。先进的光掩模能够实现精确的电路图形化，这是半导体製造的关键方面。极紫外线 (EUV)微影术的日益普及，进一步推动了对下一代光掩模的投资。领先的半导体製造商正在扩大研发预算，以增强光掩模的性能并降低製造成本。此外，研究机构与产业参与者之间的合作正在加速光掩模的进步。

製造成本高

开发光掩模需要先进的技术和专用设备，这需要大量的资本投入。随着积体电路变得越来越复杂，需要更先进、规格更严格的光掩模，这进一步推高了成本。此外，製造过程中涉及昂贵的原材料和复杂的製造工艺，因此很难以合理的价格购买。高昂的营运成本阻碍了中小型製造商进入市场，限制了该行业的扩张。

微影术技术的进步

微影术技术的进步正在彻底改变光掩模产业，使半导体製造更加精确且有效率。向极紫外线（微影术的过渡显着提高了光掩模的分辨率和精度，从而提升了晶片性能。光学邻近校正 (OPC) 和逆向微影术技术 (ILT) 等创新技术正在不断改进设计流程。此外，计算微影术的整合正在简化光掩模开发流程，加快半导体产品的上市时间。

熟练劳动力有限

光掩模产业需要具备半导体微影术和光学工程专业知识的高技能人才。然而，目前缺乏能够跟上先进光掩模发展步伐的优秀工程师和技术人员。微影术技术的复杂性和不断发展的行业标准使得持续的技能发展至关重要。企业在吸引和留住专业人才方面面临挑战，这影响了生产效率和创新。劳动力短缺可能会减缓下一代光掩模技术的采用，并影响市场成长。

COVID-19的影响

新冠疫情扰乱了全球半导体供应链，影响了光掩模的生产和分销。封锁和限制措施导致製造设施暂时关闭，导致半导体生产延迟。然而，在疫情后的復苏时期，半导体需求激增，刺激了对光掩模开发的投资。远端办公和电子设备使用率的提高进一步促进了半导体产量，使光掩模市场受益。

预计在预测期内，光罩部分将成为最大的部分。

预计在预测期内，光罩领域将占据最大的市场占有率，因为半导体装置的持续微缩需要先进节点的高精度图形化。 EUV微影术和3D IC封装的采用进一步推动了对复杂光罩设计的需求。此外，人工智慧、5G和汽车电子领域的投资不断增加，加速了先进晶片的生产，也推动了光掩模製造过程中对高品质光罩的需求。

预计电子业在预测期内将实现最高的复合年增长率。

预计在预测期内，电子产品领域将迎来最高成长，这得益于智慧型手机、笔记型电脑和物联网设备等更小巧、更强大的设备需求的不断增长。随着消费者对更快、更小、更节能电子产品的需求不断增长，半导体製造商需要先进的光掩模来实现精密晶片的生产。此外，显示科技、穿戴式装置和智慧家居设备的快速创新，持续推动着电子製造领域对高解析度光掩模解决方案的需求。

比最大的地区

在预测期内，亚太地区凭藉其在半导体製造业的主导地位，预计将占据最大的市场占有率。台湾、韩国、中国大陆和日本等国家和地区拥有台积电、三星和SK海力士等主要半导体工厂，这些工厂正在推动先进光掩模的需求。此外，政府的措施和对半导体基础设施投资的增加也进一步推动了该地区市场的成长。

复合年增长率最高的地区：

新兴技术，尤其是极紫外线 (EUV)微影术，需要高精度光掩模来满足更小的製程节点和复杂的晶片设计。此外，家用电子电器、电动车和人工智慧应用的需求日益增长，进一步推动了对先进光掩模的需求，以满足这些先进设备的需求。

