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市场调查报告书
商品编码
1947512

极紫外线 (EUV) 微影市场：依设备（曝光系统、光源、光学元件和反射镜、掩模相关系统）、技术（标准 EUV/NXE、高数值孔径 EUV/EXE）和应用（代工厂、记忆体、整合装置製造商）划分 - 全球预测至 2036 年

Extreme Ultraviolet (EUV) Lithography Market by Equipment (Exposure Systems, Light Sources, Optics & Mirrors, Mask-related Systems), Technology (Standard EUV/NXE, High-NA EUV/EXE), and End-use (Foundry, Memory, IDM) - Global Forecast to 2036
出版日期: | 出版商: Meticulous Research | 英文 273 Pages | 商品交期: 5-7个工作天内

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简介目录

全球 EUV 光刻市场预计在预测期（2026-2036 年）内将以 8.4% 的复合年增长率增长，从 2026 年的 119.3 亿美元增长到 2036 年的约 268.1 亿美元。

本报告对全球五大主要地区的 EUV 光刻市场进行了详细分析，重点关注当前市场趋势、市场规模、近期发展以及至 2036 年的预测。透过广泛的二级和一级研究以及对市场情景的深入分析，本报告对关键产业驱动因素、限制因素、机会和挑战的影响进行了分析。

推动极紫外光刻市场成长的关键因素包括全球对先进半导体微缩技术日益增长的关注，以及高效能运算和人工智慧应用的快速发展。此外，高数值孔径（NA）极紫外光刻技术的日益普及、先进代工厂对高可靠性图形化需求的增长，以及与数位化製造的日益融合，预计都将为极紫外光刻市场的企业创造巨大的成长机会。

市场区隔

目录

第一章：引言

第二章：摘要整理

第三章：市场概览

  • 市场动态
    • 驱动因素
    • 限制因素
    • 机遇
    • 挑战
  • 高数值孔径 (NA) 和人工智慧 (AI) 对极紫外线 (EUV) 微影的影响
  • 监管环境与半导体标准
  • 波特五力分析

第四章：全球极紫外线 (EUV) 微影市场（依设备类型划分）

  • 曝光系统（步进式/扫描式）
    • NXE 系列（标准 EUV）
    • EXE 系列（高数值孔径 EUV）
  • 光源（LPP/DPP）
  • 光学元件与反射镜
  • 掩模相关系统
    • 掩模侦测（曝光/非曝光）
    • 掩模坯与光阻
  • 其他（计量和检测）

第五章：全球极紫外线 (EUV) 微影市场（以技术划分）

  • 标准 EUV (NXE)
  • 高数值孔径 EUV (EXE)

第六章：全球极紫外线 (EUV) 微影市场（以技术划分）

  • 晶圆代工厂
  • 记忆体（DRAM/NAND）
  • 整合元件製造商 (IDM)

第七章 全球极紫外线 (EUV) 微影市场（依地区划分）

  • 北美
    • 美国
    • 加拿大
  • 欧洲
    • 德国
    • 法国
    • 英国
    • 义大利
    • 西班牙
    • 荷兰
    • 欧洲其他地区
  • 亚太地区
    • 中国
    • 印度
    • 日本
    • 韩国
    • 东南亚
    • 澳大利亚
    • 亚太其他地区
  • 拉丁美洲美洲
    • 巴西
    • 墨西哥
    • 拉丁美洲其他地区
  • 中东和非洲
    • 沙乌地阿拉伯
    • 阿拉伯联合大公国
    • 南非
    • 中东和非洲其他地区

第八章 竞争格局

  • 关键成长策略
  • 竞争标竿分析
  • 竞争概览
    • 行业领导者
    • 市场差异化因素
    • 先锋企业
    • 新兴企业
  • 主要企业市场排名/定位分析（2025 年）

第九章：公司简介（製造商和供应商）

  • ASML Holding N.V.
  • ZEISS SMT
  • Lasertec Corporation
  • KLA Corporation
  • Applied Materials, Inc.
  • Ushio Inc.
  • Gigaphoton Inc.
  • Tokyo Electron Limited
  • Toppan Holdings Inc.
  • HOYA Corporation
  • JSR Corporation
  • Shin-Etsu Chemical Co., Ltd.

第10章 附录

简介目录
Product Code: MRSE - 1041751

According to the research report titled, 'Extreme Ultraviolet (EUV) Lithography Market by Equipment (Exposure Systems, Light Sources, Optics & Mirrors, Mask-related Systems), Technology (Standard EUV/NXE, High-NA EUV/EXE), and End-use (Foundry, Memory, IDM) - Global Forecast to 2036,' the global EUV lithography market is expected to reach approximately USD 26.81 billion by 2036 from USD 11.93 billion in 2026, at a CAGR of 8.4% during the forecast period (2026-2036).

