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市场调查报告书
商品编码
1901660

极紫外光刻市场－全球产业规模、份额、趋势、机会及预测（依技术节点、组件类型、终端用户产业、区域及竞争格局划分，2021-2031年预测）

Extreme Ultraviolet Lithography Market - Global Industry Size, Share, Trends, Opportunity, and Forecast Segmented By Technology Node, By Component Type, By End-Use Industry, By Region & Competition, 2021-2031F
出版日期: | 出版商: TechSci Research | 英文 181 Pages | 商品交期: 2-3个工作天内

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简介目录

全球极紫外（EUV）微影市场规模将从2025年的93.4亿美元成长至2031年的185.2亿美元，复合年增长率（CAGR）为12.09%。极紫外线（EUV）微影是一种先进的半导体製造技术，它利用波长13.5奈米的光在硅晶圆上印製复杂的电路图案。该市场的主要驱动力是人工智慧、自动驾驶和下一代通讯等领域对小型化、高性能微晶片日益增长的需求。

市场概览
预测期 2027-2031
市场规模：2025年 93.4亿美元
市场规模：2031年 185.2亿美元
复合年增长率：2026-2031年 12.09%
成长最快的细分市场 整合装置製造商（IDM）
最大的市场 亚太地区

主要市场驱动因素

对高效能运算和人工智慧解决方案的激增需求是加速采用极紫外光刻技术的主要催化剂，因为生成式人工智慧的运算强度要求晶片架构具备前所未有的电晶体密度。半导体製造商正在迅速调整生产重点，以满足人工智慧加速器和高频宽记忆体（HBM）的需求，这两者都需要只有极紫外光刻波长才能分辨的精确关键尺寸。

主要市场挑战

EUV系统高昂的资本支出和技术复杂性构成了阻碍全球极紫外光微影市场更广泛扩张的重大障碍。这些财务和技术壁垒限制了这项技术的应用，只有少数资金雄厚的半导体製造商能够承担巨额的初始投资和持续的营运成本。

主要市场趋势

向高数值孔径 (High-NA) EUV 系统的过渡代表着关键的技术演进，旨在克服目前 0.33 NA 工具的分辨率限制。

目录

第一章：产品概述

第二章：研究方法

第三章：执行概要

第四章：客户之声

第五章：全球极紫外线（EUV）微影市场展望

  • 市场规模及预测
    • 按价值
  • 市占率及预测
    • 依组件类型（光源（EUV光源）、反射镜和光学元件、掩模和掩模处理系统、其他）
    • 按最终用途行业划分（半导体製造、整合装置製造商 (IDM)、晶圆代工厂、记忆体製造商、其他）
    • 按地区
    • 按公司（2025 年）
  • 市场地图

第六章：北美极紫外线（EUV）微影市场展望

  • 市场规模及预测
  • 市占率及预测
  • 北美洲：国家分析
    • 美国
    • 加拿大
    • 墨西哥

第七章：欧洲极紫外线（EUV）光刻市场展望

  • 市场规模及预测
  • 市占率及预测
  • 欧洲：国家分析
    • 德国
    • 法国
    • 英国
    • 义大利
    • 西班牙

第八章：亚太地区极紫外线（EUV）微影市场展望

  • 市场规模及预测
  • 市占率及预测
  • 亚太地区：国家分析
    • 中国
    • 印度
    • 日本
    • 韩国
    • 澳洲

第九章：中东与非洲极紫外线（EUV）微影市场展望

  • 市场规模及预测
  • 市占率及预测
  • 中东和非洲：国家分析
    • 沙乌地阿拉伯
    • 阿联酋
    • 南非

第十章：南美洲极紫外线（EUV）微影市场展望

  • 市场规模及预测
  • 市占率及预测
  • 南美洲：国家分析
    • 巴西
    • 哥伦比亚
    • 阿根廷

第十一章：市场动态

  • 司机
  • 挑战

第十二章：市场趋势与发展

  • 併购
  • 产品发布
  • 最新进展

第十三章：全球极紫外线（EUV）微影市场：SWOT分析

第十四章：波特五力分析

  • 产业竞争
  • 新进入者的潜力
  • 供应商议价能力
  • 顾客的力量
  • 替代产品的威胁

第十五章：竞争格局

  • ASML Holding NV.
  • CARL ZEISS AG.
  • Toppan Photomasks Inc
  • USHIO, INC
  • NTT ADVANCED TECHNOLOGY CORPORATION.
  • KLA CORPORATION
  • ADVANTEST CORPORATION
  • Photronics, Inc
  • HOYA Corporation
  • Trumpf