免费客製化服务：

订阅此报告的客户可享有以下免费自订选项之一：

  • 公司简介
    • 全面分析其他市场参与者（最多 3 家公司）
    • 主要企业的SWOT分析（最多3家公司）
  • 地理细分
    • 根据客户兴趣对主要国家市场进行估计、预测和复合年增长率（註：基于可行性检查）
  • 竞争基准化分析
    • 根据产品系列、地理分布和策略联盟对主要企业基准化分析

目录

第一章执行摘要

第二章 前言

  • 概述
  • 相关利益者
  • 研究范围
  • 调查方法
    • 资料探勘
    • 数据分析
    • 数据检验
    • 研究途径
  • 研究材料
    • 主要研究资料
    • 次级研究资讯来源
    • 先决条件

第三章市场走势分析

  • 驱动程式
  • 限制因素
  • 机会
  • 威胁
  • 技术分析
  • 应用分析
  • 最终用户分析
  • 新兴市场
  • COVID-19的影响

第四章 波特五力分析

  • 供应商的议价能力
  • 买家的议价能力
  • 替代品的威胁
  • 新进入者的威胁
  • 竞争对手之间的竞争

第五章全球光掩模市场（依产品类型）

  • 标线
  • 大师面具
  • 复製蒙版
  • 其他产品类型

第六章全球光掩模市场（以遮罩类型）

  • 二进制掩码
  • 相移掩模版（PSM）
  • 极紫外线 (EUV) 光罩版
  • 其他类型的面膜

第七章 全球光掩模市场（依技术节点）

  • 传统节点（28nm以上）
  • 10nm～14nm
  • 3nm～10nm

第八章全球光掩模市场（按应用）

  • 展示
  • 分立元件
  • 光学设备
  • MEMS
  • 半导体和积体电路
  • 平面显示器
  • 其他用途

第九章全球光掩模市场（按最终用户）

  • 电子产品
  • 车
  • 通讯
  • 航太和国防
  • 卫生保健
  • 其他最终用户

第 10 章全球光掩模市场（按区域）

  • 北美洲
    • 美国
    • 加拿大
    • 墨西哥
  • 欧洲
    • 德国
    • 英国
    • 义大利
    • 法国
    • 西班牙
    • 其他欧洲国家
  • 亚太地区
    • 日本
    • 中国
    • 印度
    • 澳洲
    • 纽西兰
    • 韩国
    • 其他亚太地区
  • 南美洲
    • 阿根廷
    • 巴西
    • 智利
    • 南美洲其他地区
  • 中东和非洲
    • 沙乌地阿拉伯
    • 阿拉伯聯合大公国
    • 卡达
    • 南非
    • 其他中东和非洲地区

第十一章 重大进展

  • 协议、伙伴关係、合作和合资企业
  • 收购与合併
  • 新产品发布
  • 业务扩展
  • 其他关键策略

第十二章 公司概况

  • Advance Reproductions Corporation
  • Applied Materials Inc.
  • Compugraphics International Limited
  • Dai Nippon Printing Co., Ltd.
  • HOYA Corporation
  • Infinite Graphics Incorporated
  • KLA Corporation
  • Lasertec Corporation
  • LG Innotek Co., Ltd.
  • Mycronic AB
  • Nippon Filcon Co., Ltd.
  • Photronics, Inc.
  • Qingyi Photomask Limited
  • SK-Electronics Co., Ltd.
  • Taiwan Mask Corporation（TMC）
Product Code: SMRC29490

According to Stratistics MRC, the Global Photomask Market is accounted for $5.81 billion in 2025 and is expected to reach $9.16 billion by 2032 growing at a CAGR of 6.7% during the forecast period. A photomask is a crucial tool used in photolithography for micro-fabrication, particularly in semiconductor manufacturing. It consists of a glass or quartz plate coated with an opaque material patterned to block light selectively. When exposed to ultraviolet (UV) light, the photomask transfers its pattern onto a photosensitive layer on a silicon wafer. This process enables the precise etching of intricate circuit designs essential for creating integrated circuits and other micro-devices.