The report provides an in-depth analysis of the global EUV lithography market across five major regions, emphasizing the current market trends, market sizes, recent developments, and forecasts till 2036. Following extensive secondary and primary research and an in-depth analysis of the market scenario, the report conducts the impact analysis of the key industry drivers, restraints, opportunities, and challenges.

The major factors driving the growth of the EUV lithography market include the intensifying global focus on advanced semiconductor scaling and the rapid expansion of high-performance computing and artificial intelligence applications. Additionally, the rapid expansion of High-NA EUV initiatives, increasing need for high-reliability patterning in advanced foundry complexes, and digital manufacturing integration are expected to create significant growth opportunities for players operating in the EUV lithography market.

Market Segmentation

The EUV lithography market is segmented by equipment (exposure systems, light sources, optics & mirrors, mask-related systems), technology (standard EUV/NXE, high-NA EUV/EXE), end-use (foundry, memory, IDM), and geography. The study also evaluates industry competitors and analyzes the market at the country level.

Based on Equipment

By equipment, the exposure systems segment holds the largest market share in 2026, primarily attributed to its critical role in supporting high-volume manufacturing and rapid node transition requirements. These systems provide the core patterning infrastructure necessary for advanced semiconductor fabrication and enable high-precision wafer processing. However, the light sources and optics & mirrors segments are expected to grow at significant CAGRs during the forecast period, driven by the increasing adoption of High-NA EUV platforms and the need for enhanced optical performance. The ability to deliver integrated solutions with proven manufacturing efficacy makes advanced equipment platforms highly attractive for semiconductor fabrication facilities.

Based on Technology

By technology, the standard EUV/NXE segment holds the largest market share in 2026, primarily due to its established manufacturing infrastructure, proven reliability, and widespread adoption in advanced logic and memory production. The standard EUV platforms have become essential for sub-3nm node manufacturing and continue to support high-volume production across the semiconductor industry. The High-NA EUV/EXE segment is expected to witness the fastest growth during the forecast period, driven by the need for improved resolution capabilities, enhanced overlay accuracy, and advanced patterning performance. High-NA systems represent the next generation of EUV technology with superior capabilities for sub-2nm and sub-1nm node scaling.

Based on End-use

By end-use, the foundry segment holds the largest share of the overall market in 2026, due to its critical role in supporting diverse semiconductor manufacturing needs and its position as a primary driver of advanced node adoption. Foundries operate at the forefront of technology scaling and represent the largest consumer of EUV lithography equipment. The memory segment is expected to grow at a significant CAGR during the forecast period, driven by the increasing demand for advanced DRAM and NAND flash memory at smaller nodes. The integrated device manufacturer (IDM) segment represents an emerging segment with growing adoption of EUV technology for in-house semiconductor manufacturing and advanced node production.

Geographic Analysis

An in-depth geographic analysis of the industry provides detailed qualitative and quantitative insights into the five major regions (North America, Europe, Asia-Pacific, Latin America, and the Middle East & Africa) and the coverage of major countries in each region. In 2026, Asia-Pacific dominates the global EUV lithography market with the largest market share, primarily attributed to massive investments in advanced logic and memory fabrication facilities and the rapid adoption of High-NA solutions in Taiwan, South Korea, and Japan. North America is expected to maintain significant market presence during the forecast period, supported by strong semiconductor manufacturing capabilities and continued investment in advanced technology development. Europe, Latin America, and the Middle East & Africa represent emerging markets with growing semiconductor manufacturing infrastructure and increasing adoption of advanced EUV lithography solutions.

Key Players

The key players operating in the global EUV lithography market are ASML Holding N.V., Nikon Corporation, Canon Inc., Carl Zeiss SMT GmbH, Cynosure, Coherent Corporation, Lam Research Corporation, Applied Materials Inc., KLA Corporation, Onto Innovation Inc., and various other regional and emerging equipment manufacturers, among others.

Key Questions Answered in the Report-

  • What is the current revenue generated by the EUV lithography market globally?
  • At what rate is the global EUV lithography market demand projected to grow for the next 7-10 years?
  • What are the historical market sizes and growth rates of the global EUV lithography market?
  • What are the major factors impacting the growth of this market at the regional and country levels? What are the major opportunities for existing players and new entrants in the market?
  • Which segments in terms of equipment, technology, and end-use are expected to create major traction for the service providers in this market?
  • What are the key geographical trends in this market? Which regions/countries are expected to offer significant growth opportunities for the companies operating in the global EUV lithography market?
  • Who are the major players in the global EUV lithography market? What are their specific product offerings in this market?
  • What are the recent strategic developments in the global EUV lithography market? What are the impacts of these strategic developments on the market?