第十六章：策略建议

第17章调查会社について・免责事项

简介目录
Product Code: 16038

The Global Extreme Ultraviolet (EUV) Lithography Market will grow from USD 9.34 Billion in 2025 to USD 18.52 Billion by 2031 at a 12.09% CAGR. Extreme Ultraviolet (EUV) Lithography is an advanced semiconductor manufacturing technology that utilizes light with a wavelength of 13.5 nanometers to print intricate circuit patterns on silicon wafers. The market is primarily propelled by the escalating demand for miniaturized, high-performance microchips essential for artificial intelligence, autonomous driving, and next-generation telecommunications.

Market Overview
Forecast Period2027-2031
Market Size 2025USD 9.34 Billion
Market Size 2031USD 18.52 Billion
CAGR 2026-203112.09%
Fastest Growing SegmentIntegrated Device Manufacturers (IDMs)
Largest MarketAsia Pacific

Key Market Drivers

Surging Demand for High-Performance Computing and Artificial Intelligence Solutions is the primary catalyst accelerating the adoption of Extreme Ultraviolet Lithography, as the computational intensity of generative AI necessitates chip architectures with unprecedented transistor density. Semiconductor manufacturers are rapidly shifting production priorities to accommodate AI accelerators and High Bandwidth Memory (HBM), both of which require the precise critical dimensions that only EUV wavelengths can resolve.

Key Market Challenges

The exorbitant capital expenditure and technical complexity associated with EUV systems constitute a significant obstacle impeding the broader expansion of the Global Extreme Ultraviolet Lithography Market. These financial and technical barriers restrict the adoption of this technology to a limited number of well-capitalized semiconductor manufacturers capable of sustaining the massive initial outlay and ongoing operational costs.

Key Market Trends

The Transition to High-Numerical Aperture (High-NA) EUV Systems represents a critical technological evolution designed to overcome the resolution limits of current 0.33 NA tools. By increasing the numerical aperture to 0.55, these next-generation systems allow semiconductor manufacturers to print features with significantly higher contrast and reduced line-edge roughness, thereby eliminating the need for complex and costly double-patterning techniques at sub-2nm nodes.

Key Market Players

  • ASML Holding NV.
  • CARL ZEISS AG.
  • Toppan Photomasks Inc
  • USHIO, INC
  • NTT ADVANCED TECHNOLOGY CORPORATION.
  • KLA CORPORATION
  • ADVANTEST CORPORATION
  • Photronics, Inc
  • HOYA Corporation
  • Trumpf

Report Scope:

In this report, the Global Extreme Ultraviolet (EUV) Lithography Market has been segmented into the following categories, in addition to the industry trends which have also been detailed below:

Extreme Ultraviolet (EUV) Lithography Market, By Component Type:

  • Light Source (EUV Sources)
  • Mirrors and Optics
  • Mask and Mask Handling Systems
  • Others

Extreme Ultraviolet (EUV) Lithography Market, By End-Use Industry:

  • Semiconductor Manufacturing
  • Integrated Device Manufacturers (IDMs)
  • Foundries
  • Memory Manufacturers
  • Others

Extreme Ultraviolet (EUV) Lithography Market, By Region:

  • North America
  • United States
  • Canada
  • Mexico
  • Europe
  • France
  • United Kingdom
  • Italy
  • Germany
  • Spain
  • Asia Pacific
  • China
  • India
  • Japan
  • Australia
  • South Korea
  • South America
  • Brazil
  • Argentina
  • Colombia
  • Middle East & Africa
  • South Africa
  • Saudi Arabia
  • UAE

Competitive Landscape

Company Profiles: Detailed analysis of the major companies present in the Global Extreme Ultraviolet (EUV) Lithography Market.

Available Customizations:

Global Extreme Ultraviolet (EUV) Lithography Market report with the given market data, TechSci Research offers customizations according to a company's specific needs. The following customization options are available for the report:

Company Information

  • Detailed analysis and profiling of additional market players (up to five).