According to a report by the U.S. According to the Department of Commerce, the sale of semiconductors in the United States grew 29% in 2021.

Market Dynamics:

Driver:

Rising investment in semiconductor R&D

Increasing research and development in semiconductor technology is fuelling innovations in photomask designs, improving their efficiency and durability. Advanced photomasks enable precise circuit patterning, a crucial aspect of semiconductor fabrication. The growing adoption of extreme ultraviolet (EUV) lithography is further driving investment in next-generation photomasks. Leading semiconductor manufacturers are expanding their R&D budgets to enhance photomask capabilities and reduce production costs. Additionally, collaborations between research institutions and industry players are accelerating photomask advancements.

Restraint:

High production costs

The development of photomasks requires sophisticated technologies and highly specialized equipment, leading to significant capital investment. The increasing complexity of integrated circuits demands advanced photomasks with stringent specifications, further driving up costs. Additionally, the production process involves expensive raw materials and intricate manufacturing techniques, making affordability a challenge. High operational costs can deter smaller manufacturers from entering the market, limiting industry expansion.

Opportunity:

Technological advancements in lithography

Advancements in lithography technologies are revolutionizing the photomask industry, enabling higher precision and efficiency in semiconductor manufacturing. The transition to EUV lithography is significantly enhancing the resolution and accuracy of photomasks, improving chip performance. Innovations such as optical proximity correction (OPC) and inverse lithography technology (ILT) are refining the design process. Additionally, the integration of computational lithography is streamlining photomask development, accelerating time-to-market for semiconductor products.

Threat:

Limited skilled workforce

The photomask industry requires highly skilled professionals with expertise in semiconductor lithography and optical engineering. However, there is a shortage of qualified engineers and technicians capable of handling advanced photomask development. The complexity of lithographic technologies and evolving industry standards make continuous skill development essential. Companies face challenges in recruiting and retaining specialized talent, impacting production efficiency and innovation. Workforce limitations may slow down the adoption of next-generation photomask technologies, affecting market growth.

Covid-19 Impact

The COVID-19 pandemic disrupted global semiconductor supply chains, affecting photomask production and distribution. Lockdowns and restrictions led to temporary shutdowns of manufacturing facilities, causing delays in semiconductor fabrication. However, the post-pandemic recovery witnessed a surge in semiconductor demand, driving investments in photomask development. The rise in remote work and electronic device usage further boosted semiconductor production, benefiting the photomask market.

The reticle segment is expected to be the largest during the forecast period

The reticle segment is expected to account for the largest market share during the forecast period, due to the continuous scaling of semiconductor devices, requiring high-precision patterning for advanced nodes. The adoption of EUV lithography and 3D IC packaging further fuels the need for complex reticle designs. Additionally, increased investment in AI, 5G, and automotive electronics accelerates the production of advanced chips, thereby boosting the demand for high-quality reticles in photomask fabrication processes

The electronics segment is expected to have the highest CAGR during the forecast period

Over the forecast period, the electronics segment is predicted to witness the highest growth rate, due to the rising demand for miniaturized and high-performance devices like smartphones, laptops, and IoT gadgets. As consumer expectations push for faster, smaller, and more energy-efficient electronics, semiconductor manufacturers require advanced photomasks for precise chip fabrication. Additionally, rapid innovation in display technologies, wearables, and smart home devices continues to fuel the need for high-resolution photomask solutions in electronics production.

Region with largest share:

During the forecast period, the Asia Pacific region is expected to hold the largest market share due to its dominance in semiconductor manufacturing. Countries like Taiwan, South Korea, China, and Japan host major semiconductor fabs, including TSMC, Samsung, and SK Hynix, fueling demand for advanced photomasks. Additionally, government initiatives and increased investments in semiconductor infrastructure further bolster the region's market growth.