Scope of the Report:

EUV Lithography Market Assessment -- by Equipment

  • Exposure Systems
  • Light Sources
  • Optics & Mirrors
  • Mask-related Systems

EUV Lithography Market Assessment -- by Technology

  • Standard EUV/NXE
  • High-NA EUV/EXE

EUV Lithography Market Assessment -- by End-use

  • Foundry
  • Memory
  • IDM

EUV Lithography Market Assessment -- by Geography

  • North America
    • U.S.
    • Canada
  • Europe
    • Germany
    • France
    • UK
    • Italy
    • Spain
    • Rest of Europe
  • Asia-Pacific
    • China
    • India
    • Japan
    • South Korea
    • Taiwan
    • Rest of Asia-Pacific
  • Latin America
    • Brazil
    • Mexico
    • Argentina
    • Rest of Latin America
  • Middle East & Africa
    • Saudi Arabia
    • UAE
    • South Africa
    • Rest of Middle East & Africa

TABLE OF CONTENTS

1. Introduction

  • 1.1. Market Definition
  • 1.2. Market Scope
  • 1.3. Research Methodology
  • 1.4. Assumptions & Limitations

2. Executive Summary

3. Market Overview

  • 3.1. Introduction
  • 3.2. Market Dynamics
    • 3.2.1. Drivers
    • 3.2.2. Restraints
    • 3.2.3. Opportunities
    • 3.2.4. Challenges
  • 3.3. Impact of High-NA and AI on EUV Lithography
  • 3.4. Regulatory Landscape & Semiconductor Standards
  • 3.5. Porter's Five Forces Analysis

4. Global Extreme Ultraviolet (EUV) Lithography Market, by Equipment

  • 4.1. Introduction
  • 4.2. Exposure Systems (Steppers/Scanners)
    • 4.2.1. NXE Series (Standard EUV)
    • 4.2.2. EXE Series (High-NA EUV)
  • 4.3. Light Sources (LPP / DPP)
  • 4.4. Optics & Mirrors
  • 4.5. Mask-related Systems
    • 4.5.1. Mask Inspection (Actinic / Non-actinic)
    • 4.5.2. Mask Blanks & Pellicles
  • 4.6. Others (Metrology & Inspection)

5. Global Extreme Ultraviolet (EUV) Lithography Market, by Technology

  • 5.1. Introduction
  • 5.2. Standard EUV (NXE)
  • 5.3. High-NA EUV (EXE)

6. Global Extreme Ultraviolet (EUV) Lithography Market, by End-use

  • 6.1. Introduction
  • 6.2. Foundry
  • 6.3. Memory (DRAM / NAND)
  • 6.4. IDM (Integrated Device Manufacturers)

7. Global Extreme Ultraviolet (EUV) Lithography Market, by Region

  • 7.1. Introduction
  • 7.2. North America
    • 7.2.1. U.S.
    • 7.2.2. Canada
  • 7.3. Europe
    • 7.3.1. Germany
    • 7.3.2. France
    • 7.3.3. U.K.
    • 7.3.4. Italy
    • 7.3.5. Spain
    • 7.3.6. Netherlands
    • 7.3.7. Rest of Europe
  • 7.4. Asia-Pacific
    • 7.4.1. China
    • 7.4.2. India
    • 7.4.3. Japan
    • 7.4.4. South Korea
    • 7.4.5. Southeast Asia
    • 7.4.6. Australia
    • 7.4.7. Rest of Asia-Pacific
  • 7.5. Latin America
    • 7.5.1. Brazil
    • 7.5.2. Mexico
    • 7.5.3. Rest of Latin America
  • 7.6. Middle East & Africa
    • 7.6.1. Saudi Arabia
    • 7.6.2. UAE
    • 7.6.3. South Africa
    • 7.6.4. Rest of Middle East & Africa

8. Competitive Landscape

  • 8.1. Overview
  • 8.2. Key Growth Strategies
  • 8.3. Competitive Benchmarking
  • 8.4. Competitive Dashboard
    • 8.4.1. Industry Leaders
    • 8.4.2. Market Differentiators
    • 8.4.3. Vanguards
    • 8.4.4. Emerging Companies
  • 8.5. Market Ranking / Positioning Analysis of Key Players, 2025

9. Company Profiles (Manufacturers & Providers)

  • 9.1. ASML Holding N.V.
  • 9.2. ZEISS SMT
  • 9.3. Lasertec Corporation
  • 9.4. KLA Corporation
  • 9.5. Applied Materials, Inc.
  • 9.6. Ushio Inc.
  • 9.7. Gigaphoton Inc.
  • 9.8. Tokyo Electron Limited
  • 9.9. Toppan Holdings Inc.
  • 9.10. HOYA Corporation
  • 9.11. JSR Corporation
  • 9.12. Shin-Etsu Chemical Co., Ltd.

10. Appendix

  • 10.1. Questionnaire
  • 10.2. Related Reports