Table of Contents

1. Product Overview

  • 1.1. Market Definition
  • 1.2. Scope of the Market
    • 1.2.1. Markets Covered
    • 1.2.2. Years Considered for Study
    • 1.2.3. Key Market Segmentations

2. Research Methodology

  • 2.1. Objective of the Study
  • 2.2. Baseline Methodology
  • 2.3. Key Industry Partners
  • 2.4. Major Association and Secondary Sources
  • 2.5. Forecasting Methodology
  • 2.6. Data Triangulation & Validation
  • 2.7. Assumptions and Limitations

3. Executive Summary

  • 3.1. Overview of the Market
  • 3.2. Overview of Key Market Segmentations
  • 3.3. Overview of Key Market Players
  • 3.4. Overview of Key Regions/Countries
  • 3.5. Overview of Market Drivers, Challenges, Trends

4. Voice of Customer

5. Global Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 5.1. Market Size & Forecast
    • 5.1.1. By Value
  • 5.2. Market Share & Forecast
    • 5.2.1. By Component Type (Light Source (EUV Sources), Mirrors and Optics, Mask and Mask Handling Systems, Others)
    • 5.2.2. By End-Use Industry (Semiconductor Manufacturing, Integrated Device Manufacturers (IDMs), Foundries, Memory Manufacturers, Others)
    • 5.2.3. By Region
    • 5.2.4. By Company (2025)
  • 5.3. Market Map

6. North America Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 6.1. Market Size & Forecast
    • 6.1.1. By Value
  • 6.2. Market Share & Forecast
    • 6.2.1. By Component Type
    • 6.2.2. By End-Use Industry
    • 6.2.3. By Country
  • 6.3. North America: Country Analysis
    • 6.3.1. United States Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 6.3.1.1. Market Size & Forecast
        • 6.3.1.1.1. By Value
      • 6.3.1.2. Market Share & Forecast
        • 6.3.1.2.1. By Component Type
        • 6.3.1.2.2. By End-Use Industry
    • 6.3.2. Canada Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 6.3.2.1. Market Size & Forecast
        • 6.3.2.1.1. By Value
      • 6.3.2.2. Market Share & Forecast
        • 6.3.2.2.1. By Component Type
        • 6.3.2.2.2. By End-Use Industry
    • 6.3.3. Mexico Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 6.3.3.1. Market Size & Forecast
        • 6.3.3.1.1. By Value
      • 6.3.3.2. Market Share & Forecast
        • 6.3.3.2.1. By Component Type
        • 6.3.3.2.2. By End-Use Industry

7. Europe Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 7.1. Market Size & Forecast
    • 7.1.1. By Value
  • 7.2. Market Share & Forecast
    • 7.2.1. By Component Type
    • 7.2.2. By End-Use Industry
    • 7.2.3. By Country
  • 7.3. Europe: Country Analysis
    • 7.3.1. Germany Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.1.1. Market Size & Forecast
        • 7.3.1.1.1. By Value
      • 7.3.1.2. Market Share & Forecast
        • 7.3.1.2.1. By Component Type
        • 7.3.1.2.2. By End-Use Industry
    • 7.3.2. France Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.2.1. Market Size & Forecast
        • 7.3.2.1.1. By Value
      • 7.3.2.2. Market Share & Forecast
        • 7.3.2.2.1. By Component Type
        • 7.3.2.2.2. By End-Use Industry
    • 7.3.3. United Kingdom Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.3.1. Market Size & Forecast
        • 7.3.3.1.1. By Value
      • 7.3.3.2. Market Share & Forecast
        • 7.3.3.2.1. By Component Type
        • 7.3.3.2.2. By End-Use Industry
    • 7.3.4. Italy Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.4.1. Market Size & Forecast
        • 7.3.4.1.1. By Value
      • 7.3.4.2. Market Share & Forecast
        • 7.3.4.2.1. By Component Type
        • 7.3.4.2.2. By End-Use Industry
    • 7.3.5. Spain Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.5.1. Market Size & Forecast
        • 7.3.5.1.1. By Value
      • 7.3.5.2. Market Share & Forecast
        • 7.3.5.2.1. By Component Type
        • 7.3.5.2.2. By End-Use Industry