Region with highest CAGR:

Over the forecast period, the North America region is anticipated to exhibit the highest CAGR, owing to the region's leadership in semiconductor research and development, particularly in advanced technologies like Extreme Ultraviolet (EUV) lithography, necessitates high-precision photomasks for smaller process nodes and intricate chip designs. Additionally, the increasing demand for consumer electronics, electric vehicles, and AI-driven applications further propels the need for advanced photomasks to meet the requirements of these sophisticated devices.

Key players in the market

Some of the key players profiled in the Photomask Market include Advance Reproductions Corporation, Applied Materials Inc., Compugraphics International Limited, Dai Nippon Printing Co., Ltd., HOYA Corporation, Infinite Graphics Incorporated, KLA Corporation, Lasertec Corporation, LG Innotek Co., Ltd., Mycronic AB, Nippon Filcon Co., Ltd., Photronics, Inc., Qingyi Photomask Limited, SK-Electronics Co., Ltd., and Taiwan Mask Corporation (TMC).

Key Developments:

In April 2025, Applied Materials, Inc. announced it has purchased 9 percent of the outstanding shares of the common stock of BE Semiconductor Industries N.V. (Besi), a leading manufacturer of assembly equipment for the semiconductor industry. Applied and Besi have been successfully collaborating since 2020, and recently extended their agreement, to co-develop the industry's first fully integrated equipment solution for die-based hybrid bonding.

In June 2016, Advance Reproductions Corp. is pleased to announce the installation of its Next-Generation Laser Writer for Photomask manufacturing. The Mycronic FPS5500 is the latest technology offering from Mycronic AB, Taby, Sweden. Installation was completed in July 2016 and is currently in production for photomask manufacturing.

Product Types Covered:

  • Reticle
  • Master Mask
  • Copy Mask
  • Other Product Types

Mask Types Covered:

  • Binary Mask
  • Phase Shift Mask (PSM)
  • Extreme Ultraviolet (EUV) Mask
  • Other Mask Types

Technology Nodes Covered:

  • Legacy Nodes (28nm and Above)
  • 10nm to 14nm
  • 3nm to 10nm

Applications Covered:

  • Displays
  • Discrete Components
  • Optical Devices
  • MEMS
  • Semiconductor & IC
  • Flat Panel Displays
  • Other Applications

End Users Covered:

  • Electronics
  • Automotive
  • Telecommunications
  • Aerospace & Defense
  • Healthcare
  • Other End Users

Regions Covered:

  • North America
    • US
    • Canada
    • Mexico
  • Europe
    • Germany
    • UK
    • Italy
    • France
    • Spain
    • Rest of Europe
  • Asia Pacific
    • Japan
    • China
    • India
    • Australia
    • New Zealand
    • South Korea
    • Rest of Asia Pacific
  • South America
    • Argentina
    • Brazil
    • Chile
    • Rest of South America
  • Middle East & Africa
    • Saudi Arabia
    • UAE
    • Qatar
    • South Africa
    • Rest of Middle East & Africa

What our report offers:

  • Market share assessments for the regional and country-level segments
  • Strategic recommendations for the new entrants
  • Covers Market data for the years 2022, 2023, 2024, 2026, and 2030
  • Market Trends (Drivers, Constraints, Opportunities, Threats, Challenges, Investment Opportunities, and recommendations)
  • Strategic recommendations in key business segments based on the market estimations
  • Competitive landscaping mapping the key common trends
  • Company profiling with detailed strategies, financials, and recent developments
  • Supply chain trends mapping the latest technological advancements

Free Customization Offerings:

All the customers of this report will be entitled to receive one of the following free customization options:

  • Company Profiling
    • Comprehensive profiling of additional market players (up to 3)
    • SWOT Analysis of key players (up to 3)
  • Regional Segmentation
    • Market estimations, Forecasts and CAGR of any prominent country as per the client's interest (Note: Depends on feasibility check)
  • Competitive Benchmarking
    • Benchmarking of key players based on product portfolio, geographical presence, and strategic alliances

