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市场调查报告书
商品编码
1930195
极紫外光刻 (EUV) 市场规模、占有率、成长及全球产业分析:按类型、应用和地区划分的洞察与预测 (2026-2034)EUV Lithography Market Size, Share, Growth and Global Industry Analysis By Type & Application, Regional Insights and Forecast to 2026-2034 |
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由于对先进半导体节点的需求不断增长以及积体电路 (IC) 设计日益复杂,全球极紫外光微影 (EUV) 市场正经历稳定成长。根据 Fortune Business Insights 的数据显示,2025 年全球 EUV 光刻市场规模为 121.6 亿美元。预计该市场将从 2026 年的 132.7 亿美元成长到 2034 年的 250.8 亿美元,预测期内复合年增长率 (CAGR) 为 8.28%。欧洲凭藉强大的半导体研发生态系统和主要EUV技术供应商的存在,引领市场,预计到2025年将占全球市场44.71%的占有率。
EUV微影技术利用极紫外线(EUV)光在半导体晶圆上蚀刻出极为精细的图案,从而能够生产7奈米以下的晶片。这项技术对于维持摩尔定律至关重要,因为它能够提高现代处理器的电晶体密度、效能和能源效率。
生成式人工智慧对EUV微影市场的影响
生成式人工智慧透过增强图案优化、缺陷检测和设计自动化,在改进EUV光刻製程方面发挥关键作用。透过分析来自以往製造週期的大量资料集,人工智慧模型可以产生优化的光刻图案,从而减少缺陷、提高良率并最大限度地减少生产过程中的试错。这些进步显着提高了製程精度和产量,从而推动了全球EUV微影市场的成长。
市场动态
市场驱动因素
积体电路日益复杂是推动EUV微影技术普及的主要驱动力。随着半导体製造商不断缩小装置尺寸并提高电晶体密度,传统光学微影技术难以满足解析度要求。 EUV微影技术能够实现高精度图案化,对于先进的逻辑晶片和储存晶片至关重要。人工智慧、5G、资料中心和消费性电子等各领域对高效能晶片的需求不断增长,持续推动市场成长。
市场限制因子
儘管EUV微影技术具有诸多优势,但其高昂的成本仍是一个重大障碍。由于光源、掩模、薄膜和光阻等组件的复杂性,EUV设备比传统光刻设备昂贵得多。此外,掩模保护和工业规模化实施的技术挑战进一步推高了实施成本,限制了中小半导体製造商采用此技术。
市场机会
资料中心和先进储存设备的快速扩张带来了巨大的成长机会。 EUV微影技术支援高密度NAND快闪记忆体和DRAM记忆体的生产,这些记忆体是现代运算、云端基础架构和企业储存所必需的。对高速、高能源效率记忆体的需求不断增长,预计将进一步推动EUV技术的应用。
EUV微影市场趋势
影响市场的一个显着趋势是对先进半导体节点(尤其是5nm以下节点)的需求不断增长。三星和台积电等主要半导体公司正在扩大EUV产能,以支援下一代晶片的生产。这种对小型化和性能提升的关注是市场持续发展的关键驱动力。
依装置类型
光源细分市场由于其在实现10奈米以下图形化方面发挥的关键作用,预计到2026年将占最大的市场占有率,达到41.26%。持续的技术创新、政府对半导体研发的支持以及製造商之间的合作正在推动该细分市场的成长。
由于7奈米以下晶片製造对精度要求的不断提高,预计掩模细分市场在预测期内将实现最高的复合年增长率。
按最终使用者
整合装置製造商 (IDM) 细分市场占主导地位,预计到2026年将占53.92%的市场占有率,因为IDM扩大采用EUV光刻技术来克服功耗、性能和麵积方面的限制。
代工细分市场预计将以12.27%的最高复合年增长率成长,这主要受人工智慧、智慧型手机、汽车和高效能运算应用领域对先进半导体的需求日益增长所推动。
在半导体製造领域强劲投资的推动下,欧洲预计将保持领先地位,2025年市场规模将达到54.4亿美元,2026年将达到60.2亿美元。德国预计2026年市场规模将达到13.9亿美元,而法国2025年的市场规模将达到11.1亿美元。
亚太地区是第二大市场,预计2026年市场规模将达37.3亿美元,复合年增长率最高,为12.34%,主要得益于中国大陆、台湾和韩国的主要晶圆代工厂。
北美市场预计2026年将达到18.9亿美元,主要受先进计算和通讯设备需求的推动。
预计到 2026 年,中东和非洲市场规模将达到 9.6 亿美元,而海湾合作委员会 (GCC) 市场在 2025 年的估值为 2.9 亿美元。
The global extreme ultraviolet (EUV) lithography market is experiencing steady growth due to rising demand for advanced semiconductor nodes and increasing complexity in integrated circuit (IC) designs. According to Fortune Business Insights, the global EUV lithography market size was valued at USD 12.16 billion in 2025. The market is projected to grow from USD 13.27 billion in 2026 to USD 25.08 billion by 2034, registering a compound annual growth rate (CAGR) of 8.28% during the forecast period. Europe dominated the global market, accounting for 44.71% of the total market share in 2025, supported by a strong semiconductor R&D ecosystem and the presence of leading EUV technology providers.