8. Asia Pacific Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 8.1. Market Size & Forecast
    • 8.1.1. By Value
  • 8.2. Market Share & Forecast
    • 8.2.1. By Component Type
    • 8.2.2. By End-Use Industry
    • 8.2.3. By Country
  • 8.3. Asia Pacific: Country Analysis
    • 8.3.1. China Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.1.1. Market Size & Forecast
        • 8.3.1.1.1. By Value
      • 8.3.1.2. Market Share & Forecast
        • 8.3.1.2.1. By Component Type
        • 8.3.1.2.2. By End-Use Industry
    • 8.3.2. India Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.2.1. Market Size & Forecast
        • 8.3.2.1.1. By Value
      • 8.3.2.2. Market Share & Forecast
        • 8.3.2.2.1. By Component Type
        • 8.3.2.2.2. By End-Use Industry
    • 8.3.3. Japan Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.3.1. Market Size & Forecast
        • 8.3.3.1.1. By Value
      • 8.3.3.2. Market Share & Forecast
        • 8.3.3.2.1. By Component Type
        • 8.3.3.2.2. By End-Use Industry
    • 8.3.4. South Korea Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.4.1. Market Size & Forecast
        • 8.3.4.1.1. By Value
      • 8.3.4.2. Market Share & Forecast
        • 8.3.4.2.1. By Component Type
        • 8.3.4.2.2. By End-Use Industry
    • 8.3.5. Australia Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.5.1. Market Size & Forecast
        • 8.3.5.1.1. By Value
      • 8.3.5.2. Market Share & Forecast
        • 8.3.5.2.1. By Component Type
        • 8.3.5.2.2. By End-Use Industry

9. Middle East & Africa Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 9.1. Market Size & Forecast
    • 9.1.1. By Value
  • 9.2. Market Share & Forecast
    • 9.2.1. By Component Type
    • 9.2.2. By End-Use Industry
    • 9.2.3. By Country
  • 9.3. Middle East & Africa: Country Analysis
    • 9.3.1. Saudi Arabia Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 9.3.1.1. Market Size & Forecast
        • 9.3.1.1.1. By Value
      • 9.3.1.2. Market Share & Forecast
        • 9.3.1.2.1. By Component Type
        • 9.3.1.2.2. By End-Use Industry
    • 9.3.2. UAE Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 9.3.2.1. Market Size & Forecast
        • 9.3.2.1.1. By Value
      • 9.3.2.2. Market Share & Forecast
        • 9.3.2.2.1. By Component Type
        • 9.3.2.2.2. By End-Use Industry
    • 9.3.3. South Africa Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 9.3.3.1. Market Size & Forecast
        • 9.3.3.1.1. By Value
      • 9.3.3.2. Market Share & Forecast
        • 9.3.3.2.1. By Component Type
        • 9.3.3.2.2. By End-Use Industry

10. South America Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 10.1. Market Size & Forecast
    • 10.1.1. By Value
  • 10.2. Market Share & Forecast
    • 10.2.1. By Component Type
    • 10.2.2. By End-Use Industry
    • 10.2.3. By Country
  • 10.3. South America: Country Analysis
    • 10.3.1. Brazil Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 10.3.1.1. Market Size & Forecast
        • 10.3.1.1.1. By Value
      • 10.3.1.2. Market Share & Forecast
        • 10.3.1.2.1. By Component Type
        • 10.3.1.2.2. By End-Use Industry
    • 10.3.2. Colombia Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 10.3.2.1. Market Size & Forecast
        • 10.3.2.1.1. By Value
      • 10.3.2.2. Market Share & Forecast
        • 10.3.2.2.1. By Component Type
        • 10.3.2.2.2. By End-Use Industry
    • 10.3.3. Argentina Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 10.3.3.1. Market Size & Forecast
        • 10.3.3.1.1. By Value
      • 10.3.3.2. Market Share & Forecast
        • 10.3.3.2.1. By Component Type
        • 10.3.3.2.2. By End-Use Industry

11. Market Dynamics

  • 11.1. Drivers
  • 11.2. Challenges

12. Market Trends & Developments

  • 12.1. Merger & Acquisition (If Any)
  • 12.2. Product Launches (If Any)
  • 12.3. Recent Developments

13. Global Extreme Ultraviolet (EUV) Lithography Market: SWOT Analysis

14. Porter's Five Forces Analysis

  • 14.1. Competition in the Industry
  • 14.2. Potential of New Entrants
  • 14.3. Power of Suppliers
  • 14.4. Power of Customers
  • 14.5. Threat of Substitute Products

15. Competitive Landscape

  • 15.1. ASML Holding NV.
    • 15.1.1. Business Overview
    • 15.1.2. Products & Services
    • 15.1.3. Recent Developments
    • 15.1.4. Key Personnel
    • 15.1.5. SWOT Analysis
  • 15.2. CARL ZEISS AG.
  • 15.3. Toppan Photomasks Inc
  • 15.4. USHIO, INC
  • 15.5. NTT ADVANCED TECHNOLOGY CORPORATION.
  • 15.6. KLA CORPORATION
  • 15.7. ADVANTEST CORPORATION
  • 15.8. Photronics, Inc
  • 15.9. HOYA Corporation
  • 15.10. Trumpf

16. Strategic Recommendations

17. About Us & Disclaimer