Table of Contents

1 Executive Summary

2 Preface

  • 2.1 Abstract
  • 2.2 Stake Holders
  • 2.3 Research Scope
  • 2.4 Research Methodology
    • 2.4.1 Data Mining
    • 2.4.2 Data Analysis
    • 2.4.3 Data Validation
    • 2.4.4 Research Approach
  • 2.5 Research Sources
    • 2.5.1 Primary Research Sources
    • 2.5.2 Secondary Research Sources
    • 2.5.3 Assumptions

3 Market Trend Analysis

  • 3.1 Introduction
  • 3.2 Drivers
  • 3.3 Restraints
  • 3.4 Opportunities
  • 3.5 Threats
  • 3.6 Technology Analysis
  • 3.7 Application Analysis
  • 3.8 End User Analysis
  • 3.9 Emerging Markets
  • 3.10 Impact of Covid-19

4 Porters Five Force Analysis

  • 4.1 Bargaining power of suppliers
  • 4.2 Bargaining power of buyers
  • 4.3 Threat of substitutes
  • 4.4 Threat of new entrants
  • 4.5 Competitive rivalry

5 Global Photomask Market, By Product Type

  • 5.1 Introduction
  • 5.2 Reticle
  • 5.3 Master Mask
  • 5.4 Copy Mask
  • 5.5 Other Product Types

6 Global Photomask Market, By Mask Type

  • 6.1 Introduction
  • 6.2 Binary Mask
  • 6.3 Phase Shift Mask (PSM)
  • 6.4 Extreme Ultraviolet (EUV) Mask
  • 6.5 Other Mask Types

7 Global Photomask Market, By Technology Node

  • 7.1 Introduction
  • 7.2 Legacy Nodes (28nm and Above)
  • 7.3 10nm to 14nm
  • 7.4 3nm to 10nm

8 Global Photomask Market, By Application

  • 8.1 Introduction
  • 8.2 Displays
  • 8.3 Discrete Components
  • 8.4 Optical Devices
  • 8.5 MEMS
  • 8.6 Semiconductor & IC
  • 8.7 Flat Panel Displays
  • 8.8 Other Applications

9 Global Photomask Market, By End User

  • 9.1 Introduction
  • 9.2 Electronics
  • 9.3 Automotive
  • 9.4 Telecommunications
  • 9.5 Aerospace & Defense
  • 9.6 Healthcare
  • 9.7 Other End Users

10 Global Photomask Market, By Geography

  • 10.1 Introduction
  • 10.2 North America
    • 10.2.1 US
    • 10.2.2 Canada
    • 10.2.3 Mexico
  • 10.3 Europe
    • 10.3.1 Germany
    • 10.3.2 UK
    • 10.3.3 Italy
    • 10.3.4 France
    • 10.3.5 Spain
    • 10.3.6 Rest of Europe
  • 10.4 Asia Pacific
    • 10.4.1 Japan
    • 10.4.2 China
    • 10.4.3 India
    • 10.4.4 Australia
    • 10.4.5 New Zealand
    • 10.4.6 South Korea
    • 10.4.7 Rest of Asia Pacific
  • 10.5 South America
    • 10.5.1 Argentina
    • 10.5.2 Brazil
    • 10.5.3 Chile
    • 10.5.4 Rest of South America
  • 10.6 Middle East & Africa
    • 10.6.1 Saudi Arabia
    • 10.6.2 UAE
    • 10.6.3 Qatar
    • 10.6.4 South Africa
    • 10.6.5 Rest of Middle East & Africa

11 Key Developments

  • 11.1 Agreements, Partnerships, Collaborations and Joint Ventures
  • 11.2 Acquisitions & Mergers
  • 11.3 New Product Launch
  • 11.4 Expansions
  • 11.5 Other Key Strategies