EUV lithography uses extreme ultraviolet light to etch extremely small patterns onto semiconductor wafers, enabling the production of chips below 7 nanometers. This technology is essential for sustaining Moore's Law by increasing transistor density, performance, and energy efficiency in modern processors.
Impact of Generative AI on the EUV Lithography Market
Generative AI is playing a crucial role in improving EUV lithography processes by enhancing pattern optimization, defect detection, and design automation. By analyzing large datasets from prior manufacturing cycles, AI models generate optimized lithography patterns that reduce defects, improve yields, and minimize trial-and-error during production. These advancements significantly enhance process precision and throughput, thereby supporting the growth of the EUV lithography market globally.
Market Dynamics
Market Drivers
The rising complexity of integrated circuits is a key driver of EUV lithography adoption. As semiconductor manufacturers shift toward smaller feature sizes and higher transistor densities, traditional optical lithography struggles to meet resolution requirements. EUV lithography enables highly precise patterning, making it indispensable for advanced logic and memory chips. The growing demand for high-performance chips across applications such as artificial intelligence, 5G, data centers, and consumer electronics continues to fuel market growth.
Market Restraints
Despite its advantages, the high cost of EUV lithography systems remains a significant barrier. EUV tools are considerably more expensive than conventional lithography equipment due to complex components such as light sources, masks, pellicles, and photoresists. Additionally, technical challenges related to mask protection and industrial-scale deployment further increase implementation costs, limiting adoption among smaller semiconductor manufacturers.
Market Opportunities
The rapid expansion of data centers and advanced memory devices presents a major growth opportunity. EUV lithography supports the production of high-density NAND Flash and DRAM memory required for modern computing, cloud infrastructure, and enterprise storage. As demand for faster and energy-efficient memory rises, EUV technology is expected to gain further traction.
EUV Lithography Market Trends
A prominent trend shaping the market is the increasing demand for advanced semiconductor nodes, particularly 5nm and below. Leading semiconductor companies such as Samsung and TSMC are expanding their EUV capacity to support next-generation chip production. This focus on miniaturization and performance enhancement is a key factor driving sustained market progress.
By Equipment Type
The light source segment held the largest market share of 41.26% in 2026, driven by its critical role in enabling sub-10 nanometer patterning. Continuous innovations, government support for semiconductor R&D, and collaborations among manufacturers are supporting segment growth.
The mask segment is expected to record the highest CAGR during the forecast period due to increasing precision requirements in sub-7 nanometer chip manufacturing.
By End-User
The Integrated Device Manufacturer (IDM) segment dominated the market and is projected to capture 53.92% market share in 2026, as IDMs increasingly adopt EUV lithography to overcome power, performance, and area limitations.
The foundries segment is expected to grow at the highest CAGR of 12.27%, driven by rising demand for advanced semiconductors used in AI, smartphones, automotive, and high-performance computing applications.
Europe led the market with a valuation of USD 5.44 billion in 2025 and USD 6.02 billion in 2026, supported by strong investments in semiconductor manufacturing. Germany is projected to reach USD 1.39 billion in 2026, while France is valued at USD 1.11 billion in 2025.
Asia Pacific is the second-largest market, estimated at USD 3.73 billion in 2026, with the highest CAGR of 12.34%, driven by major foundries in China, Taiwan, and South Korea.
North America is projected to reach USD 1.89 billion in 2026, supported by demand for advanced computing and telecom devices.
The Middle East & Africa market is estimated to reach USD 0.96 billion in 2026, while the GCC market is valued at USD 0.29 billion in 2025.
Conclusion
In conclusion, the global EUV lithography market is set for steady growth from USD 12.16 billion in 2025 to USD 25.08 billion by 2034, driven by increasing semiconductor complexity, rising demand for advanced nodes, and expanding data center infrastructure. While high costs and technical challenges remain, continuous innovations, generative AI integration, and strong investments by key players such as ASML are expected to strengthen EUV lithography's role as a cornerstone technology in next-generation semiconductor manufacturing.
Segmentation By Equipment
By End-user
By Region
Companies Profiled in the Report ASML (Netherlands), Samsung Electronics Co. Ltd. (South Korea), Canon Inc. (Japan), KLA Corporation (U.S.), NTT Advanced Technology Corporation (Japan), Nikon Corporation (China), ZEISS Group (Germany), ADVANTEST CORPORATION (Japan), SUSS MicroTec SE (Germany)