12 Company Profiling

  • 12.1 Advance Reproductions Corporation
  • 12.2 Applied Materials Inc.
  • 12.3 Compugraphics International Limited
  • 12.4 Dai Nippon Printing Co., Ltd.
  • 12.5 HOYA Corporation
  • 12.6 Infinite Graphics Incorporated
  • 12.7 KLA Corporation
  • 12.8 Lasertec Corporation
  • 12.9 LG Innotek Co., Ltd.
  • 12.10 Mycronic AB
  • 12.11 Nippon Filcon Co., Ltd.
  • 12.12 Photronics, Inc.
  • 12.13 Qingyi Photomask Limited
  • 12.14 SK-Electronics Co., Ltd.
  • 12.15 Taiwan Mask Corporation (TMC)

List of Tables

  • Table 1 Global Photomask Market Outlook, By Region (2024-2032) ($MN)
  • Table 2 Global Photomask Market Outlook, By Product Type (2024-2032) ($MN)
  • Table 3 Global Photomask Market Outlook, By Reticle (2024-2032) ($MN)
  • Table 4 Global Photomask Market Outlook, By Master Mask (2024-2032) ($MN)
  • Table 5 Global Photomask Market Outlook, By Copy Mask (2024-2032) ($MN)
  • Table 6 Global Photomask Market Outlook, By Other Product Types (2024-2032) ($MN)
  • Table 7 Global Photomask Market Outlook, By Mask Type (2024-2032) ($MN)
  • Table 8 Global Photomask Market Outlook, By Binary Mask (2024-2032) ($MN)
  • Table 9 Global Photomask Market Outlook, By Phase Shift Mask (PSM) (2024-2032) ($MN)
  • Table 10 Global Photomask Market Outlook, By Extreme Ultraviolet (EUV) Mask (2024-2032) ($MN)
  • Table 11 Global Photomask Market Outlook, By Other Mask Types (2024-2032) ($MN)
  • Table 12 Global Photomask Market Outlook, By Technology Node (2024-2032) ($MN)
  • Table 13 Global Photomask Market Outlook, By Legacy Nodes (28nm and Above) (2024-2032) ($MN)
  • Table 14 Global Photomask Market Outlook, By 10nm to 14nm (2024-2032) ($MN)
  • Table 15 Global Photomask Market Outlook, By 3nm to 10nm (2024-2032) ($MN)
  • Table 16 Global Photomask Market Outlook, By Application (2024-2032) ($MN)
  • Table 17 Global Photomask Market Outlook, By Displays (2024-2032) ($MN)
  • Table 18 Global Photomask Market Outlook, By Discrete Components (2024-2032) ($MN)
  • Table 19 Global Photomask Market Outlook, By Optical Devices (2024-2032) ($MN)
  • Table 20 Global Photomask Market Outlook, By MEMS (2024-2032) ($MN)
  • Table 21 Global Photomask Market Outlook, By Semiconductor & IC (2024-2032) ($MN)
  • Table 22 Global Photomask Market Outlook, By Flat Panel Displays (2024-2032) ($MN)
  • Table 23 Global Photomask Market Outlook, By Other Applications (2024-2032) ($MN)
  • Table 24 Global Photomask Market Outlook, By End User (2024-2032) ($MN)
  • Table 25 Global Photomask Market Outlook, By Electronics (2024-2032) ($MN)
  • Table 26 Global Photomask Market Outlook, By Automotive (2024-2032) ($MN)
  • Table 27 Global Photomask Market Outlook, By Telecommunications (2024-2032) ($MN)
  • Table 28 Global Photomask Market Outlook, By Aerospace & Defense (2024-2032) ($MN)
  • Table 29 Global Photomask Market Outlook, By Healthcare (2024-2032) ($MN)
  • Table 30 Global Photomask Market Outlook, By Other End Users (2024-2032) ($MN)

Note: Tables for North America, Europe, APAC, South America, and Middle East & Africa Regions are also represented in the same manner as above.